In vitro exposure system

Patent metadata

Field	Value
Publication number	US-2019161721-A1
Application number	US-201816136019-A
Country	US
Kind code	A1
Filing date	Sep 19, 2018
Priority date	Nov 29, 2017
Publication date	May 30, 2019
Grant date	—

Abstract

Disclosed is an in vitro exposure system that may radiate a uniform field having a constant wavefront to an experimental cell container and expose each cell container to a same electromagnetic field.

First claim

What is claimed is:

1 . A chamber-type cell exposure device, comprising:
a uniform field controller configured to radiate an electromagnetic field to a uniform field area formed around a position of a cell container arranged in the chamber-type cell exposure device; a temperature sensor configured to sense an internal temperature of the chamber-type cell exposure device that increases by the electromagnetic field radiated to the uniform field area; an air-cooling ventilation controller configured to control an air flow by adjusting an internal ventilation speed of the chamber-type cell exposure device based on the internal temperature sensed by the temperature sensor; a detachable support configured to adjust a position of the cell container to be arranged in the uniform field area; a planar scan probe configured to monitor a flatness and an exposure efficiency of the electromagnetic field radiated from the uniform field controller based on an amount of the electromagnetic field exposed to the uniform field area; and a position controller configured to control a position of the planar scan probe.

2 . The chamber-type cell exposure device of claim 1 , wherein the uniform field controller comprises:
an antenna configured to radiate the electromagnetic field; and at least one lens configured to form a wavefront of the electromagnetic field.

3 . The chamber-type cell exposure device of claim 1 , wherein the uniform field controller is further configured to radiate the electromagnetic field to the uniform field area using the flatness determined by a strength of the electromagnetic field in the uniform field area in which the cell container is arranged and a phase of a wavefront of the electromagnetic field.

4 . The chamber-type cell exposure device of claim 1 , wherein the cell container has an electromagnetic field absorptance that varies based on a direction of the electromagnetic field radiated from the uniform field controller.

5 . The chamber-type cell exposure device of claim 1 , wherein the detachable support is at a height adjusted to allow the cell container to be arranged in an area with an identical exposure intensity and an identical phase of the electromagnetic field based on a uniformity of the electromagnetic field in the uniform field area.

6 . The chamber-type cell exposure device of claim 1 , wherein the detachable support is provided in a form that prevents a scattering distortion of the electromagnetic field radiated from the uniform field controller.

7 . The chamber-type cell exposure device of claim 1 , wherein the planar scan probe is arranged in the chamber-type cell exposure device in a direction that is 90 degrees (°) of rotation different from a main polarized direction of the electromagnetic field radiated from the uniform field controller.

8 . The chamber-type cell exposure device of claim 7 , wherein the planar scan probe is further configured to measure a distortion of the electromagnetic field by a signal reflected from a wave absorber of the chamber-type cell exposure device at a position at which the planar scan probe is arranged in the chamber-type cell exposure device, and to measure the amount of the electromagnetic field exposed based on the measured distortion of the electromagnetic field.

9 . The chamber-type cell exposure device of claim 8 , wherein the planar scan probe is further configured to determine a characteristic of a wavefront of the electromagnetic field with an identical exposure intensity and an identical phase of the electromagnetic field based on the flatness and the exposure efficiency of the electromagnetic field.

10 . An in vitro exposure system comprising:
a signal generation device configured to generate an electromagnetic field to be radiated to a cell container; a power monitoring device configured to monitor power of the electromagnetic field; a chamber-type cell exposure device configured to radiate the electromagnetic field to a uniform field area formed around a position at which at least one cell container is arranged and expose each of the cell container to the same electromagnetic field; and a control device configured to control an operation of the chamber-type cell exposure device.

11 . The in vitro exposure system of claim 10 , wherein the signal generation device comprises:
a signal generator configured to generate the electromagnetic field; a power amplifier configured to amplify the generated electromagnetic field; an isolator configured to perform filtering on an electromagnetic field amplified by the power amplifier; a directional coupler configured to measure a reflection level of a reflected signal of the electromagnetic field amplified by the power amplifier, and determine a threshold value of the measured reflection level; and an adaptor configured to feed, to the chamber-type cell exposure device, the electromagnetic field obtained through the filtering performed by the isolator.

12 . The in vitro exposure system of claim 10 , wherein the power monitoring device comprises:
a power sensor configured to sense power at a reflection level determined from the signal generation device; and a power meter configured to measure power of the electromagnetic field measured from the chamber-type cell exposure device.

13 . The in vitro exposure system of claim 10 , wherein the chamber-type cell exposure device comprises:
a uniform field controller configured to radiate the electromagnetic field to the uniform field area formed around the position of the cell container arranged in the chamber-type cell exposure device; a temperature sensor configured to sense an internal temperature of the chamber-type cell exposure device that increases by the electromagnetic field radiated to the uniform field area; an air-cooling ventilation controller configured to control an air flow by adjusting an internal ventilation speed of the chamber-type cell exposure device based on the internal temperature sensed by the temperature sensor; a detachable support configured to adjust a position of the cell container to be arranged in the uniform field area; a planar scan probe configured to monitor a flatness and an exposure efficiency of the electromagnetic field radiated from the uniform field controller based on an amount of the electromagnetic field exposed to the uniform field area; and a position controller configured to control a position of the planar scan probe.

14 . The in vitro exposure system of claim 13 , wherein the uniform field controller is further configured to radiate the electromagnetic field to the uniform field area using the flatness determined by a strength of the electromagnetic field and a phase of a wavefront of the electromagnetic field in the uniform field area in which the cell container is arranged.

15 . The in vitro exposure system of claim 13 , wherein the detachable support is at a height adjusted to allow the cell container to be arranged in an area with an identical exposure intensity and an identical phase of the electromagnetic field based on a uniformity of the electromagnetic field in the uniform field area.

16 . The in vitro exposure system of claim 13 , wherein the detachable support is provided in a form that prevents a scattering distortion of the electromagnetic field radiated from the uniform field controller.

17 . The in vitro exposure system of claim 13 , wherein the planar scan probe is arranged in the chamber-type cell exposure device in a direction that is 90 degrees (°) of rotation different from a main polarized direction o

Assignees

• Electronics & Telecommunications Res Inst
• Found Res & Business Seoul Nat Univ Sci & Tech

Inventors

• Lee Young Seung
• Chung Jae-Young
• Jeon Sang Bong

Classifications

• C12M25/02

  Membranes; Filters (filters or filtration in general B01D24/00-B01D41/00) · CPC title

• C12M23/34

  Internal compartments or partitions · CPC title

• C12M35/06 Primary

  Magnetic means (C12M35/02 takes precedence) · CPC title

• C12M35/02 Primary

  Electrical or electromagnetic means, e.g. for electroporation or for cell fusion · CPC title

• C12M35/04

  Mechanical means, e.g. sonic waves, stretching forces, pressure or shear stimuli · CPC title