3d printing with variable voxel sizes based on optical filter

Patent metadata

Field	Value
Publication number	US-2017307902-A1
Application number	US-201715498381-A
Country	US
Kind code	A1
Filing date	Apr 26, 2017
Priority date	Apr 26, 2016
Publication date	Oct 26, 2017
Grant date	—

Abstract

A three-dimensional printing approach based on stereolithography with variable printing resolutions to solve the trade-off between throughput and resolution. In this technology, the variable fabrication resolutions are achieved by switching light wavelength. The apparatus includes an optical filter based on high-contrast gratings. In one embodiment, the minimum printing resolution of the accordingly constructed stereolithography apparatus is reduced to 37 μm.

First claim

What is claimed is:

1 . A stereolithography apparatus comprising:
a light source for providing a first light beam with a first wavelength and a first beam dimension and a second light beam with a second wavelength and a second beam dimension; and a multi-translucent optical filter in optical communication with the light source, the multi-translucent optical filter allowing the first light beam with the first wavelength to pass through with a third beam dimension and allowing the second light beam with the second wavelength to pass through with a fourth beam dimension substantially different from the third beam dimension.

2 . The stereolithography apparatus of claim 1 , further comprising:
a first dimension mirror; a first gyro controlling the first dimension mirror; a second dimension mirror; a second gyro controlling the second dimension mirror; and the first dimension mirror and the second dimension mirror being optically coupled to the multi-translucent optical filter and for optically controlling the first light beam and the second light beam onto a target.

3 . The stereolithography apparatus of claim 2 , further comprising a focusing lens optically coupled between the multi-translucent optical filter and the two mirrors, and wherein the light source includes a laser source.

4 . The stereolithography apparatus of claim 1 , wherein the third beam dimension is substantially similar to the first beam dimension.

5 . The stereolithography apparatus of claim 1 , wherein the first beam dimension and the third beam dimension are a beam diameter of the first light beam, and the second beam dimension and the fourth beam dimension are a beam diameter of the second light beam.

6 . The stereolithography apparatus of claim 1 , wherein the third beam dimension of the first light beam has a first diameter for the first light beam and the fourth beam dimension of the second light beam has a second diameter for the second light beam, the second diameter being substantially different from the first diameter.

7 . The stereolithography apparatus of claim 1 , wherein the first beam dimension of the first light beam has a first diameter for the first light beam, wherein the second beam dimension of the second light beam has a second diameter for the second light beam, and wherein the second diameter is substantially similar to the first diameter.

8 . The stereolithography apparatus of claim 7 , wherein the third beam dimension of the first light beam has a third diameter for the first light beam, wherein the fourth beam dimension of the second light beam has a fourth diameter for the second light beam, and wherein the fourth diameter is substantially different from the third diameter.

9 . The stereolithography apparatus of claim 8 , wherein the third diameter is substantially similar to the first diameter.

10 . The stereolithography apparatus of claim 1 , wherein the multi-translucent optical filter includes a grating layer having an aperture portion for allowing the second light beam to pass through with the fourth beam dimension and a grating portion for preventing the second light beam to pass through outside of the fourth beam dimension, and
wherein the grating layer further allows the first light beam to pass through with the third beam dimension substantially similar to the first beam dimension.

11 . The stereolithography apparatus of claim 10 , wherein the multi-translucent optical filter further includes a quartz layer and a planarization layer.

12 . The stereolithography apparatus of claim 1 , wherein the light source includes a first light source for providing the first light beam and further includes a second light source for providing the second light beam.

13 . The stereolithography apparatus of claim 12 , wherein the first light source includes a light emitting diode and an optical fiber.

14 . The stereolithography apparatus of claim 1 , wherein the light source further provides a third light beam with a third wavelength,
wherein the multi-translucent optical filter includes a plurality of filters, wherein the plurality of filters include a first filter allowing the second light beam with the second wavelength to pass through with the fourth beam dimension, and a second filter allowing the third light beam with the third wavelength to pass through with a fifth beam dimension substantially different from the third beam dimension and the fourth beam dimension, and wherein the first filter and the second filter allow the first light beam with the first wavelength to pass through with the third beam dimension.

15 . A method of changing light beam spot size in a stereolithography apparatus, the method comprising:
providing a first light beam with a first wavelength and a first beam dimension; providing a second light beam with a second wavelength and a second beam dimension; allowing the first light beam through a multi-translucent optical filter, the allowed light having the first beam dimension; allowing the second light beam through the multi-translucent optical filter, the allowed light having a third beam dimension substantially different from the first beam dimension; controlling the first light beam to project onto a target; and controlling the second light beam to project onto the target.

16 . The method of claim 15 , wherein the third beam dimension is substantially similar to the first beam dimension.

17 . The method of claim 15 , wherein the first beam dimension and the third beam dimension are a beam diameter of the first light beam, and the second beam dimension and the fourth beam dimension are a beam diameter of the second light beam.

18 . The method of claim 15 , wherein the third beam dimension of the first light beam has a first diameter for the first light beam and the fourth beam dimension of the second light beam has a second diameter for the second light beam, the second diameter being substantially different from the first diameter.

19 . The method of claim 15 , wherein the first beam dimension of the first light beam has a first diameter for the first light beam, wherein the second beam dimension of the second light beam has a second diameter for the second light beam, and wherein the second diameter is substantially similar to the first diameter.

20 . The method of claim 19 , wherein the third beam dimension of the first light beam has a third diameter for the first light beam, wherein the fourth beam dimension of the second light beam has a fourth diameter for the second light beam, and wherein the fourth diameter is substantially different from the third diameter.

21 . The method of claim 20 , wherein the third diameter is substantially similar to the first diameter.

Assignees

• Univ Southern California

Inventors

• Chen Yong
• Li Yuanrui
• Mao Huachao
• Wu Wei

Classifications

• G02B27/0994

  Fibers, light pipes (optical fibers per se G02B6/02) · CPC title

• G02B26/101

  with both horizontal and vertical deflecting means, e.g. raster or XY scanners (colour television using laser beams scanning a display screen H04N9/3129) · CPC title

• G02B27/4277 Primary

  being separated by an air space · CPC title

• B33Y10/00

  Processes of additive manufacturing · CPC title

• B33Y30/00 Primary

  Apparatus for additive manufacturing; Details thereof or accessories therefor · CPC title