Curable composition, pattern forming method, pattern, and method for manufacturing device

Patent metadata

Field	Value
Publication number	US-2017190820-A1
Application number	US-201715465080-A
Country	US
Kind code	A1
Filing date	Mar 21, 2017
Priority date	Sep 26, 2014
Publication date	Jul 6, 2017
Grant date	—

Abstract

Provided are a curable composition having excellent releasability and ink jet discharge accuracy, a pattern forming method, a pattern, and a method for manufacturing a device.
The curable composition includes a polymerizable compound and a photopolymerization initiator, in which neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate.

First claim

What is claimed is:

1 . A curable composition comprising:
a polymerizable compound; and a photopolymerization initiator, wherein neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate:

2 . The curable composition according to claim 1 , wherein the content of the compound represented by Formula (I) is 2% by mass or less with respect to the content of neopentyl glycol diacrylate.

3 . The curable composition according to claim 1 , wherein the content of the compound represented by Formula (II) is 2% by mass or less with respect to the content of neopentyl glycol diacrylate.

4 . The curable composition according to claim 1 , wherein the polymerizable compound further includes a polymerizable compound having one selected from an alicyclic hydrocarbon structure and an aromatic structure.

5 . The curable composition according to claim 1 , which is used for imprints.

6 . The curable composition according to claim 1 , which is used for ink jet.

7 . A pattern forming method comprising:
applying the curable composition according to claim 1 on a base material or a mold having a pattern; and irradiating the curable composition with light in a state of keeping the composition sandwiched between the mold and the base material.

8 . The pattern forming method according to claim 7 , wherein the method for applying the curable composition on the base material or the mold having a pattern is an ink jet method.

9 . A pattern obtained by the pattern forming method according to claim 7 .

10 . A method for manufacturing a device, comprising:
the pattern forming method according to claim 7 .

Assignees

• Fujifilm Corp

Inventors

• Kitagawa Hirotaka
• Goto Yuichiro

Classifications

• H10P76/20

  of masks comprising organic materials · CPC title

• C08F222/1025

  of aromatic dialcohols · CPC title

• C08F222/102

  of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate · CPC title

• C08F222/10 Primary

  Esters · CPC title

• C08F20/20 Primary

  of polyhydric alcohols or {polyhydric} phenols {, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate} · CPC title