An in-cell touch screen and display device
US-2017038887-A1 · Feb 9, 2017 · US
US2017255308A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017255308-A1 |
| Application number | US-201614912601-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jan 29, 2016 |
| Priority date | Dec 7, 2015 |
| Publication date | Sep 7, 2017 |
| Grant date | — |
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The present invention provides an in-cell touch display panel. In the in-cell touch display panel of the present invention, a first planarization layer ( 14 ) is solely arranged between a pixel electrode ( 15 ) and source/drain electrodes ( 45 ) located on one side of a TFT substrate ( 1 ) and the pixel electrode ( 15 ) is connected through a second via ( 141 ) formed in the first planarization layer ( 14 ) to the source/drain electrodes ( 45 ) so that compared to the prior art, the thickness of two passivation layers is omitted between the pixel electrode ( 15 ) and the source/drain electrodes ( 45 ) and negative influence caused by overlapping of vias between the first passivation layer ( 16 ) and the first planarization layer ( 14 ) and between the second passivation layer ( 18 ) and the first planarization layer ( 14 ) can be eliminated, whereby there is no need to take into consideration the relationship of the first planarization layer with respect to the first passivation layer and the second passivation layer in making a design so that the aperture ratio of the pixel can be greatly increased. Further, since the number of vias formed is reduced, the structure is simple and the manufacturing difficulty is lowered down to thereby improve product yield.
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What is claimed is: 1 . An in-cell touch display panel, comprising a thin-film transistor (TFT) substrate, a color filter (CF) substrate opposite to the TFT substrate, and a liquid crystal layer between the TFT substrate and the CF substrate; wherein the TFT substrate comprises a first base plate, a light-shielding layer formed on the first base plate, a first insulation layer formed on the first base plate and the light-shielding layer, a TFT layer formed on the first insulation layer, a first planarization layer formed on the TFT layer, a pixel electrode formed on the first planarization layer, a first passivation layer formed on the pixel electrode, a touch detection electrode layer formed on the first passivation layer, a second passivation layer formed on the first passivation layer and the touch detection electrode layer, and a common electrode formed on the second passivation layer; and the second passivation layer comprises a first via formed therein and corresponding to the touch detection electrode layer, the common electrode being connected, through the first via, to the touch detection electrode layer; and the TFT layer comprises source/drain electrodes, and the first planarization layer comprises a second via formed therein and corresponding to the source/drain electrodes, the pixel electrode being connected, through the second via, to the source/drain electrodes. 2 . The in-cell touch display panel as claimed in claim 1 , wherein the TFT layer comprises a poly-silicon layer formed on the first insulation layer, a second insulation layer formed on the first insulation layer and the poly-silicon layer, a gate electrode formed on the second insulation layer, a third insulation layer formed on the second insulation layer and the gate electrode, and the source/drain electrodes that are formed on the third insulation layer. 3 . The in-cell touch display panel as claimed in claim 2 , wherein the TFT layer further comprises a data line formed on the third insulation layer. 4 . The in-cell touch display panel as claimed in claim 3 , wherein the light-shielding layer shields and covers, in a horizontal direction, the poly-silicon layer, the gate electrode, and the source/drain electrodes entirety and shields and covers the data line partly; and the light-shielding layer is formed of a metallic material. 5 . The in-cell touch display panel as claimed in claim 2 , wherein the first insulation layer, the second insulation layer, the third insulation layer are each a silicon nitride, a silicon oxide, or a combined composite layer thereof. 6 . The in-cell touch display panel as claimed in claim 1 , wherein the common electrode and the pixel electrode are formed of a material comprising indium tin oxide. 7 . The in-cell touch display panel as claimed in claim 1 , wherein the CF substrate comprises a second base plate, a black matrix formed on the second base plate, a color resist layer formed on the second base plate and the black matrix, a second planarization layer formed on the color resist layer, and photo-spacers formed on the second planarization layer. 8 . The in-cell touch display panel as claimed in claim 7 , wherein the photo-spacers comprises a primary photo-spacer and a secondary photo-spacer; the primary photo-spacer is in contact engagement with the second passivation layer and the secondary photo-spacer defines a gap with respect to the common electrode. 9 . The in-cell touch display panel as claimed in claim 7 , wherein the first base plate and the second base plate are glass substrates. 10 . The in-cell touch display panel as claimed in claim 7 , wherein the color resist layer comprises a red color resist layer, a green color resist layer, and a blue color resist layer. 11 . An in-cell touch display panel, comprising a thin-film transistor (TFT) substrate, a color filter (CF) substrate opposite to the TFT substrate, and a liquid crystal layer between the TFT substrate and the CF substrate; wherein the TFT substrate comprises a first base plate, a light-shielding layer formed on the first base plate, a first insulation layer formed on the first base plate and the light-shielding layer, a TFT layer formed on the first insulation layer, a first planarization layer formed on the TFT layer, a pixel electrode formed on the first planarization layer, a first passivation layer formed on the pixel electrode, a touch detection electrode layer formed on the first passivation layer, a second passivation layer formed on the first passivation layer and the touch detection electrode layer, and a common electrode formed on the second passivation layer; and the second passivation layer comprises a first via formed therein and corresponding to the touch detection electrode layer, the common electrode being connected, through the first via, to the touch detection electrode layer; and the TFT layer comprises source/drain electrodes, and the first planarization layer comprises a second via formed therein and corresponding to the source/drain electrodes, the pixel electrode being connected, through the second via, to the source/drain electrodes; wherein the TFT layer comprises a poly-silicon layer formed on the first insulation layer, a second insulation layer formed on the first insulation layer and the poly-silicon layer, a gate electrode formed on the second insulation layer, a third insulation layer formed on the second insulation layer and the gate electrode, and the source/drain electrodes that are formed on the third insulation layer; wherein the common electrode and the pixel electrode are formed of a material comprising indium tin oxide; and wherein the CF substrate comprises a second base plate, a black matrix formed on the second base plate, a color resist layer formed on the second base plate and the black matrix, a second planarization layer formed on the color resist layer, and photo-spacers formed on the second planarization layer. 12 . The in-cell touch display panel as claimed in claim 11 , wherein the TFT layer further comprises a data line formed on the third insulation layer. 13 . The in-cell touch display panel as claimed in claim 12 , wherein the light-shielding layer shields and covers, in a horizontal direction, the poly-silicon layer, the gate electrode, and the source/drain electrodes entirety and shields and covers the data line partly; and the light-shielding layer is formed of a metallic material. 14 . The in-cell touch display panel as claimed in claim 11 , wherein the first insulation layer, the second insulation layer, the third insulation layer are each a silicon nitride, a silicon oxide, or a combined composite layer thereof. 15 . The in-cell touch display panel as claimed in claim 11 , wherein the photo-spacers comprises a primary photo-spacer and a secondary photo-spacer; the primary photo-spacer is in contact engagement with the second passivation layer and the secondary photo-spacer defines a gap with respect to the common electrode. 16 . The in-cell touch display panel as claimed in claim 11 , wherein the first base plate and the second base plate are glass substrates. 17 . The in-cell touch display panel as claimed in claim 11 , wherein the color resist layer comprises a red color resist layer, a green color resist layer, and a blue color resist layer.
Physics · mapped topic
Input devices, e.g. touch panels · CPC title
common or background · CPC title
poly-Si · CPC title
Colour filters · CPC title
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