Device and method for simultaneous coating or de-coating of a plurality of workpieces and workpiece
US-9200376-B2 · Dec 1, 2015 · US
US2018031496A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2018031496-A1 |
| Application number | US-201615221167-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 27, 2016 |
| Priority date | Jul 27, 2016 |
| Publication date | Feb 1, 2018 |
| Grant date | — |
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An electrochemical cell that allows for in-situ structural characterization of amorphous thin film materials during the course of electrolysis using high-energy X-ray scattering (>50 keV). The compact and versatile cell, fabricated using a 3 D printer, employs a three-electrode configuration and minimizes X-ray scattering contributions from the cell, reference and counter electrodes, as well as the working electrode support. A large surface area working electrode has a physically robust support and is largely transparent to X-rays. This design, which utilizes a three-dimensional working electrode, also greatly improves the intensity and quality of the scattered signal compared to a two-dimensional working electrode. The in-situ cell can be used not only to investigate structural evolution during electrolysis using X-ray scattering (e.g. pair distribution function), but also to perform electrochemical potential-dependent structural analysis by extended X-ray absorption fine structure. The in-situ electrochemical cell opens new opportunity to characterize amorphous thin films thinner than 70 nm.
Opening claim text (preview).
What is claimed is: 1 . An article of manufacture comprising: an in-situ cell comprising: at least three electrodes including a working electrode (W.E.), a reference electrode (R.E.), and a cell electrode (C.E.); an electrolyte system including an electrolyte line and an electrolyte source in fluid communication with the in-situ cell; and a film over the WE forming an WE electrolyte chamber. 2 . The article of manufacture of claim 1 , wherein the W.E. includes a substrate having a glass capillary array having a conformal conductive layer deposited thereon. 3 . The article of manufacture of claim 1 , wherein the glass capillary array is a microporous glass capillary array having pores with a diameter of 40 μm or less and at least a 20 mm 2 surface area. 4 . The article of manufacture of claim 3 , wherein the conformal conductive layer is less than 70 nm thick. 5 . The article of manufacture of claim 2 , wherein the W.E. further comprises a metallic layer deposited on the glass capillary array opposite the conductive layer. 6 . The article of manufacture of claim 2 , wherein the conformal conductive layer is less than 50 nm thick. 7 . The article of manufacture of claim 2 , further comprising the housing of magnetic stirrer and possesses a tubing and syringe pump for electrolyte flow. 8 . The article of manufacture of claim 1 , wherein the W.E. electrolyte chamber has a cross-section shape selected from half-moon, semi-elliptical, and semi-circular. 9 . The article of manufacture of claim 7 , wherein the film is 7.5 μm thick. 10 . The article of manufacture of claim 1 , wherein the electrolyte system further including a stirrer associated with the electrolyte source and configured to stir electrolyte in the electrolyte source. 11 . The article of manufacture of claim 2 , wherein the electrolyte system further comprises a pump. 12 . A method of characterizing a thin film within an electrochemical cell, the method comprising: depositing a thin film on a working electrode within the electrochemical cell; controlling the deposition at last in part by application of a current to a cell electrode in electrical contact with the working electrode; interacting the deposited thin film with an incident x-ray beam; measuring background scattering; and collecting CV data for the thin film. 13 . The method of claim 12 , wherein measuring the background scattering is at a distance q. 14 . The method of claim 12 , wherein the deposited thin film is less than 70 nm thick. 15 . The method of claim 14 , wherein the deposited thin film is less than 50 nm thick. 16 . The method of claim 12 , further comprising providing a continuous flow of electrolyte over the working electrode. 17 . The method of claim 15 , wherein providing the continuous flow further includes purging oxygen bubbles from the working electrode. 18 . The method of claim 12 , wherein an interaction volume for interaction for the x-rays with the deposited thin film is at least 1500×10 −6 mm 3 . 19 . The method of claim 11 , wherein the working electrode comprises a microporous glass capillary array having pores with a diameter of 40 μm or less and at least a 20 mm 2 surface area
Shape or form (C25D17/14 takes precedence) · CPC title
Measuring back scattering · CPC title
by electrolysis of water · CPC title
thin films, coatings · CPC title
with inorganic materials · CPC title
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