Targeted performance of hypohalite methods thereof

US2018355289A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018355289-A1
Application numberUS-201816053588-A
CountryUS
Kind codeA1
Filing dateAug 2, 2018
Priority dateFeb 17, 2012
Publication dateDec 13, 2018
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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This invention relates to extend the benefits of using hypochlorite compounds such as sodium hypochlorite to clean and disinfect articles while reducing or eliminating the side effects of treating an article with a strong oxidant material. The invention relates to a single step process involving mixing of precursor compositions of a suitable hypohalite or hypohalous acid with a solution of a reducing agent. Optionally a buffer may be present in either or both precursor compositions, such that at time of use such active hypohalous acid concentration in the resulting aqueous mixture remains at a sufficient activity level to effect one or more desired benefits against a target substrate for a desired period of time. The oxidant is substantially consumed by reaction with the reducing agent after the time needed for achieving the desired benefit has passed.

First claim

Opening claim text (preview).

1 . A method for treating a surface, the method comprising: providing a two-part composition comprising: an oxidant first part comprising a hypohalous acid or a hypohalite; and a reductant second part comprising a glucose, wherein the first and second parts are initially separate; and mixing the oxidant first part with the reductant second part to form a mixed composition; and contacting the mixed composition with a surface to provide oxidizing benefits to the surface whereby the oxidant is reduced by the reductant to prevent damage caused by prolonged exposure to the hypohalous acid or the hypohalite. 2 . The method of claim 1 , wherein the hypohalous acid or the hypohalite comprises from about 0.001% to about 10% by weight of the two-part composition. 3 . The method of claim 1 , wherein the hypohalous acid or the hypohalite comprises from about 0.005% to about 5% by weight of the two-part composition. 4 . The method of claim 1 , wherein the hypohalous acid or the hypohalite comprises from about 0.005% to about 0.2% by weight of the two-part composition. 5 . The method of claim 1 , further comprising a pH buffer comprising at least one member of an organic acid, a phosphate, a bicarbonate or a carbonate. 6 . The method of claim 5 , wherein the buffer is said carbonate. 7 . The method of claim 5 , wherein the buffer is said phosphate. 8 . The method of claim 5 , wherein the buffer is said bicarbonate. 9 . The method of claim 5 , wherein the buffer is said organic acid. 10 . The method of claim 5 , wherein the second part comprises the buffer. 11 . The method of claim 1 , wherein the oxidant is hypohalite. 12 . The method of claim 1 , wherein the hypohalite is a hypochlorite. 13 . The method of claim 1 , wherein the oxidant is hypohalous acid. 14 . The method of claim 1 , wherein the surface is a hard surface. 15 . The method of claim 1 , wherein the surface is a soft surface.

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What does patent US2018355289A1 cover?
This invention relates to extend the benefits of using hypochlorite compounds such as sodium hypochlorite to clean and disinfect articles while reducing or eliminating the side effects of treating an article with a strong oxidant material. The invention relates to a single step process involving mixing of precursor compositions of a suitable hypohalite or hypohalous acid with a solution of a re…
Who is the assignee on this patent?
Clorox Co
What technology area does this patent fall under?
Primary CPC classification C11D3/3951. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Dec 13 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).