Device and process for marking an ophthalmic lens with a pulsed laser of wavelength and energy selected per pulse

US2019022921A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2019022921-A1
Application numberUS-201816145266-A
CountryUS
Kind codeA1
Filing dateSep 28, 2018
Priority dateSep 20, 2013
Publication dateJan 24, 2019
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A device for marking an ophthalmic lens (3), the lens (3) being made of at least one preset material, includes a laser (1) configured to produce permanent engravings on the lens (3) and configured to emit a focused beam of pulsed ultraviolet laser radiation that includes at least one radiation wavelength ranging between 200 nm and 300 nm, has a pulse length ranging between about 0.1 ns and about 5 ns, and has an energy per pulse ranging between about 5 μJ and about 100 μJ. A laser marking process configured to produce permanent engravings on an ophthalmic lens (3) via this device is also described.

First claim

Opening claim text (preview).

1 . A device for marking an ophthalmic lens, said ophthalmic lens being produced from at least one predetermined material, including a laser configured to produce permanent engravings on the ophthalmic lens, wherein the laser is configured to emit a focused pulsed beam of ultraviolet laser radiation, the focused beam having at least the following parameters: a radiation wavelength comprised between 200 nm and 300 nm; a pulse duration comprised between about 0.1 ns and about 5 ns; and an energy per pulse at the focal point comprised between about 10 μJ and about 80 μJ. 2 . The device as claimed in claim 1 , wherein the energy per pulse at the focal point is comprised between about 10 μJ and about 65 μJ. 3 . The device as claimed in claim 1 , wherein the energy per pulse at the focal point is comprised between about 10 μJ and about 60 μJ. 4 . The device as claimed in claim 1 , wherein the focused beam of ultraviolet laser radiation has a peak power comprised between about 2.5 kW and about 1 MW. 5 . The device as claimed in claim 4 , wherein the peak power is comprised between about 10 kW and about 100 kW. 6 . The device as claimed in claim 1 , wherein the focused beam of ultraviolet laser radiation has a pulse frequency comprised between about 100 Hz and about 10 kHz. 7 . The device as claimed in claim 6 , wherein the pulse frequency is comprised between about 100 Hz and about 1 kHz. 8 . The device as claimed in claim 1 , wherein the pulse duration is comprised between about 0.1 ns and about 2 ns. 9 . The device as claimed in claim 1 , wherein the radiation wavelength of the focused ultraviolet laser beam is comprised between about 230 nm and about 290 nm and preferably about 266 nm. 10 . The device as claimed in claim 1 , wherein the laser source is configured to emit a pulsed beam of laser radiation having an energy per pulse comprised between about 30 μJ and about 80 μJ. 11 . The device as claimed in claim 10 , wherein the energy per pulse emitted by the laser source is comprised between about 35 μJ and about 80 μJ. 12 . The device as claimed in claim 10 , wherein the energy per pulse emitted by the laser source is comprised between about 40 μJ and about 60 μJ. 13 . The device as claimed in claim 1 , further including an optical assembly provided with an F-theta lens, which lens is configured to focus a beam of ultraviolet laser radiation onto a focal plane of the F-theta lens with a focused beam diameter in the focal plane of the order of about 20 μm to about 50 μm. 14 . The device as claimed in claim 13 , wherein the optical assembly includes an energy attenuator configured to regulate a fluence of the beam of ultraviolet radiation focused on a surface of the ophthalmic lens to be marked according to a plurality of operating modes of the attenuator, which modes each define a determined fluence value. 15 . A process for marking an ophthalmic lens produced from at least one predetermined material, the process being implemented by a device as claimed in claim 1 , and the process including a step of laser marking permanent engravings on the lens, which marking step includes a step of emitting a focused pulsed beam of ultraviolet laser radiation having at least the following parameters: a radiation wavelength comprised between 200 nm and 300 nm; a pulse duration comprised between about 0.1 ns and about 5 ns; and an energy per pulse at the focal point comprised between about 10 μJ and about 80 μJ.

Assignees

Inventors

Classifications

  • by shaping pulses · CPC title

  • Texturing · CPC title

  • taking account of the properties of the material involved (B23K26/32, B23K26/40 take precedence) · CPC title

  • for deburring or mechanical trimming (B23K26/351 takes precedence) · CPC title

  • Inorganic materials other than metals or composite materials · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2019022921A1 cover?
A device for marking an ophthalmic lens (3), the lens (3) being made of at least one preset material, includes a laser (1) configured to produce permanent engravings on the lens (3) and configured to emit a focused beam of pulsed ultraviolet laser radiation that includes at least one radiation wavelength ranging between 200 nm and 300 nm, has a pulse length ranging between about 0.1 ns and abou…
Who is the assignee on this patent?
Essilor Int
What technology area does this patent fall under?
Primary CPC classification B23K26/0006. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Jan 24 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).