Method for producing substrate having pattern and resin composition for hydrofluoric acid etching
US-2015361257-A1 · Dec 17, 2015 · US
US2018188621A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2018188621-A1 |
| Application number | US-201715724954-A |
| Country | US |
| Kind code | A1 |
| Filing date | Oct 4, 2017 |
| Priority date | Jan 3, 2017 |
| Publication date | Jul 5, 2018 |
| Grant date | — |
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Disclosed are a composition for a black matrix and a method for preparing the same, a display substrate, and a display device. The composition for a black matrix comprises an adhesive, a light-shielding material, a solvent, a first dye and a monomer, wherein the light-shielding material comprises light-shielding particles, and an electrically insulating material and a base material with which the light-shielding particles are coated sequentially; and the adhesive, the first dye and the light-shielding material are bonded by the monomer.
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1 . A composition for a black matrix, comprising: an adhesive, a light-shielding material, a solvent, a first dye and a monomer, wherein the light-shielding material comprises light-shielding particles, and an electrically insulating material and a base material with which the light-shielding particles are coated sequentially; and the adhesive, the first dye and the light-shielding material are bonded by the monomer. 2 . The composition according to claim 1 , comprising about 12 wt % to about 25 wt % of the adhesive, about 20 wt % to about 45 wt % of the light-shielding material, about 10 wt % to about 45 wt % of the solvent, about 5 wt % to about 10 wt % of the first dye, and about 5 wt % to about 10 wt % of the monomer. 3 . The composition according to claim 1 , further comprising a second dye dissolved in the solvent. 4 . The composition according to claim 1 , wherein the light-shielding particles include at least one of carbon black particles or titanium black particles. 5 . The composition according to claim 1 , wherein the electrically insulating material is an electrically insulating organic material which includes at least one of a phenolic resin, a melamine resin, a polyester resin, an epoxy resin, a diphenyl ether resin, a silicone resin, or an organofluorine resin. 6 . The composition claim 1 , wherein the electrically insulating material is an electrically insulating inorganic material which includes at least one of aluminum nitride, silicon nitride, or silicon carbide. 7 . The composition according to claim 1 , wherein the adhesive comprises at least one of an acrylic resin or a polyimide resin. 8 . The composition according to claim 1 , wherein the solvent comprises at least one of propylene glycol methyl ether propionate, ethylene glycol monomethyl ether acetate, 1,2-propylene glycol methyl ether acetate, ethylene glycol diethyl ether, N-methyl-2-pyrrolidone, cyclohexanone, or N,N-dimethylformamide. 9 . The composition according to claim 1 , wherein the monomer comprises at least one of trimethylolpropane triacrylate (TMPTA), tripropylene glycol diacrylate (TPGDA), 1,6-hexanediol diacrylate (HDDA), dipentaerythritol hexaacrylate (DPHA), dipentaeritritol pentaacrylate (DPPA) or pentaerythritol triacrylate (PETA). 10 . A method for preparing a composition for a black matrix, comprising: providing light-shielding particles; coating the light-shielding particles with an electrically insulating material and a base material sequentially to form a light-shielding material; dispersing the light-shielding material and an adhesive in a solvent to prepare a dispersion; and mixing a first dye and a monomer with the dispersion to form the composition for a black matrix; wherein the adhesive, the first dye and the light-shielding material are bonded by the monomer. 11 . The method according to claim 10 , further comprising dissolving a second dye in the solvent. 12 . The method according to claim 10 , wherein the light-shielding particles include at least one of carbon black particles or titanium black particles. 13 . The method according to claim 10 , wherein the monomer comprises at least one of trimethylolpropane triacrylate (TMPTA), tripropylene glycol diacrylate (TPGDA), 1,6-hexanediol diacrylate (HDDA), dipentaerythritol hexaacrylate (DPHA), dipentaeritritol pentaacrylate (DPPA) or pentaerythritol triacrylate (PETA). 14 . A display substrate comprising a black matrix, wherein the black matrix is prepared from the composition according to claim 1 . 15 . A display device, comprising the display substrate according to claim 14 . 16 . The method according to claim 10 , wherein the composition for a black matrix comprises about 12 wt % to about 25 wt % of the adhesive, about 20 wt % to about 45 wt % of the light-shielding material, about 10 wt % to about 45 wt % of the solvent, about 5 wt % to about 10 wt % of the first dye, and about 5 wt % to about 10 wt % of the monomer. 17 . The method according to claim 10 , wherein the electrically insulating material is an electrically insulating organic material which includes at least one of a phenolic resin, a melamine resin, a polyester resin, an epoxy resin, a diphenyl ether resin, a silicone resin, or an organofluorine resin. 18 . The method according to claim 10 , wherein the electrically insulating material is an electrically insulating inorganic material which includes at least one of aluminum nitride, silicon nitride, or silicon carbide. 19 . The method according to claim 10 , wherein the adhesive comprises at least one of an acrylic resin or a polyimide resin. 20 . The method according to claim 10 , wherein the solvent comprises at least one of propylene glycol methyl ether propionate, ethylene glycol monomethyl ether acetate, 1,2-propylene glycol methyl ether acetate, ethylene glycol diethyl ether, N-methyl-2-pyrrolidone, cyclohexanone, or N,N-dimethylformamide.
polymeric · CPC title
dye · CPC title
with binders · CPC title
Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence) · CPC title
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) · CPC title
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