Deposition of wear resistant nickel-tungsten plating systems

US2019292678A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2019292678-A1
Application numberUS-201815928569-A
CountryUS
Kind codeA1
Filing dateMar 22, 2018
Priority dateMar 22, 2018
Publication dateSep 26, 2019
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Methods for depositing wear resistant NiW plating systems on metallic components are provided. In various embodiments, the method includes the step or process of preparing a NiW plating bath containing a particle suspension. The NiW plating bath is prepared by introducing wear resistant particles into the NiW plating path and adding at least one charged surfactant. The first type of wear resistant particles and the first charged surfactant may be contacted when introduced into the NiW plating bath or prior to introduction into the NiW plating bath. The at least one charged surfactant binds with the wear resistant particles to form a particle-surfactant complex. The wear resistant NiW plating system is then electrodeposited onto a surface of a component at least partially submerged in the NiW plating bath. The resulting wear resistant NiW plating system comprised of a NiW matrix in which the wear resistant particles are embedded.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method for forming a wear resistant nickel tungsten (NiW) plating system, the method comprising: preparing a NiW plating bath containing a particle suspension, preparing comprising: introducing wear resistant particles into the NiW plating path; and adding to the NiW plating bath at least one charged surfactant, the at least one charged surfactant binding with the wear resistant particles to form a particle-surfactant complex; and electrodepositing the wear resistant NiW plating system onto a surface of a component at least partially submerged in the NiW plating bath, the wear resistant NiW plating system comprised of a NiW matrix in which the wear resistant particles are embedded. 2 . The method of claim 1 further comprising formulating the at least one charged surfactant to impart the particle-surfactant complex with a net positive charge exceeding a native positive charge of the wear resistant particles. 3 . The method of claim 1 further comprising selecting the at least one charged surfactant to comprise an anionic surfactant and a cationic surfactant. 4 . The method of claim 3 further comprising: initially contacting the wear resistant particles with the anionic surfactant to produce an intermediary particle-surfactant complex with a net negative charge; and after initially contacting the wear resistant particles with the anionic surfactant, subsequently contacting the intermediary particle-surfactant complex with the cationic surfactant to yield the particle-surfactant complex. 5 . The method of claim 4 further comprising pre-coating the wear resistant particles with the anionic surfactant and the cationic surfactant prior to introduction into the NiW plating bath. 6 . The method of claim 4 wherein the wear resistant particles, the anionic surfactant, and the cationic surfactant are initially contacted within the NiW plating bath. 7 . The method of claim 3 further comprising: selecting the anionic surfactant to comprise an organosulfate compound; and selecting the cationic surfactant to comprise cetyltrimethylammonium bromide, methyl ether dimethicone, or a combination thereof. 8 . The method of claim 7 further comprising selecting the anionic surfactant to comprise sodium dodecyl sulfate. 9 . The method of claim 1 further comprising: selecting the wear resistant particles to have a hardness greater than that of the NiW matrix; and selecting the at least one charged surfactant to comprise cetyltrimethylammonium bromide. 10 . The method of claim 1 further comprising: selecting the wear resistant particles to comprise solid film lubricant particles; and selecting the at least one charged surfactant to comprise methyl ether dimethicone. 11 . The method of claim 1 further comprising selecting the wear resistant particles to comprise alumina nanoparticles, hexagonal boron nitride nanoparticles, or a combination thereof. 12 . The method of claim 1 further comprising: selecting the wear resistant particles to comprise alumina particles; and selecting the at least one charged surfactant to comprise sodium dodecyl sulfate and cetyltrimethylammonium bromide. 13 . The method of claim 1 further comprising: selecting the wear resistant particles to comprise hexagonal boron nitride particles; and selecting the at least one charged surfactant to comprise sodium dodecyl sulfate and methyl ether dimethicone. 14 . The method of claim 1 wherein further comprising selecting a concentration of the wear resistant particles in the NiW plating bath and electrodepositing the wear resistant NiW plating system such that the NiW plating system has a fill rate between 0.1 and 10% wear resistant particles, by weight. 15 . The method of claim 1 further comprising: selecting the at least one charged surfactant to comprise cetyltrimethylammonium bromide; and introducing between about 2.5 and about 10% cetyltrimethylammonium bromide to the NiW plating bath, by weight. 16 . A method forming a wear resistant nickel tungsten (NiW) plating system, the method comprising: contacting wear resistant particles with an anionic surfactant to produce an intermediary particle-surfactant complex having a net negative charge; after contacting the wear resistant particles with the anionic surfactant, subsequently contacting the intermediary particle-surfactant complex with the cationic surfactant to yield a particle-surfactant complex having a net positive charge; dispersing the particle-surfactant complex in a NiW plating bath; and utilizing the NiW plating bath to deposit the wear resistant NiW plating system over a surface of a component. 17 . The method of claim 16 further comprising pre-coating the wear resistant particles with the anionic surfactant and the cationic surfactant prior to dispersal of the particle-surfactant complex in the NiW plating bath. 18 . The method of claim 16 further comprising: selecting the anionic surfactant to comprise sodium dodecyl sulfate; and selecting the cationic surfactant to comprise cetyltrimethylammonium bromide, methyl ether dimethicone, or a combination thereof. 19 . The method of claim 18 further comprising selecting the wear resistant particles to comprise alumina particles, hexagonal boron nitride particles, or a combination thereof. 20 . A method, comprising: contacting wear resistant particles with an anionic surfactant to produce an intermediary particle-surfactant complex having a net negative charge; and after contacting the wear resistant particles with the anionic surfactant, subsequently contacting the intermediary particle-surfactant complex with the cationic surfactant to yield a particle-surfactant complex having a net positive charge; wherein the anionic surfactant comprises sodium dodecyl sulfate; and wherein the cationic surfactant comprises cetyltrimethylammonium bromide, methyl ether dimethicone, or a combination thereof.

Assignees

Inventors

Classifications

  • C25D3/562Primary

    containing more than 50% by weight of iron or nickel or cobalt · CPC title

  • Oiliness; Film-strength; Anti-wear; Resistance to extreme pressure · CPC title

  • Solids · CPC title

  • Metal compounds · CPC title

  • Metals; Alloys · CPC title

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What does patent US2019292678A1 cover?
Methods for depositing wear resistant NiW plating systems on metallic components are provided. In various embodiments, the method includes the step or process of preparing a NiW plating bath containing a particle suspension. The NiW plating bath is prepared by introducing wear resistant particles into the NiW plating path and adding at least one charged surfactant. The first type of wear resist…
Who is the assignee on this patent?
Honeywell Int Inc
What technology area does this patent fall under?
Primary CPC classification C25D3/562. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Sep 26 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).