Plasma source for a plasma cvd apparatus and a manufacturing method of an article using the plasma source

Patent metadata

Field	Value
Publication number	US-2018158655-A1
Application number	US-201815886486-A
Country	US
Kind code	A1
Filing date	Feb 1, 2018
Priority date	Nov 2, 2012
Publication date	Jun 7, 2018
Grant date	—

Abstract

A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

First claim

What is claimed is:

1 . A manufacturing method of an article, comprising:
arranging a processing object in a plasma CVD apparatus equipped with an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row in that order; supplying a source gas for film deposition from at least one interval between the adjacent electrodes in said electrode group; applying a negative voltage to said first electrode and said second electrode, which is adjacent to said first electrode, and applying a positive voltage to said third electrode and said fourth electrode, which is adjacent to said third electrode, in a first voltage applying process; and applying a positive voltage to said first electrode and said second electrode and applying a negative voltage to said third electrode and said fourth electrode in a second voltage applying process, wherein an article is manufactured by applying a film deposition on said processing object by alternately perfoiming said first voltage applying process and said second voltage applying process at every lapse of a predetermined time.

2 . A manufacturing method of an article, comprising:
arranging a processing object in a plasma CVD apparatus equipped with an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row in that order; supplying a source gas for film deposition from at least one interval between the adjacent electrodes in said electrode group; applying a negative voltage to said first electrode and said fourth electrode and applying a positive voltage to said second electrode and said third electrode in a first voltage applying process; and applying a positive voltage to said first electrode and said fourth electrode and applying a negative voltage to said second electrode and said third electrode in a second voltage applying process, wherein an article is manufactured by applying a film deposition on said processing object by alternately performing said first voltage applying process and said second voltage applying process at every lapse of a predetermined time.

Assignees

• Asahi Glass Co Ltd

Inventors

• Kawahara Hirotomo
• Aomine Nobutaka
• Maeshige Kazunobu
• Aoshima Yuki
• Hanekawa Hiroshi

Classifications

• H01J37/32091

  the radio frequency energy being capacitively coupled to the plasma · CPC title

• C23C16/50

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

• H01J37/32568 Primary

  Relative arrangement or disposition of electrodes; moving means · CPC title

• H01J37/32577

  Electrical connecting means · CPC title

• H05H1/46

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title