Cooled gas feed block with baffle and nozzle for hdp-cvd

US2017191161A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017191161-A1
Application numberUS-201615141443-A
CountryUS
Kind codeA1
Filing dateApr 28, 2016
Priority dateJan 5, 2016
Publication dateJul 6, 2017
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Techniques are disclosed for methods and apparatuses for reducing particle contamination formation in a high temperature processing chamber with a cooled gas feed block. The cooled gas feed has a body. The body has a main center portion having a top surface and a bottom surface. The body also has a flange extending outward from the bottom surface of the main center portion. A gas channel is disposed through the body. The gas channel has an inlet formed in the top surface of the main center portion and an outlet formed in the bottom surface of the main center portion. The body also has a center coolant channel. The center coolant channel has a first portion having an inlet formed in the top surface of the main center portion, and a second portion coupled to the first portion, the second portion having an outlet formed a sidewall of the flange.

First claim

Opening claim text (preview).

What is claimed is: 1 . A cooled gas feed block comprising: a body comprising: a main center portion having a top surface and a bottom surface; and a flange extending outward from the bottom surface of the main center portion; a gas channel disposed through the body, the gas channel having an inlet formed in the top surface of the main center portion and an outlet formed in the bottom surface of the main center portion; and a center coolant channel comprising: a first portion having an inlet formed in the top surface of the main center portion; and a second portion coupled to the first portion, the second portion having an outlet formed a sidewall of the flange. 2 . The cooled gas feed block of claim 1 further comprising: an outer coolant channel disposed outward of the center coolant channel relative to a centerline of the main center portion. 3 . The cooled gas feed block of claim 2 , wherein the outer coolant channel further comprises: a first arc shaped manifold; and a second arc shaped manifold fluidly connected to the first arc shaped manifold by an inner conduit. 4 . The cooled gas feed block of claim 2 , wherein the gas channel is between the outer coolant channel and the inter coolant channel. 5 . The cooled gas feed block of claim 1 , wherein the first portion of the center coolant channel is formed on a centerline of the main center portion. 6 . The cooled gas feed block of claim 5 , wherein the first portion is not though the bottom surface. 7 . The cooled gas feed block of claim 1 , wherein the second is portion parallel to the bottom surface. 8 . The cooled gas feed block of claim 1 , wherein the main center portion has a recess formed in the bottom surface. 9 . The cooled gas feed block of claim 8 , wherein the second portion is adjacent the recess. 10 . A processing chamber comprising: a chamber body; lid disposed on the chamber body; at least one gas cooled feed block coupled to an exterior of at least one of the chamber body and lid, the gas cooled feed block comprising: a body comprising: a main center portion having a top surface and a bottom surface; and a flange extending outward from the bottom surface of the main center portion; a gas channel disposed through the body, the gas channel having an inlet formed in the top surface of the main center portion and an outlet formed in the bottom surface of the main center portion; and a center coolant channel comprising: a first portion having an inlet formed in the top surface of the main center portion; and a second portion coupled to the first portion, the second portion having an outlet formed a sidewall of the flange. 11 . The processing chamber of claim 10 , further comprising: a nozzle disposed on an interior of the chamber body, wherein the gas passage into the interior of the chamber body extends through the gas cooled feed block and the nozzle. 12 . The processing chamber of claim 11 , wherein the nozzle has a texture exposed to the interior of the chamber body. 13 . The processing chamber of claim 12 , wherein the texture has a mean roughness (Ra) of 1.18 microns. 14 . The processing chamber of claim 10 , further comprising: a baffle disposed on an interior of the chamber body, wherein the gas passage into the interior of the chamber body extends through gas cooled feed block and the baffle. 15 . The processing chamber of claim 14 , wherein the baffle has a texture exposed to the interior of the chamber body. 16 . The processing chamber of claim 14 , wherein the baffle is disposed on the lid. 17 . The processing chamber of claim 10 , wherein each gas cooled feed block is associated with one nozzle or baffle. 18 . A method for providing gas into a processing chamber, the method comprising: flowing a first coolant through a centerline of a cooled gas block; flowing a process gas through cooled gas block offset from the centerline of the cooled gas block; and flowing a second coolant through a channel outward of the process gas flow.

Assignees

Inventors

Classifications

  • Cleaning · CPC title

  • Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber · CPC title

  • CVD [Chemical Vapor Deposition] · CPC title

  • Temperature · CPC title

  • Cleaning of reactor or parts inside the reactor by using reactive gases · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2017191161A1 cover?
Techniques are disclosed for methods and apparatuses for reducing particle contamination formation in a high temperature processing chamber with a cooled gas feed block. The cooled gas feed has a body. The body has a main center portion having a top surface and a bottom surface. The body also has a flange extending outward from the bottom surface of the main center portion. A gas channel is dis…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification C23C16/4405. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jul 06 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).