Electrochromic element and method for manufacturing same
US-2024168351-A1 · May 23, 2024 · US
US2018210307A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2018210307-A1 |
| Application number | US-201815934854-A |
| Country | US |
| Kind code | A1 |
| Filing date | Mar 23, 2018 |
| Priority date | Nov 8, 2010 |
| Publication date | Jul 26, 2018 |
| Grant date | — |
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Methods of manufacturing electrochromic windows are described. Insulated glass units (IGU's) are protected, e.g. during handling and shipping, by a protective bumper. The bumper can be custom made using IGU dimension data received from the IGU fabrication tool. The bumper may be made of environmentally friendly materials. Laser isolation configurations and related methods of patterning and/or configuring an electrochromic device on a substrate are described. Edge deletion is used to ensure a good seal between spacer and glass in an IGU and thus better protection of an electrochromic device sealed in the IGU. Configurations for protecting the electrochromic device edge in the primary seal and maximizing viewable area in an electrochromic pane of an IGU are also described.
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1 - 46 . (canceled) 47 . A method of fabricating an electrochromic window comprising: i. coating a rectangular transparent substrate with an electrochromic device; ii. edge deleting a perimeter portion, between about 5 mm and about 15 mm wide, of the electrochromic device about the perimeter of the rectangular transparent substrate; and iii. removing a portion of the electrochromic device along one edge to expose a lower transparent conducting oxide layer to form a bus bar pad expose area. 48 . The method of claim 47 , further comprising applying a first bus bar to the bus bar pad expose area. 49 . The method of claim 48 , wherein the bus bar pad expose area is substantially rectangular, the length approximating said one edge of the electrochromic device and where the width is between about 5 mm and about 10 mm. 50 . The method of claim 49 , wherein the first bus bar and the electrochromic device edge proximate the first bus bar are separated by a gap between about 1 mm and about 3 mm. 51 . The method of claim 50 , wherein the first bus bar is a non-penetrating bus bar. 52 . The method of claim 50 , wherein a second bus bar is applied to a top transparent conducting oxide layer of the electrochromic device and the rectangular transparent substrate is incorporated into an insulated glass unit. 53 . The method of claim 52 , wherein the first and second bus bars are obscured from the viewable area of the insulated glass unit by a spacer of the insulated glass unit. 54 . The method of claim 53 , wherein the peripheral edge of the electrochromic device is sealed within the primary seal of the insulated glass unit. 55 . The method of claim 54 , wherein the bus bar pad expose area is sealed within the primary seal of the insulated glass unit. 56 - 66 . (canceled) 67 . The method of claim 47 , wherein the edge deletion is performed before the forming the bus bar pad expose area. 68 . The method of claim 47 , further comprising applying a first bus bar to the bus bar pad expose area, where the first bus bar overlaps the edge of the bus bar pad expose area and touches the rectangular transparent substrate. 69 . The method of claim 68 , wherein a gap between the first bus bar and the edge of the electrochromic device proximate the first bust bar is between about 1 mm and about 3 mm. 70 . The method of claim 47 , wherein iii comprises using laser ablation to selectively remove materials above the lower transparent conducting oxide layer based on absorption characteristics of the materials above the lower transparent conducting oxide layer. 71 . The method of claim 47 , wherein ii and/or iii comprise using laser ablation from either the electrochromic device side or the opposite side of the rectangular transparent substrate. 72 . The method of claim 71 , wherein the energy density of a laser beam used for laser ablation is between about 0.5 J/cm 2 and about 4 J/cm 2 . 73 . The method of claim 53 , wherein the spacer is an electrically insulated spacer. 74 . The method of claim 73 , wherein the electrically insulated spacer is a metal spacer coated with an electrically insulating material. 75 . The method of claim 73 , wherein the electrically insulated spacer is a polymeric spacer. 76 . The method of claim 75 , wherein the polymeric spacer is a foam spacer. 77 . The method of claim 53 , wherein the spacer includes a desiccant inside it. 78 . The method of claim 53 , wherein the distance between the edge of the rectangular transparent substrate and the outer edge of the spacer is between about 2 mm and about 15 mm.
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