Photoelectric conversion element having quantum structure using indirect transition conductor material

US2017200841A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017200841-A1
Application numberUS-201615378088-A
CountryUS
Kind codeA1
Filing dateDec 14, 2016
Priority dateJan 12, 2016
Publication dateJul 13, 2017
Grant date

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Abstract

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A photoelectric conversion element includes a photoelectric conversion layer having the quantum structure and utilizes intersubband transition in a conduction band. The photoelectric conversion element includes a superlattice semiconductor layer in which a barrier layer and a quantum dot layer as a quantum layer are alternately and repeatedly stacked. The barrier layer includes an indirect transition semiconductor material, and the quantum dot layer has a nano-structure including a direct transition semiconductor material. The indirect transition semiconductor material constituting the barrier layer has a bandgap of more than 1.42 eV at room temperature.

First claim

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What is claimed is: 1 . A photoelectric conversion element having a quantum structure using an indirect transition semiconductor material, the photoelectric conversion element utilizing intersubband transition in a conduction band and comprising: a photoelectric conversion layer having a quantum structure; and a superlattice semiconductor layer in which a barrier layer and a quantum layer are alternately and repeatedly stacked, wherein the barrier layer includes an indirect transition semiconductor material; the quantum layer has a nano-structure including a direct transition semiconductor material; and the indirect transition semiconductor material has a bandgap of more than 1.42 eV at room temperature. 2 . The photoelectric conversion element having a quantum structure using an indirect transition semiconductor material according to claim 1 , wherein the superlattice semiconductor layer is doped with an impurity. 3 . The photoelectric conversion element having a quantum structure using an indirect transition semiconductor material according to claim 1 , wherein the quantum layer is a quantum dot layer having a quantum dot. 4 . The photoelectric conversion element having a quantum structure using an indirect transition semiconductor material according to claim 3 , wherein the quantum dot layer contains the quantum dot and a cap; the quantum dot contains In; and the cap contains In x Ga 1-x As (0≦x≦1). 5 . The photoelectric conversion element having a quantum structure using an indirect transition semiconductor material according to claim 1 , wherein the indirect transition semiconductor material contains at least one of Al and P. 6 . The photoelectric conversion element having a quantum structure using an indirect transition semiconductor material according to claim 1 , further comprising substrate composed of GaAs.

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What does patent US2017200841A1 cover?
A photoelectric conversion element includes a photoelectric conversion layer having the quantum structure and utilizes intersubband transition in a conduction band. The photoelectric conversion element includes a superlattice semiconductor layer in which a barrier layer and a quantum dot layer as a quantum layer are alternately and repeatedly stacked. The barrier layer includes an indirect tran…
Who is the assignee on this patent?
Sharp Kk, Univ Tokyo
What technology area does this patent fall under?
Primary CPC classification H01L31/035236. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Jul 13 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).