Energy Efficient Infrared Oven With Air Circulation

Patent metadata

Field	Value
Publication number	US-2017360157-A1
Application number	US-201715627002-A
Country	US
Kind code	A1
Filing date	Jun 19, 2017
Priority date	Jun 17, 2016
Publication date	Dec 21, 2017
Grant date	—

Abstract

An oven may facilitate heating, curing, and/or drying processes for manufactured items, such as shoe parts, using multiple groups of infrared sources. Efficiencies of the oven are achieved through a deliberate airflow characteristic, which is accomplished with a configuration of apertures extending through a circulation plate. A higher concentration of apertures is formed in the circulation plate near a center zone relative to zones near an entrance and exit to the oven. Further, the shape of the apertures in the circulation plate aid in improved airflow within the oven.

First claim

What is claimed is:

1 . An oven comprising:
a chamber, the chamber having an entry on a first side and an exit on an opposite second side with a top extending between the first side and the second side, a longitudinal direction of the oven defined as extending between the first side and the second side; a conveyance system, the conveyance system extending within the chamber from the first side to the second side; a circulation plate, the circulation plate extending between the conveyance system and the top of the chamber, wherein the circulation plate is comprised of a first region proximate the chamber first side, a second region, and a third region proximate the chamber second side, the second region is between the first region and the third region; the circulation plate first region is comprised of a plurality of first region apertures, the circulation plate second region comprised of a plurality of second region apertures, and the circulation plate third region comprised of a plurality of third region apertures; and a first distance extending in the longitudinal direction between longitudinally adjacent apertures of the plurality of first region apertures, a second distance extending in the longitudinal direction between longitudinally adjacent apertures of the plurality of second region apertures, and a third distance extending in the longitudinal direction between longitudinally adjacent apertures of the plurality of third region apertures, wherein the second distance is less than the first distance and third distance.

2 . The oven of claim 1 further comprising an infrared source, the infrared source positioned within the chamber between the conveyance system and the circulation plate.

3 . The oven of claim 2 , wherein the infrared source emits energy in peak wavelengths for emitted spectra of infrared energy in a range of 2 to 6 micrometers.

4 . The oven of claim 1 , wherein the plurality of second region apertures region have a non-circular profile through the air circulation plate.

5 . The oven of claim 1 , wherein an infrared source is positioned between the plurality of first region apertures and the plurality of second region apertures.

6 . The oven of claim 1 , wherein the first distance is the same as the third distance.

7 . The oven of claim 1 further comprising a side chamber extending between the first side and the second side, the side chamber provides fluid connectivity from the chamber between a volume defined by the conveyance system and the circulation plate to a volume defined between the circulation plate and the top, such that air may be recirculated through the first region apertures, second region apertures, and third region apertures by way of the side chamber.

8 . The oven of claim 1 , wherein the plurality of apertures of the second region have a shorter distance in the longitudinal direction than in a perpendicular direction.

9 . The oven of claim 1 , wherein the second region of apertures are elliptical with a minor axis in the longitudinal direction.

10 . The oven of claim 1 , wherein the plurality of first region apertures direct air away from the entrance and the plurality of third region apertures direct air away from the exit.

11 . The oven of claim 1 further comprising a humidity sensor, the humidity sensor controlling a fan effective for passing air through at least the plurality of apertures of the first region, the plurality of apertures of the second region, or the plurality of apertures of the third region.

12 . The oven of claim 1 , wherein the first region is comprised of at least one infrared source effective to emit energy in peak wavelengths for emitted spectra of infrared energy in a range of 2 to 6 micrometers, wherein the second region is comprised of at least one infrared source effective to emit energy in peak wavelengths for emitted spectra of infrared energy in a range of 2 to 6 micrometers, and wherein the first region is comprised of at least one infrared source effective to emit energy in peak wavelengths for emitted spectra of infrared energy in a range of 2 to 6 micrometers.

13 . The oven of claim 1 , wherein the circulation plate extends in a plane parallel to the conveyance system.

14 . The oven of claim 1 , further comprising:
a second conveyance system, the second conveyance system extending within the chamber from the first side to the second side; a second circulation plate, the second circulation plate extending between the second conveyance system and the conveyance system, wherein the second circulation plate is comprised of a secondary first region proximate the chamber first side, a secondary second region, and a secondary third region proximate the chamber second side, the secondary second region is between the secondary first region and the secondary third region; the second circulation plate secondary first region is comprised of a plurality of first region apertures, the second circulation plate secondary second region comprised of a plurality of second region apertures, and the second circulation plate secondary third region comprised of a plurality of third region apertures; and a secondary first distance extending in the longitudinal direction between longitudinally adjacent apertures of the secondary first region, a secondary second distance extending in the longitudinal direction between longitudinally adjacent apertures of the secondary second region, and a secondary third distance extending in the longitudinal direction between longitudinally adjacent apertures of the secondary third region, wherein the secondary second distance is less than the secondary first distance and secondary third distance.

15 . The oven of claim 14 , wherein the first distance and the secondary first distance are different.

16 . The oven of claim 14 , wherein the circulation plate and the second circulation plate have different aperture configurations.

17 . The oven of claim 14 , wherein one or more infrared sources are coupled to the second circulation plate.

18 . The oven of claim 14 further comprising one or more recirculation vents extending through a side wall, the sidewall extending in the longitudinal direction and in a plane perpendicular to the circulation plate.

19 . The oven of claim 18 , wherein the recirculation vents are comprised of both side vents and end vents.

20 . An oven comprising:
a chamber, the chamber having an entry on a first side and an exit on an opposite second side, a longitudinal direction of the oven defined as extending between the first side and the second side; a conveyance system, the conveyance system extending within the chamber from the first side to the second side; an infrared source; and a circulation plate, the circulation plate extending between the conveyance system and a top of the chamber, wherein the circulation plate is comprised of a first region proximate the chamber first side, a second region, and a third region proximate the chamber second side, the second region between the first region and the third region; and the first region comprised of a plurality of first region apertures, the second region comprised of a plurality of second region apertures, and the third region comprised of a plurality of third region apertures, wherein there is a higher concentration of second region apertures than a concentration of first region apertures or concentration of second region apertures.

Assignees

• Nike Inc

Inventors

• Regan Patrick
• Wu Shih-Yuan
• Nichols Geoffrey
• Hsiao Yu-Shu
• Chang Min Chuan
• Min-Li Chang

Classifications

• F26B21/37

  Velocity of flow; Quantity of flow · CPC title

• F26B21/35

  Temperature; Pressure · CPC title

• F26B21/33

  Humidity · CPC title

• F26B21/25

  partly outside the drying enclosure · CPC title

• A43D95/10 Primary

  Drying or heating devices for shoes · CPC title