Porous chemical mechanical polishing pads

Patent metadata

Field	Value
Publication number	US-2019224809-A1
Application number	US-201916373121-A
Country	US
Kind code	A1
Filing date	Apr 2, 2019
Priority date	Jan 19, 2016
Publication date	Jul 25, 2019
Grant date	—

Abstract

Implementations disclosed herein generally relate to polishing articles and methods for manufacturing polishing articles used in polishing processes. More specifically, implementations disclosed herein relate to porous polishing pads produced by processes that yield improved polishing pad properties and performance, including tunable performance. Additive manufacturing processes, such as three-dimensional printing processes provides the ability to make porous polishing pads with unique properties and attributes.

First claim

1 . A resin precursor composition, comprising:
a first precursor formulation, comprising:
a first resin precursor component that comprises a multifunctional acrylate oligomer;
a second resin precursor component that comprises a multifunctional acrylate monomer;
a surfactant; and
a porosity-forming agent selected from glycols, water, water-soluble inert materials, water-containing hydrophilic polymers, hydrophilic polymerizable monomers, and combinations thereof,
wherein the first precursor formulation has a first viscosity that enables the first precursor formulation to be dispensed to form a portion of a polishing article by an additive manufacturing process.

2 . The resin precursor composition of claim 1 , further comprising a first curing agent that comprises a photoinitiator.

3 . The resin precursor composition of claim 2 , wherein the photoinitiator is selected from benzoin ethers, benzyl ketals, acetyl phenones, alkyl phenones phosphine oxides, benzophenone compounds, thioxanthone compounds, or combinations thereof.

4 . The resin precursor composition claim 1 , wherein the surfactant is a non-ionic surfactant having an HLB value ranging from 4 to about 14.

5 . The resin precursor composition of claim 1 , wherein the surfactant is selected from anionic surfactants, non-ionic surfactants, cationic surfactants, amphoteric surfactants, or combinations thereof.

6 . The resin precursor composition of claim 1 , wherein the surfactant is a low HLB surfactant having an HLB of 10 or less.

7 . The resin precursor composition of claim 1 , wherein the surfactant has a low HLB value in a range of 3 to 6 and is selected from sorbitan monostearate, sorbitan distearate, sorbitan tristearate, polyglycerol oleates, lecithin, sorbitan monooleate, glycerol monooleate, or combinations thereof.

8 . The resin precursor composition of claim 1 , wherein the surfactant has a low HLB value and is selected from lanolin, lanolin alcohols, or combinations thereof.

9 . The resin precursor composition of claim 1 , wherein water is present between 5 wt. % to about 30 wt. % of the first resin precursor formulation.

10 . The resin precursor composition of claim 1 , wherein the first resin precursor component comprises an aliphatic multifunctional urethane acrylate that has a functionality that is greater than or equal to 2.

11 . The resin precursor composition of claim 10 , wherein the second resin precursor component comprises 2-ethylhexyl acrylate, octyldecyl acrylate, cyclic trimethylolpropane formal acrylate, caprolactone acrylate, alkoxylated lauryl methacrylate, or combinations thereof.

12 . The resin precursor composition of claim 1 , wherein the first viscosity is from about 15 cP to about 30 cP at 70 degrees Celsius.

13 . The resin precursor composition of claim 1 , wherein the multifunctional acrylate oligomer is an aliphatic multifunctional urethane acrylate oligomer, and the second resin precursor component further comprises a multifunctional acrylate monomer.

14 . The resin precursor composition of claim 1 , wherein the first resin precursor component forms a material that has a glass transition temperature that is greater than 40 degrees Celsius, and an amount of the first resin precursor component is greater than an amount of the second resin precursor component in the first precursor formulation.

15 . The resin precursor composition of claim 1 , wherein the surfactant is an ionic surfactant selected from tetrabutylammonium tetrabutyl, tetrafluoroborate, hexafluorophosphate, tetrabutylammonium benzoate, or combinations thereof.

16 . The resin precursor composition of claim 15 , further comprising glycol.

17 . A porous polishing pad formed using the resin precursor composition of claim 1 .

18 . The porous polishing pad of claim 17 , wherein the porous polishing pad has a void volume fraction of about 1% to about 20%.

19 . The porous polishing pad of claim 17 , comprising:
a composite polishing pad body, having:
a first grooved surface; and
a second flat surface opposite the first grooved surface.

20 . A method of forming a porous polishing pad, comprising:
depositing a plurality of composite layers with a 3D printer to reach a target thickness, wherein depositing the plurality of composite layers comprises:
dispensing one or more droplets of a curable resin precursor composition onto a support; and
dispensing one or more droplets of a porosity-forming composition onto the support, wherein at least one component of the porosity-forming composition is removable to form the pores in the porous polishing pad.

Assignees

• Applied Materials Inc

Inventors

• Ganapathiappan Sivapackia
• Patibandla Nag B
• Bajaj Rajeev
• Redfield Daniel
• Redeker Fred C
• Orilall Mahendra C
• Fu Boyi
• Yamamura Mayu
• Chockalingam Ashwin

Classifications

• B24B37/22 Primary

  characterised by a multi-layered structure · CPC title

• B24B37/24 Primary

  characterised by the composition or properties of the pad materials · CPC title

• B33Y80/00

  Products made by additive manufacturing · CPC title

• B33Y10/00

  Processes of additive manufacturing · CPC title

• B24B37/26

  characterised by the shape of the lapping pad surface, e.g. grooved · CPC title