Pressure level sensing device and a method for sensing pressure

US2018202884A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018202884-A1
Application numberUS-201615743678-A
CountryUS
Kind codeA1
Filing dateJul 12, 2016
Priority dateJul 12, 2015
Publication dateJul 19, 2018
Grant date

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  1. Title

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  5. First independent claim

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Abstract

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A pressure sensing device that includes a pressure sensing element that is of microscopic scale and has a pressure level dependent thermal parameter; a signal source that is configured to supply an input electrical signal to the pressure sensing element; and a monitor that is configured to (a) measure electrical output signals generated by the pressure sensing element as a result of the supply of the input electrical signal and (b) estimate a pressure level applied on the pressure sensing element based on the electrical output signals.

First claim

Opening claim text (preview).

We claim: 1 . A pressure sensing device comprising: a pressure sensing element that is of microscopic scale and has a pressure level dependent thermal parameter; a signal source that is configured to supply an input electrical signal to the pressure sensing element; and a monitor that is configured to (a) measure electrical output signals generated by the pressure sensing element as a result of the supply of the input electrical signal and (b) estimate a pressure level applied on the pressure sensing element based on the electrical output signals. 2 . The pressure sensing device according to claim 1 wherein the pressure sensing element is positioned within a chamber and wherein the pressure level applied on the pressure sensing element is a pressure level within the chamber. 3 . The pressure sensing device according to any of the previous claims wherein the pressure sensing element is used solely for sensing pressure. 4 . The pressure sensing device according to any claim of claims 1 - 2 wherein the pressure sensing element is not solely dedicated for sensing pressure. 5 . The pressure sensing device according to any of the previous claims wherein the pressure level dependent parameter is a thermal time constant of the pressure sensing element. 6 . The pressure sensing device according to claim 5 wherein monitor is configured to estimate the thermal time constant of the pressure sensing element based on a steady state electrical output signal and based on an initial rate of change of the electrical output signals. 7 . The pressure sensing device according to claim 5 wherein the input electrical signal comprises spaced apart pulses. 8 . The pressure sensing device according to any of the previous claims wherein the pressure sensing element is a Microelectromechanical Systems (MEMS) element or a Nanoelectromechanical Systems (NEMS) element. 9 . The pressure sensing device according to any of the preceding claims, wherein the pressure sensing element is a suspended transistor that is thermally isolated from a bulk of the pressure sensing device. 10 . The pressure sensing device according to any of the preceding claims wherein the pressure sensing device is manufactured by wafer level packaging technology. 11 . A method for sensing a pressure level applied on a pressure sensing element, the method comprising: supplying an input electrical signal to the pressure sensing element; wherein the pressure sensing element is of microscopic scale and has a pressure level dependent thermal parameter; measuring electrical output signals generated by the pressure sensing element as a result of the supply of the input electrical signal; and estimating a pressure level applied on the pressure sensing element based on the electrical output signals. 12 . The method according to claim 11 wherein the pressure sensing element is positioned within a chamber and wherein the pressure level applied on the pressure sensing element is a pressure level within the chamber. 13 . The method according to any of the previous claims comprising utilizing the pressure sensing element only for sensing pressure. 14 . The method according to any claim of claims 11 - 12 comprising utilizing the pressure sensing element for operations that differ from sensing pressure. 15 . The method according to any of the previous claims wherein the pressure level dependent parameter is a thermal time constant of the pressure sensing element. 16 . The method according to claim 15 comprising estimating the thermal time constant of the pressure sensing element based on a steady state electrical output signal and based on an initial rate of change of the electrical output signals. 17 . The method according to claim 15 wherein the input electrical signal comprises spaced apart pulses. 18 . The method according to any claim of claims 11 - 17 wherein the pressure sensing element is a Microelectromechanical Systems (MEMS) element or a Nanoelectromechanical Systems (NEMS) element. 19 . The method according to any claim of claims 11 - 18 , wherein the pressure sensing element is a suspended transistor that is thermally isolated from a bulk of the pressure sensing device. 20 . The method according to any claim of claims 11 - 19 wherein the pressure sensing device is manufactured by wafer level packaging technology. 21 . A semiconductor device that comprises an enclosure and a semiconductor apparatus that is enclosed in the enclosure; wherein the semiconductor apparatus comprises: a pressure sensing element that is of microscopic scale and has a pressure level dependent thermal parameter; a signal source that is configured to supply, at different points in time, input electrical signals to the pressure sensing element; and a monitor that is configured to (a) measure electrical output signals generated by the pressure sensing element as a result of the supply of the input electrical signals and (b) estimate a pressure level applied within the enclosure based on the electrical output signals. 22 . The semiconductor device according to claim 21 wherein the semiconductor apparatus is a semiconductor die. 23 . The semiconductor device according to any claim of claims 21 - 22 wherein the semiconductor apparatus is manufactured by wafer level packaging.

Assignees

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Classifications

  • Means for protecting the electrolyte or the electrodes · CPC title

  • G01L11/002Primary

    by thermal means, e.g. hypsometer · CPC title

  • G01L21/12Primary

    measuring changes in electric resistance of measuring members, e.g. of filaments; Vacuum gauges of the Pirani type · CPC title

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What does patent US2018202884A1 cover?
A pressure sensing device that includes a pressure sensing element that is of microscopic scale and has a pressure level dependent thermal parameter; a signal source that is configured to supply an input electrical signal to the pressure sensing element; and a monitor that is configured to (a) measure electrical output signals generated by the pressure sensing element as a result of the supply …
Who is the assignee on this patent?
Todos Tech Ltd, Technion Res & Development Found Ltd
What technology area does this patent fall under?
Primary CPC classification G01L11/002. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jul 19 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).