Low-density clad steel sheet having excellent formability and fatigue property and manufacturing method therefor
US-2024326399-A1 · Oct 3, 2024 · US
US2019249311A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2019249311-A1 |
| Application number | US-201616344826-A |
| Country | US |
| Kind code | A1 |
| Filing date | Oct 25, 2016 |
| Priority date | Oct 25, 2016 |
| Publication date | Aug 15, 2019 |
| Grant date | — |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A hard film for coating a surface of a base material, the hard film includes a layer A, a layer B, and a nanolayer-alternating layer. The layer A is an AlTiCr nitride of (AlaTibCrcαd)N, where α is one or more elements selected from C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The layer B is an AlTiCr nitride or AlTiCr carbonitride of (AleTifCrgβh)CxN1-X, where β is one or more elements selected from B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The nanolayer-alternating layer is formed by alternately laminating a nanolayer A or a nanolayer B having the same composition as the layer A or B. And, the layer C is an AlCr(SiC) nitride or AlCr(SiC) carbonitride of [AliCrj(SiC)kγ1]CYN1-Y, where γ is one or more elements selected from B, Ti, V, Y, Zr, Nb, Mo, Hf, Ta, and W.
Opening claim text (preview).
1 . A hard film for coating a surface of a base material, the hard film configured to include a layer A, a layer B, and a nanolayer-alternating layer alternately laminated by a physical vapor deposition method to a total film thickness of 0.5 to 20 μm, wherein the layer A is an AlTiCr nitride having a composition formula of (Al a Ti b Cr c α d )N, where α is one or more elements selected from a group consisting of C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W and atomic ratios a, b, c, d respectively satisfy 0.10≤a≤0.85, 0.02≤b≤0.70, 0.03≤c≤0.65, 0≤d≤0.10, and a+b+c+d=1, and has a thickness of 0.5 to 1000 nm, wherein the layer B is an AlTiCr nitride or AlTiCr carbonitride having a composition formula of (Al e Ti f Cr g β h )C x N 1-X , where β is one or more elements selected from a group consisting of B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W and atomic ratios e, f, g, h, and X respectively satisfy 0.10≤e≤0.85, 0.02≤f≤0.70, 0.03≤g≤0.65, 0≤h≤0.10, e+f+g+h=1, and 0≤X≤0.6, and has a thickness of 0.5 to 1000 nm, wherein the nanolayer-alternating layer is formed by alternately laminating a nanolayer A or a nanolayer B having the same composition as the layer A or the layer B and a layer C and has a thickness of 1 to 1000 nm, wherein the nanolayer A and the nanolayer B each have a thickness of 0.5 to 500 nm, and wherein the layer C is an AlCr(SiC) nitride or AlCr(SiC) carbonitride having a composition formula of [Al i Cr j (SiC) k γ l ]C Y N 1-Y , where γ is one or more elements selected from a group consisting of B, Ti, V, Y, Zr, Nb, Mo, Hf, Ta, and W and atomic ratios i, j, k, l, and Y respectively satisfy 0.20≤i≤0.85, 0.05≤j≤0.50, 0.01≤k≤0.45, 0≤l≤0.10, i+j+k+l=1, and O≤Y≤0.6, and has a thickness of 0.5 to 500 nm. 2 . The hard film according to claim 1 , wherein a value T A /T NL of a ratio between a film thickness T A of the layer A and a film thickness T NL of the nanolayer-alternating layer is 0.2 to 10 while a value T B /T NL of a ratio between a film thickness T B of the layer B and the film thickness T NL of the nanolayer-alternating layer is 0.2 to 10. 3 . The hard film according to claim 1 , further including a surface layer outside the hard film, wherein the surface layer is made of the same material as the layer A, the layer B, the layer C, or the nanolayer-alternating layer. 4 . The hard film according to claim 1 , wherein the hard film is directly applied to the base material. 5 . The hard film according to claim 1 , wherein the hard film is applied to the base material via an interface layer, and wherein the interface layer is configured to have a thickness of 20 to 1000 nm and made of the same material as the layer A, the layer B, the layer C, or the nanolayer-alternating layer. 6 . A hard film-coated member partially or entirely coated with the hard film according to claim 1 .
on hard metal substrates · CPC title
applied by physical vapour deposition [PVD] · CPC title
characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness · CPC title
coatings specially adapted for cutting tools or wear applications · CPC title
Nitrides (C23C14/0617 takes precedence) · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.