Method For Calibrating At Least One Processing Element

US2018024013A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018024013-A1
Application numberUS-201615549356-A
CountryUS
Kind codeA1
Filing dateFeb 8, 2016
Priority dateFeb 6, 2015
Publication dateJan 25, 2018
Grant date

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Abstract

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Provided is a method for calibrating at least one processing element, in a processing station for processing plastic preforms, includes providing: a first measurement preform establishing at least one first measurement value of the measurement preform before processing by the processing station, and a second measurement value of the measurement preform is measured by the measuring element or a further measuring element before or after processing by the processing station, and using at least these two measurement values, a mathematical temperature curve, is recorded by the measuring element, wherein at least one calibration device determines a deviation of the measured temperature curve from a mathematical standard temperature curve, and eliminates this deviation at least partially by adaptation of processing parameters of the processing station.

First claim

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1 - 13 . (canceled) 14 . A method for calibrating at least one temperature sensor of a processing station for processing plastic preforms, comprising providing a measurement preform, establishing a first measurement value of the measurement preform before or after its processing by the processing station, and subjecting the first measurement value to a mathematical measurement point recorded by a first measuring element, wherein at least one calibration device which determines a deviation of the measured point from a reference point, and reduces this deviation at least partially by adaptation of processing parameters of the processing station. 15 . The method according to claim 14 , wherein a second measurement value of the measurement preform is measured by the first measuring element or a second measuring element before or after processing by the processing station, and using at least these two measurement values, creating a mathematical measurement curve, in particular a mathematical measurement line, is recorded by the measuring element, wherein at least the calibration device determines a deviation of the measured curve from a mathematical reference curve, and this deviation is reduced at least partially by adaptation of processing parameters of the processing station. 16 . The method according to claim 15 , wherein at least one first measurement value and/or at least one second measurement value are measured at least at two processing stations, and resulting measurement curves are adapted to the reference curve by the calibration device. 17 . The method according to claim 14 , wherein at least one measuring element, in particular at least one measuring element, is configured in the form of a central measurement device which is arranged outside the processing station, wherein the first measurement value and/or the second measurement value are measured by the measuring elements. 18 . The method according to claim 14 , wherein at least one measuring element, in particular at least one measuring element, is installed decentrally inside the processing station and moved with the processing station, wherein the first measurement value and/or the second measurement value are measured by the measuring elements. 19 . The method according to claim 14 , wherein the reference curve is recorded by the measuring element, in that the measuring element measures at least one first reference value of the measurement preform before or after its processing inside the processing station, and a second reference value of the measurement preform is measured by a further measuring element before, during or after processing inside the processing station, and using at least these two reference values, the reference curve, in particular the mathematical reference line, is produced by at least one measuring element. 20 . The method according to claim 14 , wherein initially only the first measurement values are measured by the measuring element before processing of the measurement preform, and only thereafter the second measurement values are measured by the measuring element. 21 . The method according to claim 14 , wherein the measurement preform is a preform dummy or a preform which is configured and provided to be expanded into a container. 22 . The method according to claim 14 , wherein at least one reference face is installed in at least one measuring element and can be heated by the processing station, wherein the measurement preform can be brought between the reference face and a measurement sensor, in particular a temperature sensor, of the measuring element, and wherein a radiation emission spectrum of the reference face at least partially corresponds to a radiation emission spectrum of the measurement preform. 23 . The method according to claim 14 , wherein the processing station is a heating station, in particular a microwave oven. 24 . The method according to claim 14 , wherein the processing station or a further processing station comprises at least one resonator, within which the measuring element and/or the plastic preform are heated, wherein a reference face is installed at least partially or fully outside such a resonator. 25 . A device for calibrating at least one temperature sensor of a processing station for processing plastic preforms, comprising providing at least one first measurement value of the measurement preform before or after its processing by the processing station, and subjecting the first measurement value, to a mathematical measurement point can be recorded by a measuring element, and providing at least one calibration device which is configured and provided for determining a deviation of the measured point from a reference point, and reducing this deviation at least partially by adaptation of processing parameters of the processing station. 26 . A device for heating plastic preforms using electromagnetic radiation, in particular microwave radiation, comprising at least one processing station, having at least one calibration device according to claim 25 .

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What does patent US2018024013A1 cover?
Provided is a method for calibrating at least one processing element, in a processing station for processing plastic preforms, includes providing: a first measurement preform establishing at least one first measurement value of the measurement preform before processing by the processing station, and a second measurement value of the measurement preform is measured by the measuring elemen…
Who is the assignee on this patent?
Krones Ag
What technology area does this patent fall under?
Primary CPC classification G01K15/005. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jan 25 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).