Terminal fitting and connector

US2018316110A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018316110-A1
Application numberUS-201615770429-A
CountryUS
Kind codeA1
Filing dateOct 18, 2016
Priority dateNov 6, 2015
Publication dateNov 1, 2018
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A terminal fitting that can reduce the terminal insertion force and can suppress surface oxidation of a plating film, even if the terminal fitting is exposed to a hot and humid environment, and a connector that uses the terminal fitting. The terminal fitting includes a metal base material, and the plating film. The plating film includes a Ni foundation layer, an outermost layer exposed at the outermost surface, and a Ni3Sn4 layer formed between the Ni foundation layer and the outermost layer. The outermost layer includes a Sn parent phase, and intermetallic compound that is dispersed in the Sn parent phase, and is made of (Ni0.4Pd0.6)Sn4. The intermetallic compound protrudes from the lower side of the outermost layer to the Ni3Sn4 layer side, and is partially buried in the Ni3Sn4 layer. A connector includes the terminal fitting, and a housing that holds the terminal fitting.

First claim

Opening claim text (preview).

1 . A terminal fitting comprising: a metal base material; and a plating film that covers a surface of the metal base material, wherein the plating film includes a Ni foundation layer that is formed on the surface of the metal base material, an outermost layer that is formed above the Ni foundation layer and is exposed at an outermost surface, and a Ni 3 Sn 4 layer that is formed between the Ni foundation layer and the outermost layer, the outermost layer includes a Sn parent phase, and an intermetallic compound that is dispersed in the Sn parent phase, and is made of (Ni 0.4 Pd 0.6 )Sn 4 , and the intermetallic compound protrudes from a lower side of the outermost layer to the Ni 3 Sn 4 layer side, and is partially buried in the Ni 3 Sn 4 layer. 2 . The terminal fitting according to claim 1 , wherein the Ni 3 Sn 4 layer has a thickness of at least 0.4 μm. 3 . The terminal fitting according to claim 1 , wherein the intermetallic compound has a particle diameter in a range from 0.1 to 10 μm. 4 . The terminal fitting according to claim 1 , wherein the intermetallic compound in the outermost layer is exposed from the outermost surface of the plating film. 5 . The terminal fitting according to claim 1 , wherein the outermost layer has a thickness in a range from 0.1 to 4 μm. 6 . A connector comprising: the terminal fitting according to claim 1 ; and a housing that holds the terminal fitting.

Assignees

Inventors

Classifications

  • Terminals having a press fit or a compliant portion and a shank passing through a hole in the printed circuit board · CPC title

  • H01R13/03Primary

    characterised by the material, e.g. plating, or coating materials · CPC title

  • of electroplated tin coatings, e.g. by melting · CPC title

  • for manufacturing contact members, e.g. by punching and by bending · CPC title

  • terminals for insertion into holes · CPC title

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Frequently asked questions

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What does patent US2018316110A1 cover?
A terminal fitting that can reduce the terminal insertion force and can suppress surface oxidation of a plating film, even if the terminal fitting is exposed to a hot and humid environment, and a connector that uses the terminal fitting. The terminal fitting includes a metal base material, and the plating film. The plating film includes a Ni foundation layer, an outermost layer exposed at the o…
Who is the assignee on this patent?
Autonetworks Technologies Ltd, Sumitomo Wiring Systems, Sumitomo Electric Industries
What technology area does this patent fall under?
Primary CPC classification H01R13/03. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Nov 01 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).