Hot-working tool and manufacturing method therefor
US-2017342517-A1 · Nov 30, 2017 · US
US2017291211A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017291211-A1 |
| Application number | US-201515512712-A |
| Country | US |
| Kind code | A1 |
| Filing date | Sep 15, 2015 |
| Priority date | Sep 24, 2014 |
| Publication date | Oct 12, 2017 |
| Grant date | — |
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A laminated hard film is obtained by laminating a layer A and a layer B. The layer A has a composition different from that of the layer B. The layer A is formed of (Ti a Cr b Al c Si d )(C x N 1-x ) and satisifies the relationship of 0≦a≦0.10, 0.10≦b≦0.50, 0.50≦c≦0.90, 0≦d≦0.05, a+b+c+d=1 and 0≦x≦0.5. The layer B is formed of (Cr e Si 1-e )(C y N 1-y ) and satisfies the relationship of 0.90≦e≦1.0 and 0≦y≦0.5, or is formed of (Al f Si 1-f )(C 2 N 1-z ) and satisfies the relationship of 0.90≦f≦1.0 and 0≦x≦0.5. Each of the layer A and the layer B has a thickness of 2 to 100 nm, and the layer A and the layer B are each alternately laminated.
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1 . A laminated hard film obtained by laminating a layer A and a layer B, the layer A having a composition different from that of the layer B, wherein the layer A is formed of (Ti a Cr b Al c Si d )(C x N 1-x ) and satisfies the relationship of 0≦a≦0.10, 0.10≦b≦0.50, 0.50≦c≦0.90, 0≦d≦0.05, a+b+c+d=1 and 0≦x≦0.5, when atomic ratios of Ti, Cr, Al, Si and C are defined as a, b, c, d and x, respectively, the layer B is formed of (Cr e Si 1-e ) (C y N 1-y ) and satisfies the relationship of 0.90≦e≦1.0 and 0≦y≦0.5, when atomic ratios of Cr and C are defined as e and y, respectively, or is formed of (Al f Si 1-f )(C z N 1-z ) and satisfies the relationship of 0.90≦f≦1.0 and 0≦y≦0.5, when atomic ratios of Al and C are defined as f and z, respectively, and each of the layer A and the layer B has a thickness of 2 to 100 nm, and the layer A and the layer B are each alternately laminated. 2 . The laminated hard film according to claim 1 , wherein the atomic ratio of Al to a total of Ti, Cr, Al and Si in the layer A and the layer B falls within a range of 020 to 0.60. 3 . The laminated hard film according to claim 1 , wherein Ti in the layer A is at least partially substituted with Zr. 4 . A molding die comprising the laminated hard film according to claim 1 , a substrate surface. 5 . A molding die comprising the laminated hard film according to claim 3 , a substrate surface. 6 . The molding die according to claim 4 , comprising an intermediate layer of CrN having a thickness of 3 to 10 μm between the laminated hard film and the substrate. 7 . The molding die according to claim 5 , comprising an intermediate layer of CrN having a thickness of 3 to 10 μm between the laminated hard film and the substrate. 8 . The molding die according to claim 6 , which is suitable for hot forming of a steel material. 9 . The molding die according to claim 7 , which is suitable for hot forming of a steel material. 10 . The laminated hard film according to claim 2 , wherein Ti in the layer A is at least partially substituted with Zr. 11 . A molding die comprising the laminated hard film according to claim 2 on a substrate surface. 12 . A molding die comprising the laminated hard film according to claim 10 on a substrate surface. 13 . The molding die according to claim 11 , comprising an intermediate layer of CrN having a thickness of 3 to 10 μm between the laminated hard film and the substrate. 14 . The molding die according to claim 12 , comprising an intermediate layer of CrN having a thickness of 3 to 10 μm between the laminated hard film and the substrate. 15 . The molding die according to claim 13 , which is suitable for hot forming of a steel material. 16 . The molding die according to claim 14 , which is suitable for hot forming of a steel material.
Carbonitrides · CPC title
by explosion; by evaporation and subsequent ionisation of the vapours {, e.g. ion-plating}(C23C14/34 - C23C14/48 take precedence) · CPC title
Die sets; Pillar guides · CPC title
Nitrides (C23C14/0617 takes precedence) · CPC title
Selection of materials · CPC title
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