Doped-carbon nano-architectured structures and methods for fabricating same

Patent metadata

Field	Value
Publication number	US-2018108448-A1
Application number	US-201715836304-A
Country	US
Kind code	A1
Filing date	Dec 8, 2017
Priority date	Jun 26, 2009
Publication date	Apr 19, 2018
Grant date	—

Abstract

In an exemplary method, a nano-architectured carbon structure is fabricated by forming a unit (e.g., a film) of a liquid carbon-containing starting material and at least one dopant. A surface of the unit is nano-molded using a durable mold that is pre-formed with a pattern of nano-concavities corresponding to a desired pattern of nano-features to be formed by the mold on the surface of the unit. After nano-molding the surface of the unit, the first unit is stabilized to render the unit and its formed nano-structures capable of surviving downstream steps. The mold is removed from the first surface to form a nano-molded surface of a carbonization precursor. The precursor is carbonized in an inert-gas atmosphere at a suitable high temperature to form a corresponding nano-architectured carbon structure. A principal use of the nano-architectured carbon structure is a carbon electrode used in, e.g., Li-ion batteries, supercapacitors, and battery-supercapacitor hybrid devices.

First claim

What is claimed is:

1 . A method for fabricating a nano-architectured doped carbon structure, comprising:
preparing a carbon-containing starting material including at least one dopant; nano-molding a surface of the starting material, using a durable mold pre-formed with a pattern of nano-concavities corresponding to a desired pattern of nano-features to be formed by the mold on the surface, by bringing together the surface of the starting material and the pattern of nano-concavities; when the nano-features formed by the mold on the surface of the starting material have reached at least a threshold level of self-supportability, separating the mold and surface of the unit from each other to form a carbonization precursor having a nano-molded surface; and carbonizing the precursor to form a corresponding nano-architectured carbon structure.

2 . The method of claim 1 , wherein the dopant comprises a substance selected from a group consisting of metals and semiconductors.

3 . The method of claim 2 , wherein the dopant comprises nano-particles of the substance.

4 . The method of claim 3 , wherein preparing the carbon-containing starting material comprises:
preparing a suspension of the nano-particles in a solvent for a polymerizable carbon-containing substance; and adding to the suspension the carbon-containing polymerizable substance.

5 . The method of claim 4 , wherein:
the dopant comprises nano-particles of silicon; and the carbon-containing polymerizable substance comprises polyacrylonitrile.

6 . The method of claim 1 , wherein carbonization is performed under an elevated-temperature regimen and in an inert-atmosphere environment in which the precursor is converted to a corresponding nano-architectured carbon/activated carbon structure.

7 . The method of claim 1 , wherein carbonization is performed under an elevated-temperature regimen and in an inert-atmosphere environment in which the precursor is converted to a corresponding nano-architectured graphite carbon structure.

8 . The method of claim 1 , wherein the starting material is polyacrylonitrile (PAN), the method further comprising stabilizing the nano-molded starting material by incubation at a temperature at which molecules of the PAN are cyclized, the incubation being conducted in an atmosphere that prevents combustion of the precursor.

9 . A method for forming a nano-molded carbonization precursor, comprising:
forming a mold having a surface defining desired pattern of nano-concavities corresponding to a desired pattern of nano-features; preparing a starting material comprising a polymerizable carbon-containing substance and at least one dopant, the starting material being sufficiently fluid to have a moldable surface; bringing the surface of the mold and the starting material together such that the nano-concavities mold the desired pattern of nano-features onto the moldable surface; and when the nano-features formed by the mold on the moldable surface have reached at least a threshold level of self-supportability, separating the mold and surface of the unit from each other to form a carbonization precursor having a nano-molded surface.

10 . A method for forming a nano-architectured carbon structure, comprising:
forming a mold; in a surface of the mold, forming a desired pattern of nano-concavities corresponding to a desired pattern of nano-features; preparing a liquid starting material comprising a solvent, a polymerizable carbon-containing compound, and at least one dopant; forming a film of the starting material having first and second surfaces; using the mold, nano-molding the desired pattern of nano-features into the first surface; stabilizing the nano-molded film; and removing the mold from the first surface.

11 . The method of claim 10 , wherein:
the liquid starting material is a carbon-containing starting material comprising at least one dopant; and the method further comprises forming a carbonization precursor of the film, and carbonizing the precursor.

Assignees

• Univ Arizona
• Arizona Board Of Regents On Behalf Of The Univ Ty Of Arizona

Inventors

• Thomas Jayan
• Gangopadhyay Palash
• Duong Binh Au Thanh

Classifications

• Y10S977/887

  Nanoimprint lithography, i.e. nanostamp · CPC title

• H01M4/587

  for inserting or intercalating light metals · CPC title

• H01B13/00

  Apparatus or processes specially adapted for manufacturing conductors or cables · CPC title

• Y10S977/70

  Nanostructure · CPC title

• H01B1/04 Primary

  mainly consisting of carbon-silicon compounds, carbon or silicon · CPC title