Photopatternable compositions, patterned high k thin film dielectrics and related devices

US2017192354A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017192354-A1
Application numberUS-201615390708-A
CountryUS
Kind codeA1
Filing dateDec 26, 2016
Priority dateJun 26, 2014
Publication dateJul 6, 2017
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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The present teachings relate to a photopatternable composition including a vinylidene fluoride-based polymer, a photosensitive non-nucleophilic base, and a crosslinking agent. The photopatternable composition can be used to prepare a patterned thin film component for use in an electronic, optical, or optoelectronic device such as an organic thin film transistor. The patterned thin film component can be used as a gate dielectric with a high dielectric constant, for example, a dielectric constant greater than 10.

First claim

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1 . A method of forming a patterned thin film component for use in an electronic, optical, or optoelectronic device, the method comprising: depositing onto a substrate a photopatternable composition to provide a thin film; exposing the thin film to radiation in an imagewise pattern such that unexposed areas of the thin film are soluble in a developing agent and exposed areas of the thin film become insoluble in the developing agent; and removing the unexposed areas of the thin film with the developing agent to provide a patterned thin film component; wherein the photopatternable composition comprises a vinylidene fluoride-based polymer, a photosensitive non-nucleophilic base, and a crosslinking agent, wherein: the vinylidene fluoride-based polymer comprises a first repeating unit that is vinylidene fluoride, a second repeating unit selected from the group consisting of vinyl fluoride, trifluoroethylene, chlorofluoroethylene, chlorotrifluoroethylene, vinylidene chloride, and hexafluoropropylene, and optionally a third repeating unit different from the second repeating unit that is selected from the group consisting of vinyl fluoride, chlorofluoroethylene, chlorotrifluoroethylene, vinylidene chloride, and hexafluoropropylene; the photosensitive non-nucleophilic base is represented by one of the formulae selected from the group consisting of: wherein Y is selected from the group consisting of C═C, CR 2 , NR, O, S, and Se, wherein R is H, a C 1-6 alkyl group, an optionally substituted phenyl group, or an optionally substituted benzyl group; Z is selected from the group consisting of NR, an optionally substituted pyridyl group, or a covalent bond; R a , R b , R c , and R d independently are H, a C 1-6 alkyl group, an optionally substituted phenyl group, or an optionally substituted benzyl group, or R a and R b together and/or R c and R d together can be joined with the nitrogen atom to form a guanidinyl group or a triaminophosphazenyl group; R e and R f independently are a halo group, a cyano group, a nitro group, a C 1-6 alkyl group, a C 1-6 haloalkyl group, or a C 1-6 alkoxy group; R g , R h , R i , and R j independently are H, a halo group, a cyano group, a nitro group, a C 1-6 alkyl group, a C 1-6 haloalkyl group, or a C 1-6 alkoxy group, an optionally substituted phenyl group, or an optionally substituted benzyl group, or R g and R h together or R h and R i together or R i and R j together can be joined with the two carbon atoms therebetween to form an optionally substituted C 6-14 aryl group or an optionally substituted 5-14 membered heteroaryl group; R k , R l , R m and R n independently are H, a halo group, a cyano group, a nitro group, a C 1-6 alkyl group, a C 1-6 haloalkyl group, or a C 1-6 alkoxy group, an optionally substituted phenyl group, or an optionally substituted benzyl group, or R k and R l together or R l and R m together or R m and R n together can be joined with the two carbon atoms therebetween to form an optionally substituted C 6-14 aryl group or an optionally substituted 5-14 membered heteroaryl group; or if neither R g and R h together nor R m and R n together join to form an optionally substituted C 6-14 aryl group or an optionally substituted 5-14 membered heteroaryl group, then R g and R n together can be joined with Q and the four carbon atoms therebetween to form an optionally substituted C 6-14 aryl group or an optionally substituted 5-14 membered heteroaryl group; and n is 0, 1, 2 or 3; and the crosslinking agent is not thermally activated and is not peroxide-based. 