Method and device for characterizing an electron beam

Patent metadata

Field	Value
Publication number	US-2017294288-A1
Application number	US-201715630199-A
Country	US
Kind code	A1
Filing date	Jun 22, 2017
Priority date	Jan 21, 2015
Publication date	Oct 12, 2017
Grant date	—

Abstract

A device for detecting X-rays radiated out of a substrate surface, said device comprising at least one X-ray detector, a resolver grating and a modulator grating, said resolver grating with at least one opening facing towards said X-ray detector is arranged in front of said X-ray detector. Said modulator grating is provided between said resolver grating and said substrate at a predetermined distance from said resolver grating and said substrate, where said modulator grating having a plurality of openings in at least a first direction, wherein said x-rays from said surface is spatially modulated with said modulator grating and resolver grating.

First claim

1 . A device for detecting X-rays emanating from a substrate surface, said device comprising:
at least one first X-ray detector; a patterned aperture resolver; and a patterned aperture modulator, wherein:
said patterned aperture resolver includes at least one opening facing towards said X-ray detector and is positioned in front of said X-ray detector;
said patterned aperture modulator is positioned between said patterned aperture resolver and said substrate at a predetermined distance from said patterned aperture resolver and said substrate, where said patterned aperture modulator has a plurality of openings in at least a first direction; and
said x-rays emanating from said substrate surface are intensity modulated with said patterned aperture modulator and patterned aperture resolver before being detected by said X-ray detector.

2 . The device according to claim 1 , wherein said openings in at least one of said patterned aperture modulator or said patterned aperture resolver are arranged in at least one of a 1-dimensional pattern or a 2-dimensional pattern.

3 . The device according to claim 2 , wherein said 1-dimensional or 2-dimensional patterns are at least one of periodic or non-periodic.

4 . The device according to claim 2 , wherein:
an opening at a first position of at least one of said patterned aperture modulator or said patterned aperture resolver is configured with a first type of micro-pattern; and an opening at a second position of at least one of said patterned aperture modulator or said patterned aperture resolver is configured with a second type of micro-pattern, said second type of micro-pattern being different relative to said first type of micro-pattern.

5 . The device according to claim 4 , wherein said first type of micro-pattern is a plurality of slots in a first direction.

6 . The device according to claim 4 , wherein said second type of micro-pattern is a plurality of slots in a second direction, said second direction being different relative to said first direction.

7 . The device according to claim 1 , wherein a base material of said patterned aperture modulator and said patterned aperture resolver is designed for shielding x-ray radiation.

8 . The device according to claim 1 , wherein a vacuum window is positioned between said X-ray detector and said patterned aperture resolver or between said patterned aperture resolver and patterned aperture modulator or between said substrate and patterned aperture modulator.

9 . The device according to claim 1 , wherein said worktable is provided with a reference pattern.

10 . The device according to claim 1 , wherein said patterned aperture resolver is arranged at a distance from said X-ray detector.

11 . The device according to claim 1 , wherein said patterned aperture resolver is replaced by a patterned detector.

12 . The device according to claim 1 , further comprising at least one second X-ray detector arranged with a patterned aperture resolver and a patterned aperture modulator, said patterned aperture resolver with at least one opening facing towards said at least one second X-ray detector is arranged in front of said at least one second X-ray detector, said patterned aperture modulator is provided between said patterned aperture resolver and said substrate at a predetermined distance from said patterned aperture resolver and said substrate, where said patterned aperture modulator having a plurality of openings in at least a first direction, where said x-rays from said surface is intensity modulated with said patterned aperture modulator and said patterned aperture resolver before being detected by said at least one second X-ray detector, wherein said at least one first X-ray detector and said at least one second X-ray detector are arranged at a predetermined distance from each other for detecting height variations in a surface of said substrate.

13 . The device according to claim 12 , wherein said first and second x-ray detectors are positioned in a plane in parallel with the substrate and said height information is determined by triangulation.

14 . The device according to claim 12 , wherein said first detector is essentially in parallel with said substrate and said second detector is essentially perpendicular with the substrate.

15 . The device according to claim 12 , wherein said at least one first and said at least one second detectors are configured as a single unit.

16 . The device according to claim 12 , wherein said at least one first and said at least one second detectors are configured as separate units.

Assignees

• Arcam Ab

Inventors

• Lock Tomas

Classifications

• H01J37/30

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  using layers of powder being selectively joined, e.g. by selective laser sintering or melting · CPC title

• B29C64/393

  for controlling or regulating additive manufacturing processes · CPC title

• B29C64/364

  Conditioning of environment · CPC title

• B22F12/55

  Two or more means for feeding material · CPC title