Photomask and method for manufacturing column spacer for color filter using the same

Patent metadata

Field	Value
Publication number	US-2017285459-A1
Application number	US-201715476267-A
Country	US
Kind code	A1
Filing date	Mar 31, 2017
Priority date	Mar 31, 2016
Publication date	Oct 5, 2017
Grant date	—

Abstract

The present invention relates to a photomask and a method for manufacturing a column spacer for a color filter using the same, and according to one aspect of the present invention, a photomask is provided, which comprises a central region having a first transmittance, a first perimeter region surrounding the central region and having a second transmittance lower than the first transmittance, and a second perimeter region surrounding the first perimeter region and having the first transmittance.

First claim

1 . A photomask comprising
a central region having a first transmittance; a first perimeter region surrounding said central region and having a second transmittance lower than the first transmittance; and a second perimeter region surrounding the first perimeter region and having the first transmittance.

2 . The photomask according to claim 1 , wherein
the first transmittance is 5%.

3 . The photomask according to claim 1 , wherein
the second transmittance is 0%.

4 . The photomask according to claim 1 , wherein
the central region has a circular shape having a predetermined diameter, and the first perimeter region has a ring shape surrounding the central region.

5 . The photomask according to claim 4 , wherein
the central region has a diameter of 20 to 30 μm, and the first perimeter region has an inner diameter of 20 to 30 μm and an outer diameter of 35 to 55 μm.

6 . A method for manufacturing a column spacer for a color filter, comprising steps of
coating a negative type photoresist on a substrate; and exposing the substrate using the photomask according to claim 1 .

7 . A photomask comprising
a central region having a first transmittance; a first perimeter region surrounding said central region and having a second transmittance lower than the first transmittance; a plurality of circular regions positioned in said first perimeter region and arranged along the circumferential direction based on the central region and having a third transmittance higher than the second transmittance; and a second perimeter region surrounding the first perimeter region and having the third transmittance.

8 .
The photomask according to claim 7 , wherein the first transmittance is 100%, the second transmittance is 0%, and the third transmittance is 5%.

9 . The photomask according to claim 7 , wherein
the central region has a circular shape having a predetermined diameter, and the first perimeter region has a ring shape surrounding the central region.

10 . The photomask according to claim 9 , wherein
the central region has a diameter of 5 to 9 μm, the circular region has a diameter of 3 to 5 μm, and the first perimeter region has an outer diameter of 38 to 42 μm.

11 . The photomask according to claim 10 , wherein
a distance between the centers of the central region and the circular region is 6 to 12 μm.

12 . The photomask according to claim 7 , wherein
eight circular regions are provided.

13 . A method for manufacturing a column spacer for a color filter, comprising steps of
coating a negative type photoresist on a substrate; and exposing the substrate using the photomask according to claim 1 .

Assignees

• Lg Chemical Ltd

Inventors

• Seo Dae Han
• Choi Dong Chang
• Park Kwang Han
• Han Sang Choll
• Kim Jae Jin
• Choi Eun Joo
• Song Min Soo

Classifications

• G03F7/0007

  Filters, e.g. additive colour filters; Components for display devices · CPC title

• G03F1/50 Primary

  Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof · CPC title

• G03F7/038

  Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F1/38 Primary

  Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof · CPC title