Display panel with external signal lines under gate drive circuit
US-2017060317-A1 · Mar 2, 2017 · US
US2017192548A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017192548-A1 |
| Application number | US-201615222341-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 28, 2016 |
| Priority date | Jan 4, 2016 |
| Publication date | Jul 6, 2017 |
| Grant date | — |
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This disclosure provides a transparent conductive thin film, a substrate, a touch screen and a manufacturing method thereof, and a display device. The transparent conductive thin film comprises a first metal oxide layer, a metal layer and a second metal oxide layer arranged in a stacking manner.
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What is claimed is: 1 . A transparent conductive thin film comprising a first metal oxide layer, a metal layer and a second metal oxide layer arranged in a stacking manner. 2 . The transparent conductive thin film according to claim 1 , wherein the transparent conductive layer comprises a first indium gallium zinc oxide (IGZO) layer, a manganese oxide layer, a metal layer, a second manganese oxide layer and a second IGZO layer stacked in order. 3 . The transparent conductive thin film according to claim 2 , wherein the metal layer is made of copper or silver. 4 . The transparent conductive thin film according to claim 3 , wherein when the metal layer is made of copper, the first IGZO layer has a thickness of 45 nm to 50 nm, the second IGZO layer has a thickness of 30 nm to 35 nm, the metal layer has a thickness of 10 nm to 15 nm, and the first manganese oxide layer and the second manganese oxide layer each have a thickness of 3 nm to 5 nm. 5 . A substrate comprising a plurality of signal transmission lines formed on a base substrate, wherein the signal transmission lines are made of the transparent conductive thin film according to claim 1 . 6 . The substrate according to claim 5 , wherein the transparent conductive thin film comprises a first indium gallium zinc oxide (IGZO) layer, a first manganese oxide layer, a metal layer, a second manganese oxide layer and a second IGZO layer stacked in order. 7 . The substrate according to claim 6 , wherein the metal layer is made of copper or silver. 8 . The substrate according to claim 7 , wherein when the metal layer is made of copper, the first IGZO layer has a thickness of 45 nm to 50 nm, the second IGZO layer has a thickness of 30 nm to 35 nm, the metal layer has a thickness of 10 nm to 15 nm, and the first manganese oxide layer and the second manganese oxide layer each have a thickness of 3 nm to 5 nm. 9 . A touch screen comprising the substrate according to claim 5 , wherein the signal transmission lines are touch signal transmission lines connected with touch electrodes of the touch screen. 10 . The touch screen according to claim 9 , wherein the touch electrodes are made of the transparent conductive thin film. 11 . The touch screen according to claim 9 , wherein the transparent conductive thin film comprises a first indium gallium zinc oxide (IGZO) layer, a first manganese oxide layer, a metal layer, a second manganese oxide layer and a second IGZO layer stacked in order. 12 . The touch screen according to claim 11 , wherein the metal layer is made of copper or silver. 13 . The touch screen according to claim 12 , wherein when the metal layer is made of copper, the first IGZO layer has a thickness of 45 nm to 50 nm, the second IGZO layer has a thickness of 30 nm to 35 nm, the metal layer has a thickness of 10 nm to 15 nm, and the first manganese oxide layer and the second manganese oxide layer each have a thickness of 3 nm to 5 nm. 14 . A display device comprising the touch screen according to claim 9 . 15 . The display device according to claim 14 , wherein the touch electrodes are made of the transparent conductive thin film. 16 . The display device according to claim 14 , wherein the transparent conductive thin film comprises a first indium gallium zinc oxide (IGZO) layer, a first manganese oxide layer, a metal layer, a second manganese oxide layer and a second IGZO layer stacked in order. 17 . The touch screen according to claim 15 , wherein when the metal layer is made of copper, the first IGZO layer has a thickness of 45 nm to 50 nm, the second IGZO layer has a thickness of 30 nm to 35 nm, the metal layer has a thickness of 10 nm to 15 nm, and the first manganese oxide layer and the second manganese oxide layer each have a thickness of 3 nm to 5 nm. 18 . A method of manufacturing a touch screen, comprising: providing a base substrate, forming a vanishing layer on the base substrate; forming touch electrodes on the vanishing layer; forming a first planarization layer on the base substrate where the touch electrodes have been formed; and forming, on the first planarization layer, touch signal transmission lines connected with the touch electrodes, using the transparent conductive thin film according to claim 1 . 19 . The method of manufacturing the touch screen according to claim 18 , wherein a step of forming the touch electrodes comprises forming the touch electrodes on the vanishing layer using the transparent conductive thin film. 20 . The method of manufacturing the touch screen according to claim 18 , wherein after forming the touch signal transmission lines, the method further comprises forming a second planarization layer on the base substrate where the touch signal transmission lines have been formed.
Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices · CPC title
Digitisers structurally integrated in a display · CPC title
comprising conductive layers or films on insulating-supports · CPC title
Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate · CPC title
Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means · CPC title
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