Methods of Polishing

US2018297173A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018297173-A1
Application numberUS-201515519700-A
CountryUS
Kind codeA1
Filing dateApr 7, 2015
Priority dateApr 7, 2015
Publication dateOct 18, 2018
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

One example provides a method. The method includes forming a substrate comprising a metal alloy comprising at least one of aluminium, magnesium, lithium, zinc, titanium, niobium, and copper. The method includes polishing a surface of the substrate using particles comprising chromium metal. The polished surface is electrically conductive.

First claim

Opening claim text (preview).

What is claimed: 1 . A method comprising: forming a substrate comprising a metal alloy comprising at least one of aluminium, magnesium, lithium, zinc, titanium, niobium, and copper; and polishing a surface of the substrate using particles comprising chromium metal, wherein the polished surface is electrically conductive. 2 . The method of claim 1 ,wherein the substrate comprises a magnesium alloy. 3 . The method of claim 1 , wherein the forming comprises at least one of forging and computer numerical control machining. 4 . The method of claim 1 , wherein the polishing comprises at least one of mechanically polishing and blasting the surface with the particles. 5 . The method of claim 1 , further comprising: treating the polished surface with an agent; and disposing a coating over the treated surface. 6 . The method claim 1 , wherein the particles are at least substantially free of at least one of silica, silicon carbide, and alumina. 7 . A method comprising: forming a substrate comprising a magnesium alloy; polishing a surface of the substrate using particles comprising chromium metal, wherein the polished surface is electrically conductive; and disposing a coating over the polished surface using at least an electrical current. 8 . The method of claim 7 , further comprising treating the polished by at least one of: cleaning the surface; and activating the surface for the disposing. 9 . The method of claim 7 , wherein the disposing comprises electroplating a transition metal over the polished surface. 10 . The method of claim 7 , wherein the disposing comprises electroplating a transition metal over the polished surface, the transition metal comprising at least one of aluminium zinc, copper, chromium, and nickel. 11 . The method of claim 7 , wherein the disposing comprises electrophoretic deposition. 12 . The method of claim 7 , wherein the disposing comprises electrophoretic deposition using a east one of a polyacrylic polymer and an epoxy-based polymer. 13 . The method of claim 7 , wherein the coating is a functional coating comprising at least one polymer selected from the group consisting of polystyrene, polyimide, polyarelene ether, polyurethane, methylsilsesquioxane, polyethylene, polystyrene silicone, butyl rubber, polyamide, polycarbonate, styrene-butadiene rubber, polyacrylate, epoxy, and fluoropolymer. 14 . A method comprising: forming a substrate comprising a magnesium alloy; polishing a surface of the substrate using particles comprising chromium metal, wherein the polished surface is electrically conductive; treating the polished surface by one of cleaning and surface activation; disposing a first layer comprising a transition metal over the treated surface using electrodeposition; treating the first layer with surface activation; is disposing a second layer over the treated first layer using electrophoretic deposition; and creating a functional coating over the second layer. 15 . The method, of claim 14 , wherein the polishing comprises a least one of mechanically polishing and blasting the surface with the particles.

Assignees

Inventors

Classifications

  • B24D3/34Primary

    characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties · CPC title

  • with organic material · CPC title

  • Mixture of polymers · CPC title

  • B24D3/346Primary

    utilised during polishing, or grinding operation · CPC title

  • Selection of abrasive materials {or additives} for abrasive blasts (polishing compositions C09G) · CPC title

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Frequently asked questions

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What does patent US2018297173A1 cover?
One example provides a method. The method includes forming a substrate comprising a metal alloy comprising at least one of aluminium, magnesium, lithium, zinc, titanium, niobium, and copper. The method includes polishing a surface of the substrate using particles comprising chromium metal. The polished surface is electrically conductive.
Who is the assignee on this patent?
Hewlett Packard Development Co
What technology area does this patent fall under?
Primary CPC classification B24D3/34. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Oct 18 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).