Carbon-based Nano-thin Film for Enhancing Surface Abrasion Resistance on Sapphire Thin Film

Patent metadata

Field	Value
Publication number	US-2019169735-A1
Application number	US-201916266113-A
Country	US
Kind code	A1
Filing date	Feb 4, 2019
Priority date	Dec 23, 2011
Publication date	Jun 6, 2019
Grant date	—

Abstract

The present disclosure relates to display, windows, camera cover, lens and lens cover, optical/infra-red sensors, glasses and spectacles.

First claim

1 . A method of enhancing surface abrasion resistance on a substrate comprising depositing a carbon-based film with a thickness of no more than 100 nm on to said substrate such that the carbon-based film deposited substrate has an optical transmittance of at least 70%.

2 . The method of claim 1 , wherein the substrate comprises glass, quartz, fused silica, metals and sapphire.

3 . The method of claim 1 , wherein said depositing comprises physical vapor deposition and/or chemical vapor deposition.

4 . The method of claim 3 , wherein the physical vapor deposition comprises DC sputtering, RF sputtering, thermal evaporation, and e-beam evaporation.

5 . The method of claim 3 , wherein said chemical vapor deposition is plasma enhanced chemical vapor deposition.

6 . The method of claim 1 , wherein said deposition is carried out in a temperature from about room temperature to about 800° C.

7 . The method of claim 1 , wherein said carbon-based film comprises one or more of C60, carbon nano-tube, graphene, graphite, diamond-like carbon, and/or metal.

8 . The method of claim 7 , wherein the carbon-based film comprises graphite and metal in which the metal is deposited as a precursor to enhance adhesion between the substrate and the carbon-based film, and wherein the thickness ratio between the metal layer and the carbon-based film is no more than 1:10.

9 . The method of claim 7 , wherein the metal is deposited by physical vapor deposition comprising DC sputtering, RF sputtering and e-beam evaporation.

10 . The method of claim 7 wherein said metal comprises aluminium, silver, chromium, titanium, and magnesium.

11 . The method of claim 7 , wherein said metal is deposited at a temperature from about room temperature to 900° C.

12 . The method of claim 2 , wherein the carbon-based film deposited sapphire has a hardness of up to 9.5 mohs.

13 . The method of claim 1 , wherein the carbon-based film deposited substrate has an optical transmittance of 70-99%.

14 . The method of claim 1 , wherein the thickness of the carbon-based film is less than 30 nm.

15 . A sapphire film coated substrate prepared by the method of claim 1 .

Assignees

• Univ Hong Kong Baptist Univ

Inventors

• Cheah Kok Wai
• Tse Shing Chi
• Tam Hoi Lam

Classifications

• C23C16/26

  Deposition of carbon only · CPC title

• C23C14/0605

  Carbon · CPC title

• C23C14/025

  Metallic sublayers · CPC title

• C03C17/3644

  the metal being silver · CPC title

• C03C17/3441

  comprising carbon, a carbide or oxycarbide · CPC title