Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article
US-2024393682-A1 · Nov 28, 2024 · US
US2017192351A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017192351-A1 |
| Application number | US-201515304848-A |
| Country | US |
| Kind code | A1 |
| Filing date | Apr 14, 2015 |
| Priority date | Apr 17, 2014 |
| Publication date | Jul 6, 2017 |
| Grant date | — |
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A process for plasmonic-based high resolution color printing is provided. The process includes a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film, the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction limit of visible light. A nanostructured metal film or metal-film coated support obtained by the process and a method for generating a color image are also provided.
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1 . A process for plasmonic-based high resolution color printing, the process comprising: a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film, the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction omit of visible light. 2 . The process according to claim 1 , wherein the support comprises a material selected from the group consisting of a polymer, a metal, a metalloid, and combinations thereof. 3 . The process according to claim 1 , wherein the support is at least substantially transparent to visible light. 4 . The process according to claim 1 , wherein providing the nanostructured substrate surface comprises patterning the support by a method selected from the group consisting of nanoimprint lithography, electron beam lithography, photolithography, and combinations thereof. 5 . The process according to claim 1 , wherein providing the nanostructured substrate surface comprises patterning the support by nanoimprint lithography. 6 . The process according to claim 1 , further comprising separating the continuous metal film from the nanostructured substrate surface. 7 . The process according to claim 1 , wherein forming the conformal continuous metal coating is carried out by a method selected from the group consisting of vapor disposition, sputtering, casting, coating, electroplating, and combinations thereof. 8 . The process according to claim 1 , wherein the periodicity is 500 nm or less. 9 . The process according to claim 1 , wherein the periodicity is in the range of about 5 nm to about 500 nm. 10 . The process according to claim 1 , wherein height of each nanostructure is 200 nm or less. 11 . The process according to claim 1 , wherein height of each nanostructure is in the range of about 100 nm to about 200 nm. 12 . The process according to claim 1 , wherein each nanostructure has a cross sectional dimension in the range of about 10 nm to about 250 nm, the cross sectional dimension being defined along a transverse axis of the nanostructure. 13 . The process according to claim 1 , wherein the continuous metal film comprises a metal selected from the group consisting of gold, silver, copper, aluminum, and combinations thereof. 14 . The process according to claim 1 , wherein the continuous metal film comprises aluminum. 15 . The process according to claim 1 , wherein the color image is observable using bright-field illumination. 16 . A nanostructured metal film or metal-film coated support obtained by a process for plasmonic-based high resolution color printing, the process comprising: a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film, the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction limit of visible. 17 . A method for generating a color image, the method comprising irradiating visible light on a nanostructured metal film or metal-film coated support obtained by a process for plasmonic-based high resolution color printing, the process comprising: a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction limit of visible light. 18 . (canceled)
with pitch less than or comparable to the wavelength · CPC title
Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title
from the gas phase, by plasma deposition (G03F7/2035 takes precedence) · CPC title
Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title
involving surface plasmon interaction · CPC title
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