Non-Contact Reactor And Nanocrystal Fabrication System Having The Same

US2018050316A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018050316-A1
Application numberUS-201715402311-A
CountryUS
Kind codeA1
Filing dateJan 10, 2017
Priority dateAug 17, 2016
Publication dateFeb 22, 2018
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The present invention mainly provides a non-contact reactor consisting of: a reaction vessel having a particularly-designed size, a plurality of injection modules, an agitator, a heat exchange module, and an electrical gate valve module. When this non-contact reactor is operated to produce, operators are able to inject at least one precursor solution into the reaction nanometer-scale semiconductor crystallites vessel and make the injected precursor solution reach a specific position in the reaction vessel by using the electrical gate valve to control the injection pressure of the injection modules. Moreover, the operators can further properly control the rotation speed of the agitator through a controller, so as to evenly and quickly mix the injected precursor solution and a specific solution pre-filled into the reaction vessel to a mixture solution; therefore, the acceleration of production rate and the enhance of production yield of the semiconductor nanocrystals are carried out.

First claim

Opening claim text (preview).

What is claimed is: 1 . A non-contact reactor, comprising: a reaction vessel, being provided with a reaction space therein; a plurality of inject modules, being disposed over the reaction vessel, wherein each of the inject modules have an injection nozzle located over the liquid level of a solution pre-filled into the reaction space; an agitator, being electrically connected to an external driving and controlling device, and having at least one stirring paddles located in the reaction space; a heat exchanging module, being connected to the outer wall of the reaction vessel, and comprising a heat exchanging channel, a fluid inlet communicating with the heat exchanging channel and a fluid outlet communicating with the heat exchanging channel; wherein a fluid with a specific temperature can be inputted into the heat exchanging channel via the fluid outlet, and then the fluid would be outputted via the fluid outlet after a heat exchanging process is carried out between the fluid and the reaction vessel in the heat exchanging channel; and an electrical gate valve, being electrically connected to the inject modules, wherein the inject modules are able to inject one or multi precursor solutions into an assigning position of the reaction space based on an injection pressure by the controlling the electrical gate valve, so as to make the precursor solutions and the solution pre-filled into the reaction space mix to each other evenly and quickly; wherein the inject module has a temperature controlled device configured for pre-heating the precursor solution from room temperature to 300° C. to precisely control the temperature drop in the reaction vessel after the injection of the precursor solution is completed. 2 . The non-contact reactor of claim 1 , further comprising a spray cooling module, being opposite to the outer wall of the reaction vessel, and used for spraying a temperature lowering medium to the outer wall of the reaction vessel while a reaction process between the precursor solutions and the solution pre-filled into the reaction space is finished. 3 . The non-contact reactor of claim 1 , further comprising an injection-type temperature lowering module having an injection tube located over the liquid level of the solution pre-filled into the reaction space, wherein the injection-type temperature lowering module is used for injecting a temperature lowering medium into the reaction space when a reaction process between the precursor solutions and the solution pre-filled into the reaction space is finished. 4 . The non-contact reactor of claim 1 , further comprising an internal heat-exchanging coil module, wherein the internal heat-exchanging coil module has a large heat exchange area located in the reaction space and is used for flowing a pre-cooling heat-exchanging medium into the coil when the reaction is finished. 5 . The non-contact reactor of claim 1 , further comprises: a sample collecting module, having a pickup tube for entering the reaction space; a temperature sensor, being disposed in the reaction vessel for monitoring a solution temperature in the reaction space; and at least one protection chamber, being filled with an inert gas with positive pressure therein, and used for accommodating the inject modules. 6 . The non-contact reactor of claim 1 , wherein a plurality of baffles are disposed in the reaction vessel for guiding the precursor solutions injected into the reaction space. 7 . The non-contact reactor of claim 1 , wherein a plurality of nanometer-scale semiconductor crystallites would be produced when a reaction process between the precursor solutions and the solution pre-filled into the reaction space is finished; moreover, the nanometer-scale semiconductor crystallites can be outputted through an output port of the reaction vessel. 