Plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-2017275761-A1
Application number	US-201715467602-A
Country	US
Kind code	A1
Filing date	Mar 23, 2017
Priority date	Mar 25, 2016
Publication date	Sep 28, 2017
Grant date	—

Abstract

A plasma processing apparatus includes a cylindrical electrode which has a lower end provided with an opening, an upper end that is a closed end, in which a process gas is introduced, and which obtains a plasma process gas upon application of the voltage, and a chamber that is a vacuum container provided with an opening. The cylindrical electrode, which has the upper end attached to the opening of the chamber via an insulation material, is extended in the chamber. The plasma processing apparatus also includes a rotation table carrying a workpiece to be processed by the process gas to a space below the opening of the cylindrical electrode, a shield covering the cylindrical electrode extended inside the chamber via a gap, and a spacer installed in the gap, and formed of an insulation material.

First claim

What is claimed is:

1 . A plasma processing apparatus comprising:
a cylindrical electrode having a first end provided with an opening, and a second end that is a closed end, a process gas being to be introduced in an interior of the cylindrical electrode, and the cylindrical electrode obtaining a plasma process gas upon application of a voltage; a vacuum container provided with an opening, the second end of the cylindrical electrode being attached to the opening via an insulation material, and the cylindrical electrode being extended in an interior of the vacuum container; a carrying unit carrying a workpiece to be processed by the process gas to a space below the opening of the cylindrical electrode; a shield connected to the vacuum container, and covering the cylindrical electrode extended in the interior of the vacuum container via a gap; and a spacer formed of an insulation material, and installed in a part of the gap between the cylindrical electrode and the shield.

2 . The plasma processing apparatus according to claim 1 , wherein the spacer is formed in a block shape.

3 . The plasma processing apparatus according to claim 2 , wherein a surface of the spacer facing the cylindrical electrode and a surface of the spacer facing the shield have an area of 1 to 3 cm 2 .

4 . The plasma processing apparatus according to claim 2 , wherein the spacer comprises an inclined part located at a corner of the surface facing the cylindrical electrode and at the opening side of the vacuum container, and inclined toward the shield.

5 . The plasma processing apparatus according to claim 3 , wherein the spacer comprises an inclined part located at a corner of the surface facing the cylindrical electrode and at the opening side of the vacuum container, and inclined toward the shield.

6 . The plasma processing apparatus according to claim 1 , wherein the spacer is fastened to the shield by a bolt formed of an insulation material.

7 . The plasma processing apparatus according to claim 1 , wherein the spacer is installed at a location nearby the first end of the cylindrical electrode.

8 . The plasma processing apparatus according to claim 2 , wherein the spacer is installed at a location nearby the first end of the cylindrical electrode.

9 . The plasma processing apparatus according to claim 1 , wherein a plurality of the spacers is installed at a location nearby the first end of the cylindrical electrode, a location nearby the second end, and a location nearby a middle portion between the first end and the second end.

10 . The plasma processing apparatus according to claim 2 , wherein a plurality of the spacers is installed at a location nearby the first end of the cylindrical electrode, a location nearby the second end, and a location nearby a middle portion between the first end and the second end.

11 . The plasma processing apparatus according to claim 1 , wherein:
the cylindrical electrode and the shield are each formed in a rectangular cylindrical shape; and a plurality of the spacers is installed at respective gaps at opposite sides between the cylindrical electrode and the shield.

12 . The plasma processing apparatus according to claim 2 , wherein:
the cylindrical electrode and the shield are each formed in a rectangular cylindrical shape; and a plurality of the spacers is installed at respective gaps at opposite sides between the cylindrical electrode and the shield.

Assignees

• Shibaura Mechatronics Corp

Inventors

• Kamo Yoshinao

Classifications

• H01J37/3417

  Arrangements · CPC title

• H01J37/32633 Primary

  Baffles · CPC title

• H01J37/32651 Primary

  Shields, e.g. dark space shields, Faraday shields · CPC title

• H01J37/32513

  Sealing means, e.g. sealing between different parts of the vessel · CPC title

• H01J37/32779

  of batches of workpieces · CPC title