Optical isolator

Patent metadata

Field	Value
Publication number	US-2017285238-A1
Application number	US-201615086709-A
Country	US
Kind code	A1
Filing date	Mar 31, 2016
Priority date	Mar 31, 2016
Publication date	Oct 5, 2017
Grant date	—

Abstract

An optical assembly including a polarizing beam splitter (PBS) to receive a laser beam from a light source. A micro-electro-mechanical systems (MEMS) mirror disposed in a support structure of the assembly, wherein the MEMS mirror is rotatable and is configured to receive the laser beam from the PBS and to reflect an exit beam. A phase retardation layer deposited on the MEMS mirror.

First claim

1 . An optical assembly comprising:
a polarizing beam splitter (PBS) configured to receive a laser beam from a light source; a micro-electro-mechanical systems (MEMS) mirror disposed in a support structure, wherein the MEMS mirror is rotatable and is configured to receive the laser beam from the PBS and to reflect an exit beam; and a phase retardation layer deposited on the MEMS mirror.

2 . The optical assembly of claim 1 , wherein the phase retardation layer comprises a quarter wave plate (QWP).

3 . The optical assembly of claim 1 , wherein the phase retardation layer is not discrete but is spin-coated deposited onto the MEMS mirror at a wafer level.

4 . The optical assembly of claim 1 , wherein:
the MEMS mirror is configured to receive the laser beam at a first angle with respect to a normal axis of the MEMS mirror and the phase retardation layer; and the MEMS mirror is configured to reflect the laser beam at a second angle with respect to the normal axis of the MEMS mirror and the phase retardation layer, and wherein the first angle is equal to the second angle.

5 . The optical assembly of claim 1 , wherein the exit beam comprises a rotated polarization.

6 . The optical assembly of claim 1 , comprising the light source, wherein the light source comprises collimated optics.

7 . An electronic device comprising:
a processor and memory; and an optical assembly comprising:
a light source with collimated optics;
a polarizing beam splitter (PBS) configured to receive a laser beam from the light source;
a micro-electro-mechanical systems (MEMS) mirror disposed in a support structure, wherein the MEMS mirror is rotatable and is configured to receive the laser beam from the PBS and to reflect an exit beam; and
a phase retardation layer deposited on the MEMS mirror, wherein the exit beam comprises a rotated polarization.

8 . The electronic device of claim 7 , wherein the phase retardation layer comprises a quarter wave plate (QWP).

9 . The electronic device of claim 7 , wherein the phase retardation layer is not discrete but is spin-coated deposited onto the MEMS mirror at a wafer level.

10 . The electronic device of claim 7 , wherein:
the MEMS mirror is configured to receive the laser beam at a first angle with respect to a normal axis of the MEMS mirror and the phase retardation layer; and the MEMS mirror is configured to reflect the laser beam at a second angle with respect to the normal axis of the MEMS mirror and the phase retardation layer, and wherein the first angle is equal to the second angle.

11 . The electronic device of claim 7 , wherein the electronic device comprises a computing device.

12 . A method of manufacturing an optical system, comprising:
depositing a phase retardation layer on a micro-electro-mechanical systems (MEMS) mirror; disposing the MEMS mirror having the phase retardation layer in a support structure to receive a laser beam from a polarizing beam splitter (PBS) and to reflect an exit beam having a rotated polarization; and disposing the PBS to receive the laser beam from a light source and to provide the laser beam to the MEMS mirror having the phase retardation layer;

13 . The method of claim 12 , wherein the phase retardation layer comprises a quarter wave plate (QWP).

14 . The method of claim 12 , wherein the phase retardation layer is not discrete and wherein depositing comprises spin-coating the phase retardation layer onto the MEMS mirror at a wafer level.

15 . The method of claim 12 , wherein:
the MEMS mirror is configured to receive the laser beam at a first angle with respect to a normal axis of the MEMS mirror and the phase retardation layer; and the MEMS mirror is configured to reflect the laser beam at a second angle with respect to the normal axis of the MEMS mirror and the phase retardation layer, and wherein the first angle and the second angle are the same value.

16 . The optical method of claim 12 , comprising providing the light source.

17 . A method of operating an optical system, comprising:
providing a laser beam from a light source to a polarizing beam splitter (PBS); passing the laser beam through the PBS to a micro-electro-mechanical systems (MEMS) mirror, the MEMS mirror having a phase retardation layer deposited thereon; and reflecting, via the MEMS mirror, an exit beam through the deposited phase retardation layer, the exit beam having a rotated polarization.

18 . The method of claim 17 , wherein the phase retardation layer comprises a quarter wave plate (QWP).

19 . The method of claim 17 , wherein the phase retardation layer is not discrete and wherein the phase retardation layer is deposited onto the MEMS mirror at a wafer level.

20 . The method of claim 17 , wherein:
the MEMS mirror receives the laser beam at a first angle with respect to a normal axis of the MEMS mirror and the phase retardation layer; and the MEMS mirror reflects the laser beam at a second angle with respect to the normal axis of the MEMS mirror and the phase retardation layer, and wherein the first angle and the second angle are the same value.

Assignees

• Intel Corp

Inventors

• Hirshberg Arnon
• Freedman Barak
• Berkovitch Nikolai

Classifications

• G02B27/283

  used for beam splitting or combining · CPC title

• H04N3/08

  having a moving reflector · CPC title

• G02B5/3083 Primary

  Birefringent or phase retarding elements (G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001) · CPC title

• G02B26/0833

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title