Display substrate, display panel, and display apparatus
US-2024411399-A1 · Dec 12, 2024 · US
US2017168331A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017168331-A1 |
| Application number | US-201615340943-A |
| Country | US |
| Kind code | A1 |
| Filing date | Nov 1, 2016 |
| Priority date | Dec 11, 2015 |
| Publication date | Jun 15, 2017 |
| Grant date | — |
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A liquid crystal display including a semiconductor layer disposed on a substrate, a transparent electrode disposed n the semiconductor layer, the transparent electrode overlapping the semiconductor layer and including a source electrode, a drain electrode facing the source electrode, and a first electrode extending from the drain electrode, and an insulating layer disposed on the transparent electrode. The semiconductor layer contacts an entire surface of the source electrode, the drain electrode, and the first electrode.
Opening claim text (preview).
What is claimed is: 1 . A liquid crystal display comprising: a semiconductor layer disposed on a substrate; a transparent electrode disposed on the semiconductor layer, the transparent electrode overlapping the semiconductor layer and including a source electrode, a drain electrode facing the source electrode, and a first electrode extending from the drain electrode; and an insulating layer on the transparent electrode, wherein the semiconductor layer contacts an entire surface of the source electrode, the drain electrode, and the first electrode. 2 . The liquid crystal display of claim 1 , wherein the semiconductor layer comprises an oxide semiconductor. 3 . The liquid crystal display of claim 1 , wherein the substrate extends in a planar direction, and an edge of the semiconductor layer protrudes in the planar direction more than an edge of the transparent electrode. 4 . The liquid crystal display of claim 1 , wherein an edge of the semiconductor layer surrounds the transparent electrode. 5 . The liquid crystal display of claim 1 , further comprising: a data line disposed on the insulating layer, wherein the data line is directly connected to the source electrode through a contact hole provided in the insulating layer. 6 . The liquid crystal display of claim 5 , further comprising: a passivation member covering the data line; and a second electrode disposed on the insulating layer, the second electrode overlapping the first electrode. 7 . The liquid crystal display of claim 6 , wherein the passivation member and the second electrode comprise the same material. 8 . The liquid crystal display of claim 6 , further comprising a voltage line disposed on the insulating layer, the voltage line configured to transfer a voltage to the second electrode, wherein the voltage line and the second electrode directly contact each other. 9 . The liquid crystal display of claim 8 , wherein: the data line and the voltage line comprise the same material; and the passivation member and the second electrode comprise the same material. 10 . A method of manufacturing a liquid crystal display, comprising: forming a semiconductor layer and a transparent electrode on a substrate, the transparent electrode being disposed on the semiconductor layer and comprising a source electrode, a drain electrode facing the source electrode, and a first electrode extending from the drain electrode; forming an insulating layer on the semiconductor layer, the source electrode, the drain electrode, and the first electrode; and forming a signal line on the insulating layer, wherein the semiconductor layer and the transparent electrode are formed based on a same exposure mask. 11 . The method of claim 10 , wherein the forming of the semiconductor layer and the transparent electrode comprises: stacking an oxide semiconductor layer on the substrate; stacking a transparent oxide conductive layer on the oxide semiconductor layer; forming a photosensitive film on the transparent oxide conductive layer by using the exposure mask; first etching the transparent oxide conductive layer and the oxide semiconductor layer by using the photosensitive film as a mask; and second etching the transparent oxide conductive layer by using the photosensitive film as a mask, wherein the semiconductor layer and the transparent electrode are formed from the oxide semiconductor layer and the transparent oxide conductive layer, respectively. 12 . The method of claim 10 , wherein an entire surface of the transparent electrode is contacted with the semiconductor layer. 13 . The method of claim 10 , wherein: the forming of the insulating layer comprises forming a contact hole exposing the source electrode; and the signal line is directly connected to the source electrode through the contact hole. 14 . The method of claim 11 , further comprising: forming a passivation member on the signal line; and forming a second electrode on the insulating layer, the second electrode overlapping the first electrode, wherein the forming of the passivation member and the forming of the second electrode are simultaneously performed. 15 . The method of claim 14 , further comprising forming a voltage line on the insulating layer, the voltage line transferring a voltage to the second electrode, wherein the voltage line and the second electrode directly contact each other. 16 . A liquid crystal display comprising: a semiconductor layer on a substrate; a source electrode, a drain electrode facing the source electrode, and a pixel electrode extending from the drain electrode, each of the source electrode, the drain electrode, and the pixel electrode disposed on the semiconductor layer; an insulating layer disposed on the semiconductor layer, the source electrode, the drain electrode, and the pixel electrode; and a signal line disposed on the insulating layer, the signal line being connected to the source electrode through a contact hole of the insulating layer, wherein the insulating layer separates the semiconductor layer between the source electrode and the drain electrode from the signal line. 17 . The liquid crystal display of claim 16 , wherein an entire surface of the source electrode, the drain electrode, and the pixel electrode contacts the semiconductor layer. 18 . The liquid crystal display of claim 16 , wherein: the pixel electrode extends to a pixel area from the drain electrode; the source electrode, the drain electrode, and a first portion of the semiconductor layer are included in a thin film transistor placed outside of the pixel area; and a second portion of the semiconductor layer and the pixel electrode have a step shape around the pixel area. 19 . The liquid crystal display of claim 16 , wherein the source electrode, the drain electrode, and the pixel electrode are formed of a same material. 20 . The liquid crystal display of claim 16 , further comprising: a common electrode disposed on the insulating layer; a liquid crystal layer disposed on the insulating layer; and a passivation member separating the signal line from the insulating layer, wherein the common electrode and the passivation member include the same material.
of electrodes ohmically coupled to a semiconductor · CPC title
characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile (TFTs having channel structures for preventing kink or snapback effects H10D30/6708; TFTs having lightly-doped source or drain extensions H10D30/6715) · CPC title
Electricity · mapped topic
Electricity · mapped topic
characterised by their electrical, optical, physical properties; materials therefor; method of making · CPC title
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