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Plasma emitting method and plasma emitting device
US2017182473A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017182473-A1 |
| Application number | US-201415314047-A |
| Country | US |
| Kind code | A1 |
| Filing date | May 30, 2014 |
| Priority date | May 30, 2014 |
| Publication date | Jun 29, 2017 |
| Grant date | — |
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- Title
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Abstract
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Water is flowed inside main body section formed from an insulating material such that a specified space remains inside the main body section. Electrodes and are arranged along the outer walls of the main body section and voltage is applied to the electrodes. Processing gas present inside the main body section is plasmarized and plasma is emitted to the water flowing inside the main body section.
First claim
Opening claim text (preview).
1 . A plasma emitting method of emitting plasma to a liquid, the plasma emitting method comprising: a liquid flowing step of flowing a liquid inside a tubular member formed from an insulating material such that a specified space remains inside the tubular member; and a plasmarizing step of plasmarizing gas present in the specified space by applying voltage to a pair of electrodes arranged along outer walls of the tubular member. 2 . The plasma emitting method according to claim 1 , wherein the plasma emitting method further includes a gas flowing step of flowing a gas in the specified space. 3 . The plasma emitting method of claim 1 , wherein the plasma emitting method further includes a bubble generating step for generating bubbles in the liquid that is flowed inside the tubular member before the liquid flowing step. 4 . A plasma emitting device comprising: a tubular member formed from an insulating material; a pair of electrodes arranged along outer walls of the tubular member; and a flow device that flows a liquid inside the tubular member such that a specified space remains inside the tubular member; wherein plasma is emitted to the liquid flowing inside the tubular member by gas present in the specified space being plasmarized by voltage being applied to the pair of electrodes. 5 . The plasma emitting device according to claim 4 , wherein, each of the pair of the electrodes includes multiple electrical discharge sections provided extending in a circumferential direction of the outer walls of the tubular member; and one of the electrical discharge sections of the pair of electrodes and another of the electrical discharge sections of the pair of electrodes are provided alternately spaced apart extending in an axis direction of the tubular member. 6 . The plasma emitting device according to claim 4 , wherein an outlet that ejects liquid of the flow device is provided inside the tubular member. 7 . The plasma emitting device according to claim 4 , wherein the plasma emitting device is provided with a bubble generating device for generating bubbles in the liquid that is flowed inside the tubular member before the liquid flowing step. 8 . The plasma emitting device according to claim 4 , wherein the plasma emitting device is provided with a cover member formed of insulating material that covers the pair of electrodes arranged along outer walls of the tubular member.
Assignees
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Classifications
Details relating to the shape of the electrodes · CPC title
Constructional details of the electrodes · CPC title
employing two or more electrodes · CPC title
- C01B13/11Primary
by electric discharge · CPC title
Processes carried out in the presence of a plasma · CPC title
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- What does patent US2017182473A1 cover?
- Water is flowed inside main body section formed from an insulating material such that a specified space remains inside the main body section. Electrodes and are arranged along the outer walls of the main body section and voltage is applied to the electrodes. Processing gas present inside the main body section is plasmarized and plasma is emitted to the water flowing inside the main body section.
- Who is the assignee on this patent?
- Fuji Machine Mfg
- What technology area does this patent fall under?
- Primary CPC classification C01B13/11. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Thu Jun 29 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).