2 . The method of claim 1 , wherein the photosensitive non-nucleophilic base is represented by one of the formulae selected from the group consisting of: wherein each R 1 and R 2 independently is H or a C 1-6 alkyl group; each R 3 independently is a C 1-6 alkyl group or an optionally substituted benzyl group; and m is 0, 1, or 2. 3 . The method of claim 1 , wherein the photosensitive non-nucleophilic base is selected from the group consisting of: 4 . The method of claim 1 , wherein the vinylidene fluoride-based polymer is a copolymer selected from the group consisting of a copolymer of vinylidene fluoride and trifluoroethylene (P(VDF-TrFE)), a copolymer of vinylidene fluoride and chlorotrifluoroethylene (P(VDF-CTFE)), and a copolymer of vinylidene fluoride and hexafluoropropylene (P(VDF-HFP)), or a terpolymer selected from the group consisting of poly(vinylidene fluoride-trifluoroethylene-chlorotrifluoroethylene), poly(vinylidene fluoride-trifluoroethylene-chlorofluoroethylene), poly(vinylidene fluoride-trifluoroethylene-hexafluoropropylene), poly(vinylidene fluoride-trifluoroethylene-vinyl fluoride), and poly(vinylidene fluoride-trifluoroethylene-vinylidene chloride). 5 . The method of claim 1 , wherein the partially fluorinated polymer is represented by formula (I): wherein X 1 is H or Cl; X 2 , X 3 , and X 4 are selected from the group consisting of H, F and Cl, provided that no more than one of X 2 , X 3 , and X 4 is Cl and not all of X 2 , X 3 , and X 4 are F; x is between about 30 mol % and about 85 mol %; y is between about 10 mol % and about 65 mol %; and x+y≦100 mol %. 6 . The method of claim 5 , wherein x is between about 55 mol % and about 75 mol %, and y is between about 15 mol % and about 35 mol %. 7 . The method of claim 1 , wherein the crosslinking agent comprises two or more crosslinking groups independently selected from the group consisting of maleimide, amine, thiol, phenol, cinnamate and coumarin groups; wherein optionally, the crosslinking agent is selected from the group consisting of a bisphenol, a diamine, a bismaleimide, a multifunctional thiol, and a bis(cinnamate). 8 . The method of claim 1 , wherein the crosslinking agent does not absorb in the same wavelengths as the photosensitive non-nucleophilic base. 9 . The method of claim 1 , wherein the photosensitive non-nucleophilic base and the crosslinking agent individually are present in the composition at less than about 10 wt % of the vinylidene fluoride-based polymer. 10 . The method of claim 1 , wherein the photopatternable composition comprises an organic solvent selected from the group consisting of ethyl acetate, propyl acetate, butyl acetate, isobutyl acetate, pentyl acetate, cyclohexyl acetate, heptyl acetate, ethyl propionate, propyl propionate, butyl propionate, isobutyl propionate, propylene glycol monomethyl ether acetate (PGMEA), methyl lactate, ethyl lactate, γ-butyrolactone, acetone, acetylacetone, methyl ethyl ketone, methyl isobutyl ketone, 2-butanone, 2-pentanone, 3-pentanone, 2-heptanone, 3-heptanone, cyclopentanone, and cyclohexanone. 11 . The method of claim 10 , wherein the vinylidene fluoride-based polymer and the organic solvent have a weight-to-volume ratio between about 20 mg/ml and about 100 mg/ml. 12 . The method of claim 1 comprising providing an organic thin film adjacent to the patterned thin film component, wherein the organic thin film comprises a non-ferroelectric polymer.

Assignees

Inventors

Classifications

  • Liquid compositions therefor, e.g. developers · CPC title

  • Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

  • Homopolymers or copolymers of vinylidene fluoride · CPC title

  • Vinylidene fluoride · CPC title

  • with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

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What does patent US2017192354A1 cover?
The present teachings relate to a photopatternable composition including a vinylidene fluoride-based polymer, a photosensitive non-nucleophilic base, and a crosslinking agent. The photopatternable composition can be used to prepare a patterned thin film component for use in an electronic, optical, or optoelectronic device such as an organic thin film transistor. The patterned thin film componen…
Who is the assignee on this patent?
Flexterra Inc, E T C Srl
What technology area does this patent fall under?
Primary CPC classification G03F7/0045. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jul 06 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).