8 . The non-contact reactor of claim 1 , wherein the injection pressure is in a range from 0 Mpa to 3 Mpa. 9 . The non-contact reactor of claim 1 , wherein the assigning position is in a range from one quarter of the depth of the reaction space to three fourths of the depth of the reaction space. 10 . The non-contact reactor of claim 1 , wherein the rotation speed of the stirring paddles is controlled by the driving and controlling device. 11 . A nanocrystals fabrication system, comprising: a plurality of precursor storage tanks, for accommodating various precursor solutions; a non-contact reactor, comprising: a reaction vessel, being provided with a reaction space therein; a plurality of inject modules, being disposed over the reaction vessel, wherein each of the inject modules have an injection nozzle located over the liquid level of a solution pre-filled into the reaction space; an agitator, being electrically connected to an external driving and controlling device, and having at least one stirring paddles located in the reaction space; a heat exchanging module, being connected to the outer wall of the reaction vessel, and comprising a heat exchanging channel, a fluid inlet communicating with the heat exchanging channel and a fluid outlet communicating with the heat exchanging channel; wherein a fluid with a specific temperature can be inputted into the heat exchanging channel via the fluid outlet, and then the fluid would be outputted via the fluid outlet after a heat exchanging process is carried out between the fluid and the reaction vessel in the heat exchanging channel; and an electrical gate valve, being electrically connected to the inject modules, wherein the inject modules are able to inject one or multi precursor solutions into an assigning position of the reaction space based on an injection pressure by the controlling the electrical gate valve, so as to make the precursor solutions and the solution pre-filled into the reaction space to each other evenly and quickly; a harvest tank, being connected to an output port of the reaction vessel, and used for collecting a plurality of nanometer-scale semiconductor crystallites, the precursor solutions and the solution pre-filled into the reaction space; wherein the nanometer-scale semiconductor crystallites is produced after a reaction process between the precursor solutions and the solution pre-filled into the reaction space is finished; a centrifuge, being connected to the harvest tank for treating the precursor solutions and the solution pre-filled into the reaction space with a centrifugation process, so as to precipitate the nanometer-scale semiconductor crystallites; and a storage tank, being connected to the centrifuge for collecting and storing the nanometer-scale semiconductor crystallites. 12 . The nanocrystals fabrication system of claim 11 , further comprising a spray cooling module, being opposite to the outer wall of the reaction vessel, and used for spraying a temperature lowering medium when a reaction process between the precursor solutions and the solution pre-filled into the reaction space is finished. 13 . The nanocrystals fabrication system of claim 11 , further comprising an injection-type temperature lowering module having an injection tube located over the liquid level of the solution pre-filled into the reaction space, wherein the injection-type temperature lowering module is used for injecting a temperature lowering medium into the reaction space when a reaction process between the precursor solutions and the solution is finished. 14 . The nanocrystals fabrication system of claim 11 , further comprises: a sample collecting module, having a sample collecting tube for entering the reaction space; a temperature sensor, being disposed in the reaction vessel for monitor

Assignees

Inventors

Classifications

  • B01J14/00Primary

    Chemical processes in general for reacting liquids with liquids; Apparatus specially adapted therefor (B01J8/00, B01J19/08 take precedence) · CPC title

  • Manufacture or treatment of nanostructures · CPC title

  • of the reactants · CPC title

  • Controlling the temperature of the process · CPC title

  • by using a centrifuge · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2018050316A1 cover?
The present invention mainly provides a non-contact reactor consisting of: a reaction vessel having a particularly-designed size, a plurality of injection modules, an agitator, a heat exchange module, and an electrical gate valve module. When this non-contact reactor is operated to produce, operators are able to inject at least one precursor solution into the reaction nanometer-scale semiconduc…
Who is the assignee on this patent?
Univ Nat Tsing Hua
What technology area does this patent fall under?
Primary CPC classification B01J14/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Feb 22 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).