Mask and method of manufacturing mask assembly including the same

US2018071764A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018071764-A1
Application numberUS-201715651034-A
CountryUS
Kind codeA1
Filing dateJul 17, 2017
Priority dateSep 12, 2016
Publication dateMar 15, 2018
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A mask and a method of manufacturing a mask assembly, the mask including a body, and the body including one end and another end facing each other in a length direction and having a first surface and a second surface facing each other in a thickness direction; and a pattern region between the one end and the other end, the pattern region including a plurality of pattern holes and a plurality of ribs between the plurality of pattern holes, wherein a curl value of the mask, which is defined as a shortest distance from a plane tangent to a center of the body to the one end or the other end of the body, is 1,000 μm to 4,000 μm.

First claim

Opening claim text (preview).

What is claimed is: 1 . A mask comprising a body, the body including: one end and another end facing each other in a length direction and having a first surface and a second surface facing each other in a thickness direction; and a pattern region between the one end and the other end, the pattern region including a plurality of pattern holes and a plurality of ribs between the plurality of pattern holes, wherein a curl value of the mask, which is defined as a shortest distance from a plane tangent to a center of the body to the one end or the other end of the body, is 1,000 μm to 4,000 μm. 2 . The mask as claimed in claim 1 , wherein: the body contains nickel and iron, and a content of nickel is 35 wt % to 40 wt %, based on a total weight of nickel and iron. 3 . The mask as claimed in claim 1 , wherein a thickness of at least one of the plurality of ribs is 6 μm to 10 μm. 4 . The mask as claimed in claim 1 , wherein the body includes a first welding region at the one end and a second welding region at the other end. 5 . The mask as claimed in claim 4 , wherein a thickness of at least one of the first welding region and the second welding region is greater than a thickness of at least one of the plurality of ribs. 6 . The mask as claimed in claim 4 , wherein the thickness of at least one of the first welding region and the second welding region is 6 μm to 40 μm. 7 . The mask as claimed in claim 1 , wherein each rib of the plurality of ribs includes an upper surface having a first length and a lower surface having a second length, the second length being longer than the first length. 8 . A mask, comprising: a first welding region at one end of the mask; a second welding region at another end of the mask, the other end of the mask facing one end of the mask in a length direction; and a pattern region between the first welding region and the second welding region, wherein the pattern region includes a plurality of ribs, each rib including an upper surface having a first length and a lower surface having a second length that is longer than the first length, and wherein a curl value of the mask, which is defined as a shortest distance from a plane tangent to a center of the body to one of the first welding region and the second welding region, is 1,000 μm to 4,000 μm. 9 . The mask as claimed in claim 8 , wherein: each of the first welding region, the second welding region, and the pattern region contains nickel and iron, and the content of nickel in the first welding region, the second welding region, and the pattern region is 35 wt % to 40 wt %, based on a total weight of nickel and iron. 10 . The mask as claimed in claim 8 , wherein a thickness of at least one of the first and second welding regions is equal to or greater than a thickness of the pattern region. 11 . The mask as claimed in claim 8 , wherein a thickness of the pattern region is 6 μm to 10 μm. 12 . A method of manufacturing a mask assembly, the method comprising: forming a mask such that the mask has one surface and another surface facing each other in a thickness direction; and attaching the mask to a mask frame such that the one surface of the mask is in contact with the mask frame, wherein a curl value of the mask, which is defined as a shortest distance from a plane tangent to a center of the body to the one end or the other end of the body, is 1,000 μm to 4,000 μm. 13 . The method as claimed in claim 12 , further comprising stretching the mask in a length direction after the forming the mask, wherein the mask attached to the mask frame has a curl value of 0 μm to 400 μm. 14 . The method as claimed in claim 13 , wherein, in the stretching the mask, the mask is stretched by a tensile resultant force of 0.4 Kgf to 6.0 Kgf. 15 . The method as claimed in claim 12 , wherein: the mask contains nickel and iron, and a content of nickel in the mask is 35 wt % to 40 wt %, based on a total weight of nickel and iron. 16 . The method as claimed in claim 12 , wherein: the mask includes a first welding region at the one end of the mask in a length direction, a second welding region disposed at the other end of the mask facing the one end in the length direction, and a pattern region between the first welding region and the second welding region, and in the forming the mask, a thickness of at least one of the first and second welding regions is equal to or greater than a thickness of the pattern region. 17 . The method as claimed in claim 16 , wherein the thickness of the pattern region is 6 μm to 10 μm. 18 . The method as claimed in claim 12 , wherein forming the mask includes: forming a photoresist layer on a substrate; forming a photomask on the photoresist layer and etching at least a part of the photoresist layer using the photomask, so as to form a plurality of photoresist patterns spaced apart from each other; forming a metal layer between the plurality of photoresist patterns; and removing the plurality of photoresist patterns and the substrate. 19 . The method as claimed in claim 18 , wherein forming the metal layer includes applying a constant current to the metal layer. 20 . The method as claimed in claim 18 , wherein the metal layer is formed using a metal plating solution, and the metal layer is formed in an amount of 1 wt % to 10 wt %, based on a total weight of the metal plating solution.

Assignees

Inventors

Classifications

  • Masking devices (stencils B05C17/06; masking devices for which the means for applying liquids or other fluent material is spraying or is not important B05B12/20) · CPC title

  • relating to soldering or welding · CPC title

  • C23C14/042Primary

    using masks · CPC title

  • Steel {or steel} alloys · CPC title

  • Electricity · mapped topic

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What does patent US2018071764A1 cover?
A mask and a method of manufacturing a mask assembly, the mask including a body, and the body including one end and another end facing each other in a length direction and having a first surface and a second surface facing each other in a thickness direction; and a pattern region between the one end and the other end, the pattern region including a plurality of pattern holes and a plurality of …
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Mar 15 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).