Nozzle-type electron beam irradiation device, and electron beam sterilization equipment equipped with same

US2019134241A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2019134241-A1
Application numberUS-201616094312-A
CountryUS
Kind codeA1
Filing dateDec 26, 2016
Priority dateApr 18, 2016
Publication dateMay 9, 2019
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A nozzle-type electron beam irradiation device includes a vacuum chamber, an electron beam generator disposed in the vacuum chamber, and a vacuum nozzle that is connected to the vacuum chamber so as to guide an electron beam from the electron beam generator and emit the electron beam to the outside. The nozzle-type electron beam irradiation device includes a high-vacuum pump capable of sucking gas from the vicinity of the connecting part of the vacuum nozzle in the vacuum chamber.

First claim

Opening claim text (preview).

1 . A nozzle-type electron beam irradiation device comprising a vacuum chamber, an electron beam generator disposed in the vacuum chamber, and a vacuum nozzle that is connected to the vacuum chamber so as to guide an electron beam from the electron beam generator and emit the electron beam to outside, the electron beam irradiation device further comprising a high-vacuum pump capable of sucking gas from vicinity of a connecting part of the vacuum nozzle in the vacuum chamber. 2 . The nozzle-type electron beam irradiation device according to claim 1 , wherein the high-vacuum pump is an ion pump, and the ion pump is provided with a magnetic shielding member that prevents a magnetic field from the ion pump from affecting an electron beam generated from the electron beam generator. 3 . The nozzle-type electron beam irradiation device according to claim 2 , wherein the magnetic shielding member is a magnetic shield surrounding the ion pump. 4 . The nozzle-type electron beam irradiation device according to claim 2 , wherein the magnetic shielding member is a retraction pipe that connects the ion pump and the vacuum chamber and places the ion pump at a retraction position. 5 . Electron beam sterilization equipment comprising: a turn table having the at least one nozzle-type electron beam irradiation device according to claim 1 , on an outer edge of the turn table; and a flange that fixes the nozzle-type electron beam irradiation device on the turn table, the flange connecting the vacuum chamber, the vacuum nozzle, and the high-vacuum pump of the nozzle-type electron beam irradiation device. 6 . The electron beam sterilization equipment according to claim 5 , wherein the high-vacuum pump faces the center of the turn table. 7 . The electron beam sterilization equipment according to claim 5 , wherein the at least one nozzle-type electron beam irradiation device disposed on the turn table comprises a plurality of nozzle-type electron beam irradiation devices, the high-vacuum pump of the nozzle-type electron beam irradiation device faces the outside of the turn table and is disposed between the adjacent nozzle-type electron beam irradiation devices, and the magnetic shielding member of the nozzle-type electron beam irradiation device prevents a magnetic field from the ion pump of the nozzle-type electron beam irradiation device from affecting an electron beam generated from the electron beam generator of the adjacent nozzle-type electron beam irradiation device.

Assignees

Inventors

Classifications

  • A61L2/087Primary

    Particle radiation, e.g. electron-beam, alpha or beta radiation · CPC title

  • Details {(vessels for operation at high tension H01J5/06)} · CPC title

  • B65B55/08Primary

    by irradiation · CPC title

  • magnetic · CPC title

  • with provision for relative movement of beam source and object to be irradiated · CPC title

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What does patent US2019134241A1 cover?
A nozzle-type electron beam irradiation device includes a vacuum chamber, an electron beam generator disposed in the vacuum chamber, and a vacuum nozzle that is connected to the vacuum chamber so as to guide an electron beam from the electron beam generator and emit the electron beam to the outside. The nozzle-type electron beam irradiation device includes a high-vacuum pump capable of sucking …
Who is the assignee on this patent?
Hitachi Shipbuilding Eng Co
What technology area does this patent fall under?
Primary CPC classification A61L2/087. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Thu May 09 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).