Laminated hard coating and molding die

US2017291211A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017291211-A1
Application numberUS-201515512712-A
CountryUS
Kind codeA1
Filing dateSep 15, 2015
Priority dateSep 24, 2014
Publication dateOct 12, 2017
Grant date

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  1. Title

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A laminated hard film is obtained by laminating a layer A and a layer B. The layer A has a composition different from that of the layer B. The layer A is formed of (Ti a Cr b Al c Si d )(C x N 1-x ) and satisifies the relationship of 0≦a≦0.10, 0.10≦b≦0.50, 0.50≦c≦0.90, 0≦d≦0.05, a+b+c+d=1 and 0≦x≦0.5. The layer B is formed of (Cr e Si 1-e )(C y N 1-y ) and satisfies the relationship of 0.90≦e≦1.0 and 0≦y≦0.5, or is formed of (Al f Si 1-f )(C 2 N 1-z ) and satisfies the relationship of 0.90≦f≦1.0 and 0≦x≦0.5. Each of the layer A and the layer B has a thickness of 2 to 100 nm, and the layer A and the layer B are each alternately laminated.

First claim

Opening claim text (preview).

1 . A laminated hard film obtained by laminating a layer A and a layer B, the layer A having a composition different from that of the layer B, wherein the layer A is formed of (Ti a Cr b Al c Si d )(C x N 1-x ) and satisfies the relationship of 0≦a≦0.10, 0.10≦b≦0.50, 0.50≦c≦0.90, 0≦d≦0.05, a+b+c+d=1 and 0≦x≦0.5, when atomic ratios of Ti, Cr, Al, Si and C are defined as a, b, c, d and x, respectively, the layer B is formed of (Cr e Si 1-e ) (C y N 1-y ) and satisfies the relationship of 0.90≦e≦1.0 and 0≦y≦0.5, when atomic ratios of Cr and C are defined as e and y, respectively, or is formed of (Al f Si 1-f )(C z N 1-z ) and satisfies the relationship of 0.90≦f≦1.0 and 0≦y≦0.5, when atomic ratios of Al and C are defined as f and z, respectively, and each of the layer A and the layer B has a thickness of 2 to 100 nm, and the layer A and the layer B are each alternately laminated. 2 . The laminated hard film according to claim 1 , wherein the atomic ratio of Al to a total of Ti, Cr, Al and Si in the layer A and the layer B falls within a range of 020 to 0.60. 3 . The laminated hard film according to claim 1 , wherein Ti in the layer A is at least partially substituted with Zr. 4 . A molding die comprising the laminated hard film according to claim 1 , a substrate surface. 5 . A molding die comprising the laminated hard film according to claim 3 , a substrate surface. 6 . The molding die according to claim 4 , comprising an intermediate layer of CrN having a thickness of 3 to 10 μm between the laminated hard film and the substrate. 7 . The molding die according to claim 5 , comprising an intermediate layer of CrN having a thickness of 3 to 10 μm between the laminated hard film and the substrate. 8 . The molding die according to claim 6 , which is suitable for hot forming of a steel material. 9 . The molding die according to claim 7 , which is suitable for hot forming of a steel material. 10 . The laminated hard film according to claim 2 , wherein Ti in the layer A is at least partially substituted with Zr. 11 . A molding die comprising the laminated hard film according to claim 2 on a substrate surface. 12 . A molding die comprising the laminated hard film according to claim 10 on a substrate surface. 13 . The molding die according to claim 11 , comprising an intermediate layer of CrN having a thickness of 3 to 10 μm between the laminated hard film and the substrate. 14 . The molding die according to claim 12 , comprising an intermediate layer of CrN having a thickness of 3 to 10 μm between the laminated hard film and the substrate. 15 . The molding die according to claim 13 , which is suitable for hot forming of a steel material. 16 . The molding die according to claim 14 , which is suitable for hot forming of a steel material.

Assignees

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Classifications

  • Carbonitrides · CPC title

  • by explosion; by evaporation and subsequent ionisation of the vapours {, e.g. ion-plating}(C23C14/34 - C23C14/48 take precedence) · CPC title

  • Die sets; Pillar guides · CPC title

  • Nitrides (C23C14/0617 takes precedence) · CPC title

  • B21D37/01Primary

    Selection of materials · CPC title

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What does patent US2017291211A1 cover?
A laminated hard film is obtained by laminating a layer A and a layer B. The layer A has a composition different from that of the layer B. The layer A is formed of (Ti a Cr b Al c Si d )(C x N 1-x ) and satisifies the relationship of 0≦a≦0.10, 0.10≦b≦0.50, 0.50≦c≦0.90, 0≦d≦0.05, a+b+c+d=1 and 0≦x≦0.5. The layer B is formed of (Cr e Si 1-e )(C y N 1-y ) and satisfies the relationship of 0.90≦e≦1…
Who is the assignee on this patent?
Kobe Steel Ltd
What technology area does this patent fall under?
Primary CPC classification B21D37/01. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Oct 12 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).