Processing of anisotropic permanent magnet without magnetic field
US-11948733-B2 · Apr 2, 2024 · US
Compositions Including Magnetic Materials
US2017301441A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017301441-A1 |
| Application number | US-201715636413-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jun 28, 2017 |
| Priority date | Dec 18, 2009 |
| Publication date | Oct 19, 2017 |
| Grant date | — |
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- Title
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- Abstract
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- First independent claim
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Abstract
Official abstract text for this publication.
Compositions including hard magnetic photoresists, soft photoresists, hard magnetic elastomers and soft magnetic elastomers are provided.
First claim
Opening claim text (preview).
1 . A composition comprising: a photoresist; and hard magnetic particles dispersed in the photoresist to provide a micropatternable hard magnetic photoresist. 2 . A composition as claimed in claim 1 , wherein said hard magnetic particles are NdPrCeFeB alloy. 3 . A composition as claimed in claim 1 , wherein said hard magnetic particles are nanoparticles. 4 . A composition as claimed in claim 3 , wherein said hard magnetic nanoparticles are selected from the group comprising: FeC, CoFe, CoFeZn, Ni 0.5 Co 0.5 Fe 2 O 4 , Zn 0.5 Co 0.5 Fe 2 O 4 , Zn 0.5 Ni 0.5 F or NdFeB. 5 . A composition comprising: an elastomer; and hard magnetic particles dispersed in the elastomer to provide a micromoldable hard magnetic elastomer. 6 . A composition as claimed in claim 5 , wherein said hard magnetic particles are NdPrCeFeB alloy. 7 . A composition as claimed in claim 5 , wherein said hard magnetic particles are nanoparticles. 8 . A composition as claimed in claim 7 , wherein said hard magnetic nanoparticles are selected from the group comprising: CoFe 2 O 4 , NiFe 2 O 4 , ZnFe 2 O 4 , Ni 0.5 Co 0.5 Fe 2 O 4 , Zn 0.5 Co 0.5 Fe 2 O 4 , Zn 0.5 Ni 0.5 Fe or SrFe 12 O 19 . 9 . A composition as claimed in claim 5 , wherein said elastomer is a thermoplastic elastomer. 10 . A method of fabricating a hard magnetic photoresist comprising: agitating hard magnetic particles in a photoresist; and spinning the hard magnetic particles and the photoresist onto a substrate. 11 . A method as claimed in claim 10 , wherein said hard magnetic particles are NdPrCeFeB alloy. 12 . A method as claimed in claim 10 , wherein said hard magnetic particles are nanoparticles. 13 . A method as claimed in claim 12 , wherein said hard magnetic nanoparticles are selected from the group comprising: FeC, CoFe, CoFeZn, Ni 0.5 Co 0.5 Fe 2 O 4 , Zn 0.5 Co 0.5 Fe 2 O 4 , Zn 0.5 Ni 0.5 F or NdFeB. 14 . A method of fabricating a hard magnetic elastomer comprising: dispersing hard magnetic particles in a solvent; adding elastomer and agitating; adding curing agent and agitating; removing air bubbles; and heating to form solid film. 15 . A method as claimed in claim 14 , wherein said hard magnetic particles are NdPrCeFeB alloy. 16 . A method as claimed in claim 14 , wherein said hard magnetic particles are nanoparticles. 17 . A method as claimed in claim 16 , wherein said hard magnetic nanoparticles are selected from the group comprising: CoFe 2 O 4 , NiFe 2 O 4 , ZnFe 2 O 4 , Ni 0.5 Co 0.5 Fe 2 O 4 , Zn 0.5 Co 0.5 Fe 2 O 4 , Zn 0.5 Ni 0.5 Fe or SrFe 12 O 19 . 18 . A method as claimed in claim 14 , wherein said solvent is heptane or toluene. 19 . A composition comprising: a photoresist; and soft magnetic nanoparticles dispersed in the photoresist to provide a micropatternable hard magnetic photoresist. 20 . A composition as claimed in claim 19 , wherein said soft magnetic particles are selected from the group comprising: nickel iron alloy, nickel iron molybdenum copper, nickel iron molybdenum, iron silicon aluminum or iron silicon. 21 . A composition comprising: a photoresist; and soft magnetic particles dispersed in the elastomer to provide a micromoldable soft magnetic elastomer. 22 . A composition as claimed in claim 21 , wherein said soft magnetic particles are selected from the group comprising: nickel iron alloy, nickel iron molybdenum copper, nickel iron molybdenum, iron silicon aluminum or iron silicon.
Assignees
Inventors
Classifications
Finishing the coated layer, e.g. drying, baking, soaking · CPC title
Coating on a rotating support, e.g. using a whirler or a spinner · CPC title
- H01F1/0551Primary
in the form of particles, e.g. rapid quenched powders or ribbon flakes · CPC title
using epoxidised novolak resin · CPC title
Fe-Si-Al based alloys, e.g. Sendust · CPC title
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Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US2017301441A1 cover?
- Compositions including hard magnetic photoresists, soft photoresists, hard magnetic elastomers and soft magnetic elastomers are provided.
- Who is the assignee on this patent?
- Univ Fraser Simon
- What technology area does this patent fall under?
- Primary CPC classification H01F1/0551. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Thu Oct 19 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).