SPECIAL LiPON MASK TO INCREASE LiPON IONIC CONDUCTIVITY AND TFB FABRICATION YIELD

US2017279115A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017279115-A1
Application numberUS-201515505864-A
CountryUS
Kind codeA1
Filing dateAug 28, 2015
Priority dateAug 28, 2014
Publication dateSep 28, 2017
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

According to general aspects, embodiments of the present disclosure relate to a special mask design that not only increases the ionic conductivity of a deposited LiPON layer but also increases device yield by reducing damage to the deposited layer from RF plasma. In embodiments, the mask includes a conductive bottom surface facing the substrate during deposition and a non-conductive opposite top side. According to aspects of the present disclosure, the conductive portion of the mask at the bottom side allows the formation of a weak secondary local plasma (or greater plasma immersion) to enhance nitrogen incorporation into the LiPON film. The non-conductive top side suppresses local micro-arcing, which will limit the plasma induced damage to the growing film.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method of manufacturing electrochemical devices comprising: providing a mask having top and bottom sides, said bottom side being electrically conductive and said top side being electrically non-conductive; forming a stack of device layers on a substrate, said stack of device layers comprising: a current collector layer on said substrate; and an electrode layer on said current collector layer; arranging said mask with said bottom side adjacent to a top surface of said stack; and depositing an electrolyte layer on said stack using a PVD process with said mask arranged having said bottom side adjacent to said film stack. 2 . The method of claim 1 , wherein said PVD process comprises RF sputtering. 3 . The method of claim 1 , wherein said electrolyte layer comprises LiPON. 4 . The method of claim 1 , wherein said electrode layer is a cathode layer. 5 . The method of claim 4 , wherein said cathode layer comprises LiCoO 2 . 6 . The method of claim 1 , wherein said electrochemical devices are thin film batteries. 7 . The method of claim 1 , wherein said mask is a metal body with a layer of dielectric material on said top side. 8 . The method of claim 7 , wherein said metal body comprises invar. 9 . The method of claim 7 , wherein said dielectric material comprises one or more of silicon oxide and silicon nitride. 10 . The method of claim 1 , wherein said bottom side has an electrical conductivity in the range of 10 5 to 10 7 S/m. 11 . The method of claim 1 , wherein said top side has an electrical conductivity less than 10 −7 S/m. 12 . A system for manufacturing electrochemical devices comprising: a shadow mask for patterning an electrolyte layer of an electrochemical device, said shadow mask comprising: a planar body with top and bottom sides, said bottom side having an electrical conductivity in the range of 10 5 to 10 7 S/m and said top side having an electrical conductivity less than 10 −7 S/m; and a first system for depositing a device stack on a substrate comprising a current collector, an electrode layer, and said electrolyte layer, said first system comprising a PVD deposition tool configured for depositing said electrolyte with said shadow mask with said bottom side of said shadow mask facing said substrate during said depositing. 13 . A shadow mask for patterning an electrolyte layer of an electrochemical device, said mask comprising: a planar body with a top side and a bottom side, said bottom side having an electrical conductivity in the range of 10 5 to 10 7 S/m and said top side having a electrical conductivity less than 10 −7 S/m. 14 . The shadow mask of claim 13 , wherein said planar body is a metal body with a layer of dielectric material on said top side. 15 . The shadow mask of claim 14 , wherein said dielectric material comprises one or more of silicon oxide and silicon nitride.

Assignees

Inventors

Classifications

  • Solid materials · CPC title

  • of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy · CPC title

  • Sputtering · CPC title

  • Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries · CPC title

  • of accumulators having only flat construction elements, i.e. flat positive electrodes, flat negative electrodes and flat separators · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2017279115A1 cover?
According to general aspects, embodiments of the present disclosure relate to a special mask design that not only increases the ionic conductivity of a deposited LiPON layer but also increases device yield by reducing damage to the deposited layer from RF plasma. In embodiments, the mask includes a conductive bottom surface facing the substrate during deposition and a non-conductive opposite to…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H01M10/0585. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Sep 28 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).