Hard coating and hard coating-covered member

Patent metadata

Field	Value
Publication number	US-2018243837-A1
Application number	US-201515756730-A
Country	US
Kind code	A1
Filing date	Sep 4, 2015
Priority date	Sep 4, 2015
Publication date	Aug 30, 2018
Grant date	—

Abstract

A hard coating, which is to be disposed to cover a surface of a substrate, has a total thickness of 0.5-20 μm, and includes an A layer and nanolayer-alternated layer that are alternately laminated by physical vapor deposition. The nanolayer-alternated layer includes a B layer and a C layer that are alternately laminated. The A layer has a thickness of 50-1000 nm and is AlCr nitride that is represented by a composition formula of [Al1-UCrU]N wherein an atomic ratio U is 0.20-0.80. The B layer has a thickness of 1-100 nm and is TiAl nitride that is represented by a composition formula of [Ti1-WAlW]N wherein an atomic ratio W is 0.30-0.85. The C layer has a thickness of 1-100 nm and is TiSi nitride that is represented by a composition formula of [Ti1-YSiY]N wherein an atomic ratio Y is 0.05-0.45. The nanolayer-alternated layer has a thickness of 50-1000 nm.

First claim

1 . A hard coating that is to be disposed to cover a surface of a substrate, wherein
said hard coating has a total thickness of 0.5-20 μm and includes an A layer and a nanolayer-alternated layer that are alternately laminated by physical vapor deposition, wherein said nanolayer-alternated layer includes a B layer and a C layer that are alternately laminated, said A layer has a thickness of 50-1000 nm and is AlCr nitride that is represented by a composition formula of [Al 1-U Cr U ]N wherein an atomic ratio U is 0.20-0.80, said B layer has a thickness of 1-100 nm and is TiAl nitride that is represented by a composition formula of [Ti 1-W Al W ]N wherein an atomic ratio W is 0.30-0.85, said C layer has a thickness of 1-100 nm and is TiSi nitride that is represented by a composition formula of [Ti 1-Y Si Y ]N wherein an atomic ratio Y is 0.05-0.45, and said nanolayer-alternated layer has a thickness of 50-1000 nm.

2 . The hard coating according to claim 1 , wherein a ratio T A /T NL of the thickness T A of said A layer to a thickness T NL of said nanolayer-alternated layer is 0.2-10.

3 . The hard coating according to claim 1 , wherein said A layer contains additive α that is at least one kind of element selected from a group consisting of Si, V, Y, Zr, Nb, Mo, Ta and W, such that a content ratio of said additive α is not larger than 20 at %.

4 . The hard coating according to claim 1 , wherein said B layer contains additive β that is at least one kind of element selected from a group consisting of B, C, V, Cr, Zr, Nb, Mo, Hf, Ta and W, such that a content ratio of said additive β is not larger than 10 at %.

5 . The hard coating according to claim 1 , wherein said C layer contains additive γ that is at least one kind of element selected from a group consisting of B, C, V, Y, Nb, Mo and W, such that a content ratio of said additive γ is not larger than 10 at %.

6 . The hard coating according to claim 1 , wherein said hard coating is disposed to directly cover the substrate.

7 . The hard coating according to claim 1 , wherein
said hard coating is disposed to cover the substrate via an interface layer, and said interface layer has a thickness of 50-1000 nm, and is made of material substantially the same as material of said A layer, said B layer, said C layer or said nanolayer-alternated layer.

8 . A hard-coating-covered member comprising
said substrate is covered partially or entirely with said hard coating according to claim 1 .

Assignees

• Osg Corp

Inventors

• Sakurai Masatoshi
• Wang Mei
• Sugita Hiroaki

Classifications

• B23B27/148 Primary

  Composition of the cutting inserts · CPC title

• C23C14/0641 Primary

  Nitrides (C23C14/0617 takes precedence) · CPC title

• C23C30/005

  on hard metal substrates · CPC title

• B23B2228/08

  applied by physical vapour deposition [PVD] · CPC title

• B23C5/16

  characterised by physical features other than shape · CPC title