MEMS device with micromachined thermistor
US-9677948-B1 · Jun 13, 2017 · US
US2018202884A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2018202884-A1 |
| Application number | US-201615743678-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 12, 2016 |
| Priority date | Jul 12, 2015 |
| Publication date | Jul 19, 2018 |
| Grant date | — |
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A pressure sensing device that includes a pressure sensing element that is of microscopic scale and has a pressure level dependent thermal parameter; a signal source that is configured to supply an input electrical signal to the pressure sensing element; and a monitor that is configured to (a) measure electrical output signals generated by the pressure sensing element as a result of the supply of the input electrical signal and (b) estimate a pressure level applied on the pressure sensing element based on the electrical output signals.
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We claim: 1 . A pressure sensing device comprising: a pressure sensing element that is of microscopic scale and has a pressure level dependent thermal parameter; a signal source that is configured to supply an input electrical signal to the pressure sensing element; and a monitor that is configured to (a) measure electrical output signals generated by the pressure sensing element as a result of the supply of the input electrical signal and (b) estimate a pressure level applied on the pressure sensing element based on the electrical output signals. 2 . The pressure sensing device according to claim 1 wherein the pressure sensing element is positioned within a chamber and wherein the pressure level applied on the pressure sensing element is a pressure level within the chamber. 3 . The pressure sensing device according to any of the previous claims wherein the pressure sensing element is used solely for sensing pressure. 4 . The pressure sensing device according to any claim of claims 1 - 2 wherein the pressure sensing element is not solely dedicated for sensing pressure. 5 . The pressure sensing device according to any of the previous claims wherein the pressure level dependent parameter is a thermal time constant of the pressure sensing element. 6 . The pressure sensing device according to claim 5 wherein monitor is configured to estimate the thermal time constant of the pressure sensing element based on a steady state electrical output signal and based on an initial rate of change of the electrical output signals. 7 . The pressure sensing device according to claim 5 wherein the input electrical signal comprises spaced apart pulses. 8 . The pressure sensing device according to any of the previous claims wherein the pressure sensing element is a Microelectromechanical Systems (MEMS) element or a Nanoelectromechanical Systems (NEMS) element. 9 . The pressure sensing device according to any of the preceding claims, wherein the pressure sensing element is a suspended transistor that is thermally isolated from a bulk of the pressure sensing device. 10 . The pressure sensing device according to any of the preceding claims wherein the pressure sensing device is manufactured by wafer level packaging technology. 11 . A method for sensing a pressure level applied on a pressure sensing element, the method comprising: supplying an input electrical signal to the pressure sensing element; wherein the pressure sensing element is of microscopic scale and has a pressure level dependent thermal parameter; measuring electrical output signals generated by the pressure sensing element as a result of the supply of the input electrical signal; and estimating a pressure level applied on the pressure sensing element based on the electrical output signals. 12 . The method according to claim 11 wherein the pressure sensing element is positioned within a chamber and wherein the pressure level applied on the pressure sensing element is a pressure level within the chamber. 13 . The method according to any of the previous claims comprising utilizing the pressure sensing element only for sensing pressure. 14 . The method according to any claim of claims 11 - 12 comprising utilizing the pressure sensing element for operations that differ from sensing pressure. 15 . The method according to any of the previous claims wherein the pressure level dependent parameter is a thermal time constant of the pressure sensing element. 16 . The method according to claim 15 comprising estimating the thermal time constant of the pressure sensing element based on a steady state electrical output signal and based on an initial rate of change of the electrical output signals. 17 . The method according to claim 15 wherein the input electrical signal comprises spaced apart pulses. 18 . The method according to any claim of claims 11 - 17 wherein the pressure sensing element is a Microelectromechanical Systems (MEMS) element or a Nanoelectromechanical Systems (NEMS) element. 19 . The method according to any claim of claims 11 - 18 , wherein the pressure sensing element is a suspended transistor that is thermally isolated from a bulk of the pressure sensing device. 20 . The method according to any claim of claims 11 - 19 wherein the pressure sensing device is manufactured by wafer level packaging technology. 21 . A semiconductor device that comprises an enclosure and a semiconductor apparatus that is enclosed in the enclosure; wherein the semiconductor apparatus comprises: a pressure sensing element that is of microscopic scale and has a pressure level dependent thermal parameter; a signal source that is configured to supply, at different points in time, input electrical signals to the pressure sensing element; and a monitor that is configured to (a) measure electrical output signals generated by the pressure sensing element as a result of the supply of the input electrical signals and (b) estimate a pressure level applied within the enclosure based on the electrical output signals. 22 . The semiconductor device according to claim 21 wherein the semiconductor apparatus is a semiconductor die. 23 . The semiconductor device according to any claim of claims 21 - 22 wherein the semiconductor apparatus is manufactured by wafer level packaging.
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