Method for forming negative tone pattern, method for manufacturing electronic device, and active-light-sensitive or radiation-sensitive resin composition

Patent metadata

Field	Value
Publication number	US-2017192355-A1
Application number	US-201715467357-A
Country	US
Kind code	A1
Filing date	Mar 23, 2017
Priority date	Sep 29, 2014
Publication date	Jul 6, 2017
Grant date	—

Abstract

The present invention has an object to provide a method for forming a negative tone pattern in which shrinkage of a film in post exposure bake is suppressed; a method for manufacturing an electronic device including the pattern forming method; and an active-light-sensitive or radiation-sensitive resin composition. The method for forming a negative tone pattern of the present invention includes: a film formation step of forming an active-light-sensitive or radiation-sensitive resin composition film on a substrate, using a resist composition; an exposing step of irradiating the film with active light or radiation; a heating treatment step of performing a heating treatment on the film irradiated with active light or radiation; and a developing step of developing the heating-treated film using a developer including an organic solvent, in which the resist composition includes a resin A having a repeating unit A with a group represented by a specific formula, a resin B having a repeating unit B with a group represented by a specific formula, and a compound that generates an acid upon irradiation with active light or radiation.

First claim

What is claimed is:

1 . A method for forming a negative tone pattern comprising:
a film formation step of forming an active-light-sensitive or radiation-sensitive resin composition film on a substrate, using an active-light-sensitive or radiation-sensitive resin composition; an exposing step of irradiating the film with active light or radiation; a heating treatment step of performing a heating treatment on the film irradiated with active light or radiation; and a developing step of developing the heating-treated film using a developer including an organic solvent, wherein the active-light-sensitive or radiation-sensitive resin composition includes a resin A having a repeating unit A with a group represented by the following Formula (1), a resin B having a repeating unit B with a group represented by the following Formula (2), and a compound that generates an acid upon irradiation with active light or radiation,

in Formula (1), R a1 represents an alkyl group, R b1 represents an alkylene group having 2 or more carbon atoms, and * represents a binding position,
in Formula (2), R a2 represents an alkyl group, here, R a2 is an alkyl group which is different from R a1 , R b2 represents an alkylene group having 2 or more carbon atoms, and * represents a binding position, and
here, at least one of R a1 or R a2 is an alkyl group having 3 or more carbon atoms.

2 . The method for forming a negative tone pattern according to claim 1 , wherein the repeating unit A is represented by the following Formula (1-1) and the repeating unit B is represented by the following Formula (2-1),

in Formula (1-1), R a1 represents an alkyl group, R b1 represents an alkylene group having, 2 or more carbon atoms, L represents a single bond or a divalent linking group, X represents a hydrogen atom or an organic group, and * represents a binding position,
in Formula (2-1), R a2 represents an alkyl group, here, R a2 is an alkyl group which is different from R a1 , R b2 represents an alkylene group having 2 or more carbon atoms, L represents a single bond or a divalent linking group, X represents a hydrogen atom or an organic group, and * represents a binding position, and
here, at least one of R a1 or R a2 is an alkyl group having 3 or more carbon atoms.

3 . The method for forming a negative tone pattern according to claim 1 , wherein the both R a1 and R a2 are an alkyl group having 3 or more carbon atoms.

4 . A method for manufacturing an electronic device, comprising the method for forming a negative tone pattern according to claim 1 .

5 . An active-light-sensitive or radiation-sensitive resin composition comprising:
a resin A having a repeating unit A with a group represented by the following Formula (1); a resin B having a repeating unit B with a group represented by the following Formula (2); and a compound that generates an acid upon irradiation with active light or radiation,

in Formula (1), R a1 represents an alkyl group, R b1 represents an alkylene group having 2 or more carbon atoms, and * represents a binding position,
in Formula (2), R a2 represents an alkyl group, here, R a2 is an alkyl group which is different from R a1 , R b2 represents an alkylene group having 2 or more carbon atoms, and * represents a binding position, and
here, at least one of R a1 or R a2 is an alkyl group having 3 or more carbon atoms.

6 . The method for forming a negative tone pattern according to claim 2 , wherein the both R a1 and R a2 are an alkyl group having 3 or more carbon atoms.

7 . A method for manufacturing an electronic device, comprising the method for forming a negative tone pattern according to claim 2 .

8 . A method for manufacturing an electronic device, comprising the method for forming a negative tone pattern according to claim 3 .

9 . A method for manufacturing an electronic device, comprising the method for forming a negative tone pattern according to claim 6 .

Assignees

• Fujifilm Corp

Inventors

• KOJIMA Masafumi
• Goto Akiyoshi
• Shibuya Akinori
• Kato Keita
• OU Keiyu

Classifications

• H10P76/00

  Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title

• G03F7/091

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title

• G03F7/168

  Finishing the coated layer, e.g. drying, baking, soaking · CPC title