Dielectric layer with improved thermally conductivity

US2019136109A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2019136109-A1
Application numberUS-201816181415-A
CountryUS
Kind codeA1
Filing dateNov 6, 2018
Priority dateNov 7, 2017
Publication dateMay 9, 2019
Grant date

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

In an embodiment the dielectric layer comprises a fluoropolymer, a plurality of boron nitride particles, a plurality of titanium dioxide particles, a plurality of silica particles; and a reinforcing layer. The dielectric layer can comprise at least one of 20 to 45 volume percent of the fluoropolymer, 15 to 35 volume percent of the plurality of boron nitride particles, 1 to 32 volume percent of the plurality of titanium dioxide particles, 10 to 35 volume percent of the plurality of silica particles, and 5 to 15 volume percent of the reinforcing layer; wherein the volume percent values are based on a total volume of the dielectric layer.

First claim

Opening claim text (preview).

1 . A dielectric layer comprising: 25 to 45 volume percent of a fluoropolymer; 15 to 35 volume percent of a plurality of boron nitride particles; 1 to 32 volume percent of a plurality of titanium dioxide particles; 0 to 35 volume percent of a plurality of silica particles; and 5 to 15 volume percent of a reinforcing layer; wherein the volume percent values are based on a total volume of the dielectric layer. 2 . The dielectric layer of claim 1 , wherein the fluoropolymer comprises poly(chlorotrifluoroethylene), poly(chlorotrifluoroethylene-propylene), poly(ethylene-tetrafluoroethylene), poly(ethylene-chlorotrifluoroethylene), poly(hexafluoropropylene), poly(tetrafluoroethylene), poly(tetrafluoroethylene-ethylene-propylene), poly(tetrafluoroethylene-hexafluoropropylene), poly(tetrafluoroethylene-propylene), poly(tetrafluoroethylene-perfluoropropylene vinyl ether), a copolymer having a tetrafluoroethylene backbone with a fully fluorinated alkoxy side chain, polyvinylfluoride, polyvinylidene fluoride, poly(vinylidene fluoride-chlorotrifluoroethylene), perfluoropolyether, perfluorosulfonic acid, perfluoropolyoxetane, or a combination comprising at least one of the foregoing. 3 . The dielectric layer of claim 1 , wherein the fluoropolymer comprises polytetrafluoroethylene. 4 . The dielectric layer of claim 1 , wherein the dielectric layer comprises 15 to 30 volume percent of the plurality of boron nitride particles. 5 . The dielectric layer of claim 1 , wherein the plurality of boron nitride particles comprises boron nitride platelets. 6 . The dielectric layer of claim 1 , wherein the plurality of boron nitride particles has a boron nitride D 50 value of 5 to 40 micrometers. 7 . The dielectric layer of claim 1 , wherein the dielectric layer comprises 5 to 10 volume percent of the plurality of titanium dioxide particles. 8 . The dielectric layer of claim 1 , wherein the titanium dioxide comprises rutile titanium dioxide. 9 . The dielectric layer of claim 1 , wherein the plurality of titanium dioxide particles comprises irregularly shaped particles, each independently having a plurality of flat surfaces. 10 . The dielectric layer of claim 1 , wherein the titanium dioxide D 50 value is 1 to 40 micrometers. 11 . The dielectric layer of claim 1 , wherein the dielectric layer comprises 15 to 25 volume percent of the plurality of silica particles. 12 . The dielectric layer of claim 1 , wherein the plurality of silica particles has a silica D 50 value of 5 to 15 micrometers. 13 . The dielectric layer of claim 1 , wherein the silica comprises amorphous silica. 14 . The dielectric layer of claim 1 , wherein one or more of the plurality of boron nitride particles, the plurality of titanium dioxide particles, and the plurality of silica particles comprise a surface treatment. 15 . The dielectric layer of claim 1 , wherein the reinforcing layer comprises a woven fiberglass reinforcement or a non-woven fiberglass reinforcement. 16 . A method of making the dielectric layer of claim 1 , comprising: impregnating the reinforcing layer with a mixture comprising the fluoropolymer, the plurality of boron nitride particles, the plurality of titanium dioxide particles, and the plurality of silica particles to form the dielectric layer; wherein the impregnating optionally comprises dip coating or casting. 17 . A method of making the dielectric layer of claim 1 , comprising: forming a mixture comprising the fluoropolymer, the plurality of boron nitride particles, the plurality of titanium dioxide particles, the plurality of silica particles, and a plurality of glass fibers; and forming the dielectric layer from the mixture; wherein the forming the dielectric layer optionally comprises paste extruding and calendering. 18 . An article comprising the dielectric layer of claim 1 . 19 . A multilayer circuit board comprising the dielectric layer of claim 1 . 20 . The multilayer circuit board of claim 19 , wherein the dielectric layer has a z-direction thermal conductivity of 1 to 2 W/mK.

Assignees

Inventors

Classifications

  • Organic materials · CPC title

  • having a laminate or multilayered structure, e.g. direct bond copper [DBC] ceramic substrates · CPC title

  • Homopolymers or copolymers of tetrafluoroethene · CPC title

  • with silicon-containing compounds · CPC title

  • Flakes, flat particles or lamellar particles · CPC title

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What does patent US2019136109A1 cover?
In an embodiment the dielectric layer comprises a fluoropolymer, a plurality of boron nitride particles, a plurality of titanium dioxide particles, a plurality of silica particles; and a reinforcing layer. The dielectric layer can comprise at least one of 20 to 45 volume percent of the fluoropolymer, 15 to 35 volume percent of the plurality of boron nitride particles, 1 to 32 volume percent of …
Who is the assignee on this patent?
Rogers Corp
What technology area does this patent fall under?
Primary CPC classification C09K5/14. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu May 09 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).