Method of forming an agent and its use in desulphurisation
US-9205367-B2 · Dec 8, 2015 · US
US2017291170A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017291170-A1 |
| Application number | US-201515510621-A |
| Country | US |
| Kind code | A1 |
| Filing date | Sep 11, 2015 |
| Priority date | Sep 12, 2014 |
| Publication date | Oct 12, 2017 |
| Grant date | — |
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Described herein are heterogeneous materials comprising a p-type semiconductor comprising two metal oxide compounds of the same metal in two different oxidation states and an n-type semiconductor having a deeper valence band than the p-type semiconductor valence bands, wherein the semiconductor types are in ionic communication with each other. The heterogeneous materials enhance photocatalytic activity.
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1 . A heterogeneous material comprising: a p-type semiconductor comprising a first metal oxide compound and a second metal oxide compound, wherein the first metal oxide compound and the second metal oxide compound have different oxidation states of the same metal, and wherein the p-type semiconductor has a p-type valence band; a first n-type semiconductor having an n-type valence band which is deeper than the p-type valence band, wherein the first n-type semiconductor is in ionic charge communication with the p-type semiconductor. 2 . The heterogeneous material of claim 1 , further comprising a second n-type semiconductor. 3 . The heterogeneous material of claim 1 , wherein the first n-type semiconductor is TiO 2 . 4 . The heterogeneous material of claim 1 , wherein the first n-type semiconductor is a combination of anatase TiO 2 and rutile TiO 2 . 5 . The heterogeneous material of claim 1 , wherein the first n-type semiconductor comprises WO 3 . 6 . The heterogeneous material of claim 1 , wherein the molar ratio of the first n-type semiconductor to the second n-type semiconductor is about 0.5 to about 10. 7 . The heterogeneous material of claim 1 , wherein the second n-type semiconductor is CeO 2 , GeO 2 , SnO 2 , or ZrO 2 . 8 . The heterogeneous material of claim 1 , wherein the second n-type semiconductor is CeO 2 . 9 . The heterogeneous material of claim 1 , wherein the second n-type semiconductor is GeO 2 . 10 . The heterogeneous material of claim 1 , wherein the second n-type semiconductor is SnO 2 . 11 . The heterogeneous material of claim 1 , wherein the p-type semiconductor comprises Cu x O. 12 . The heterogeneous material of claim 1 , wherein the p-type semiconductor is about 0.001% to about 5% of the heterogeneous material by weight. 13 . The heterogeneous material of claim 1 , wherein the p-type semiconductor is Cu x O, and is about 0.01% to about 1% of the heterogeneous material by weight. 14 . The heterogeneous material of claim 1 , wherein at least 50% of the p-type semiconductor is loaded onto the surface of particles of the first n-type semiconductor and particles of the second n-type semiconductor. 15 . The heterogeneous material of claim 1 , wherein the heterogeneous material is in the form of a powder. 16 . A method of preparing a heterogeneous material comprising: heating a mixture of: 1) a first n-type semiconductor and a second n-type semiconductor; and 2) an aqueous solution comprising a copper ion complex; wherein the first n-type semiconductor and the second n-type semiconductor are mixed prior to combining the first n-type semiconductor and the second n-type semiconductor with the aqueous solution comprising the copper ion complex. 17 . The method of claim 16 , further comprising filtering the heterogeneous material out of the mixture of the after the mixture has been heated. 18 . A method of decomposing a chemical compound, comprising exposing the chemical compound to a photocatalyst comprising the heterogeneous material of claim 1 in the presence of light. 19 . The method of claim 18 , wherein the chemical compound is a pollutant. 20 . A method of killing a microbe, comprising exposing the microbe to a photocatalyst comprising the heterogeneous material of claim 1 in the presence of light. 21 . The heterogeneous material of claim 1 , wherein the second n-type semiconductor is SnO 2 .
Indexing scheme associated with group B01J35/00, related to the analysis techniques used to determine the catalysts form or properties · CPC title
X-ray diffraction · CPC title
Mechanical properties · CPC title
with copper, silver or gold · CPC title
Mixing {(B01J37/0009, B01J37/0018 take precedence)} · CPC title
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