Hard coating and member coated with hard coating

US2019249311A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2019249311-A1
Application numberUS-201616344826-A
CountryUS
Kind codeA1
Filing dateOct 25, 2016
Priority dateOct 25, 2016
Publication dateAug 15, 2019
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A hard film for coating a surface of a base material, the hard film includes a layer A, a layer B, and a nanolayer-alternating layer. The layer A is an AlTiCr nitride of (AlaTibCrcαd)N, where α is one or more elements selected from C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The layer B is an AlTiCr nitride or AlTiCr carbonitride of (AleTifCrgβh)CxN1-X, where β is one or more elements selected from B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The nanolayer-alternating layer is formed by alternately laminating a nanolayer A or a nanolayer B having the same composition as the layer A or B. And, the layer C is an AlCr(SiC) nitride or AlCr(SiC) carbonitride of [AliCrj(SiC)kγ1]CYN1-Y, where γ is one or more elements selected from B, Ti, V, Y, Zr, Nb, Mo, Hf, Ta, and W.

First claim

Opening claim text (preview).

1 . A hard film for coating a surface of a base material, the hard film configured to include a layer A, a layer B, and a nanolayer-alternating layer alternately laminated by a physical vapor deposition method to a total film thickness of 0.5 to 20 μm, wherein the layer A is an AlTiCr nitride having a composition formula of (Al a Ti b Cr c α d )N, where α is one or more elements selected from a group consisting of C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W and atomic ratios a, b, c, d respectively satisfy 0.10≤a≤0.85, 0.02≤b≤0.70, 0.03≤c≤0.65, 0≤d≤0.10, and a+b+c+d=1, and has a thickness of 0.5 to 1000 nm, wherein the layer B is an AlTiCr nitride or AlTiCr carbonitride having a composition formula of (Al e Ti f Cr g β h )C x N 1-X , where β is one or more elements selected from a group consisting of B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W and atomic ratios e, f, g, h, and X respectively satisfy 0.10≤e≤0.85, 0.02≤f≤0.70, 0.03≤g≤0.65, 0≤h≤0.10, e+f+g+h=1, and 0≤X≤0.6, and has a thickness of 0.5 to 1000 nm, wherein the nanolayer-alternating layer is formed by alternately laminating a nanolayer A or a nanolayer B having the same composition as the layer A or the layer B and a layer C and has a thickness of 1 to 1000 nm, wherein the nanolayer A and the nanolayer B each have a thickness of 0.5 to 500 nm, and wherein the layer C is an AlCr(SiC) nitride or AlCr(SiC) carbonitride having a composition formula of [Al i Cr j (SiC) k γ l ]C Y N 1-Y , where γ is one or more elements selected from a group consisting of B, Ti, V, Y, Zr, Nb, Mo, Hf, Ta, and W and atomic ratios i, j, k, l, and Y respectively satisfy 0.20≤i≤0.85, 0.05≤j≤0.50, 0.01≤k≤0.45, 0≤l≤0.10, i+j+k+l=1, and O≤Y≤0.6, and has a thickness of 0.5 to 500 nm. 2 . The hard film according to claim 1 , wherein a value T A /T NL of a ratio between a film thickness T A of the layer A and a film thickness T NL of the nanolayer-alternating layer is 0.2 to 10 while a value T B /T NL of a ratio between a film thickness T B of the layer B and the film thickness T NL of the nanolayer-alternating layer is 0.2 to 10. 3 . The hard film according to claim 1 , further including a surface layer outside the hard film, wherein the surface layer is made of the same material as the layer A, the layer B, the layer C, or the nanolayer-alternating layer. 4 . The hard film according to claim 1 , wherein the hard film is directly applied to the base material. 5 . The hard film according to claim 1 , wherein the hard film is applied to the base material via an interface layer, and wherein the interface layer is configured to have a thickness of 20 to 1000 nm and made of the same material as the layer A, the layer B, the layer C, or the nanolayer-alternating layer. 6 . A hard film-coated member partially or entirely coated with the hard film according to claim 1 .

Assignees

Inventors

Classifications

  • C23C30/005Primary

    on hard metal substrates · CPC title

  • applied by physical vapour deposition [PVD] · CPC title

  • characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness · CPC title

  • coatings specially adapted for cutting tools or wear applications · CPC title

  • Nitrides (C23C14/0617 takes precedence) · CPC title

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What does patent US2019249311A1 cover?
A hard film for coating a surface of a base material, the hard film includes a layer A, a layer B, and a nanolayer-alternating layer. The layer A is an AlTiCr nitride of (AlaTibCrcαd)N, where α is one or more elements selected from C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The layer B is an AlTiCr nitride or AlTiCr carbonitride of (AleTifCrgβh)CxN1-X, where β is one or more elements selected f…
Who is the assignee on this patent?
Osg Corp
What technology area does this patent fall under?
Primary CPC classification C23C30/005. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Aug 15 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).