Substrate treatment apparatus, controller of substrate treatment apparatus, method for controlling substrate treatment apparatus, and memory medium storing program

Patent metadata

Field	Value
Publication number	US-2019237350-A1
Application number	US-201916245448-A
Country	US
Kind code	A1
Filing date	Jan 11, 2019
Priority date	Jan 29, 2018
Publication date	Aug 1, 2019
Grant date	—

Abstract

A substrate treatment apparatus includes a plurality of treatment chambers performing different treatment types on a substrate; a transfer device; and a controller that controls the transfer of the substrate and the substrate treatment. The controller enables fixation of a time for pulling up the substrate for each treatment chambers/treatment type and creation of a transfer schedule for transferring the substrate among the plurality of treatment chambers/treatment types and treating the substrate so as to maximize throughput, and enables correction of the transfer schedule to extend, based on a waiting time of the transfer device after storage of the substrate into a treatment chamber of one treatment type and a waiting time of the treatment chamber after treatment of the substrate, a time required for pulling up the substrate from a treatment chamber of an immediately previous treatment type in transfer order of the substrate.

First claim

What is claimed is:

1 . A substrate treatment apparatus comprising:
a plurality of treatment chambers that perform treatment of different treatment types on a substrate; a transfer device that transfers the substrate; and a controller that controls the transfer of the substrate by the transfer device and the substrate treatment in each of the plurality of treatment chambers, wherein the controller is configured to enable fixation of a time required for pulling up the substrate from each of the treatment chambers for each treatment type and creation of a transfer schedule for transferring the substrate among the plurality of treatment chambers of the plurality of treatment types and treating the substrate so as to maximize a throughput, and enable correction of the transfer schedule so as to extend, based on a waiting time of the transfer device after storage of the substrate into a treatment chamber of one treatment type and a waiting time of the treatment chamber after treatment of the substrate in the treatment chamber of the one treatment type, a time required for pulling up the substrate from a treatment chamber of an immediately previous treatment type in transfer order of the substrate.

2 . The substrate treatment apparatus according to claim 1 , wherein the controller controls the transfer of the substrate by the transfer device and the treatment of the substrate in each of the plurality of treatment chambers based on the transfer schedule after correction.

3 . The substrate treatment apparatus according to claim 1 , wherein the controller adds, to the time required for pulling up the substrate from the treatment chamber of the immediately previous treatment type, a shorter waiting time between the waiting time of the transfer device after storage of the substrate into the treatment chamber of one treatment type and the waiting time of the treatment chamber after treatment of the substrate in the treatment chamber of the one treatment type, or a time obtained by subtracting a predetermined time from the shorter waiting time.

4 . The substrate treatment apparatus according to claim 3 , wherein the controller creates the transfer schedule with respect to each of a plurality of substrates, calculates for each treatment type the minimum value out of the waiting time of the transfer device after storage of the substrate into the treatment chamber of one treatment type and the waiting time of the treatment chamber after treatment of the substrate in the treatment chamber of the one treatment type, with respect to each of the plurality of substrates, and adds the minimum time, or a time obtained by subtracting a predetermined time from the minimum value, to the time required for pulling up the substrate from the treatment chamber of the immediately previous treatment type of each treatment type.

5 . The substrate treatment apparatus according to claim 1 , wherein, when a throughput in the substrate treatment apparatus decreases due to extension of the time required for pulling up the substrate from the treatment chamber of the immediately previous treatment type, the controller makes a correction to reduce the extended amount of the pulling-up required time, or uses the transfer schedule before correction.

6 . The substrate treatment apparatus according to claim 1 , wherein the controller performs extension of the time required for pulling up the substrate by reducing the pulling-up speed of the substrate by the transfer device and/or by setting or extending a waiting time in the treatment chamber of the immediately previous treatment type after pulling-up of the substrate from the immediately previous treatment chamber.

7 . The substrate treatment apparatus according to claim 1 , wherein the controller determines whether the extension of the pulling-up required time is permitted, and makes a correction to extend the pulling-up required time when the extension is permitted.

8 . The substrate treatment apparatus according to claim 2 , wherein the controller determines whether the extension of the pulling-up required time is permitted, and makes a correction to extend the pulling-up required time when the extension is permitted.

9 . The substrate treatment apparatus according to claim 3 , wherein the controller determines whether the extension of the pulling-up required time is permitted, and makes a correction to extend the pulling-up required time when the extension is permitted.

10 . The substrate treatment apparatus according to claim 4 , wherein the controller determines whether the extension of the pulling-up required time is permitted, and makes a correction to extend the pulling-up required time when the extension is permitted.

11 . The substrate treatment apparatus according to claim 5 , wherein the controller determines whether the extension of the pulling-up required time is permitted, and makes a correction to extend the pulling-up required time when the extension is permitted.

12 . The substrate treatment apparatus according to claim 6 , wherein the controller determines whether the extension of the pulling-up required time is permitted, and makes a correction to extend the pulling-up required time when the extension is permitted.

13 . The substrate treatment apparatus according to claim 1 , wherein the substrate is transferred in a state of being held on a substrate holding member.

14 . A controller of a substrate treatment apparatus, the controller comprising:
a transfer schedule creation part that creates a transfer schedule for transferring the substrate among a plurality of treatment chambers of different treatment types and treating the substrate; and a correction part that makes a correction to extend, based on a waiting time of the transfer device after storage of the substrate into a treatment chamber of one treatment type and a waiting time of the treatment chamber after treatment of the substrate in the treatment chamber of the one treatment type, a time required for pulling up the substrate from a treatment chamber of an immediately previous treatment type in transfer order of the substrate.

15 . A method for controlling a substrate treatment apparatus, the method comprising:
creating a transfer schedule for transferring the substrate among a plurality of treatment chambers of different treatment types and treating the substrate; and making a correction to extend, based on a waiting time of the transfer device after storage of the substrate into a treatment chamber of one treatment type and a waiting time of the treatment chamber after treatment of the substrate in the treatment chamber of the one treatment type, a time required for pulling up the substrate from a treatment chamber of an immediately previous treatment type in transfer order of the substrate.

16 . A memory medium that stores a program for causing a computer to execute a method for controlling a substrate treatment apparatus, the memory medium storing a program for causing the computer to execute:
creating a transfer schedule for transferring the substrate among a plurality of treatment chambers of different treatment types and treating the substrate, and making a correction to extend, based on a waiting time of the transfer device after storage of the substrate into a treatment chamber of one treatment type and a waiting time of the treatment chamber after treatment of the substrate in the treatment chamber of the one treatment type, a time required for pulling up the substrate from a treatment chamber of an immediately previous treatment type in transfer order of the substrate.

Assignees

• Ebara Corp

Inventors

• Mitsuya Takashi

Classifications

• H10P72/3308

  Vertical transfer of a single workpiece · CPC title

• H10P72/3304

  characterised by movements or sequence of movements of transfer devices · CPC title

• H10P72/3302

  Mechanical parts of transfer devices · CPC title

• H10P72/0456

  in-line arrangement · CPC title

• H10P72/0452

  characterised by the layout of the process chambers · CPC title