Resin-support emulsion polymerization of hydrophobic monomers

Patent metadata

Field	Value
Publication number	US-2017166706-A1
Application number	US-201515115343-A
Country	US
Kind code	A1
Filing date	Jan 30, 2015
Priority date	Jan 30, 2014
Publication date	Jun 15, 2017
Grant date	—

Abstract

A composition includes a surfactant-free aqueous emulsion of a support resin and a polymer of a hydrophobic monomer.

First claim

1 . A composition comprising an aqueous emulsion of a support resin and a polymer of a hydrophobic monomer, with the proviso that the composition is surfactant-free; wherein the support resin is a styrene-acrylic resin or acrylic resin having from about 5 wt % to about 40 wt % acid functional repeat units.

2 . (canceled)

3 . The composition of claim 1 , wherein the hydrophobic monomer comprises a C 8 -C 34 alkylacrylate, a C 8 -C 34 alkylmethacrylate, a C 8 -C 40 alkenylacrylate, or a C 8 -C 40 alkenylmethacrylate.

4 . The composition of claim 1 , wherein the hydrophobic monomer comprises capryl acrylate, capryl acrylate, pelargonyl acrylate, undecyl acrylate, lauryl acrylate, tridecyl acrylate, myristyl acrylate, pentadecyl acrylate, cetyl acrylate, palmitoleyl acrylate, heptadecyl acrylate, stearyl acrylate, isostearyl acrylate, elaidyl acrylate, linoleyl acrylate, elaidolinolenyl acrylate, nondecyl acrylate, arachidyl acrylate, heneiscosyl acrylate, behenyl acrylate, erycyl acrylate, lignoceryl acrylate, ceryl acrylate, heptacosanyl acrylate, montanyl acrylate, nancosanyl acrylate, myricyl acrylate, dotriacontyl acrylate, geddyl acrylate, capryl methacrylate, capryl methacrylate, pelargonyl methacrylate, undecyl methacrylate, lauryl methacrylate, tridecyl methacrylate, myristyl methacrylate, pentadecyl methacrylate, cetyl methacrylate, palmitoleyl methacrylate, heptadecyl methacrylate, stearyl methacrylate, isostearyl methacrylate, elaidyl methacrylate, linoleyl methacrylate, elaidolinolenyl methacrylate, nondecyl methacrylate, arachidyl methacrylate, heneiscosyl methacrylate, behenyl methacrylate, erycyl methacrylate, lignoceryl methacrylate, ceryl methacrylate, heptacosanyl methacrylate, montanyl methacrylate, nancosanyl methacrylate, myricyl methacrylate, dotriacontyl methacrylate, er-geddyl methacrylate, or a mixture of any two or more thereof.

5 . The composition of claim 1 , wherein the hydrophobic monomer comprises lauryl acrylate, stearyl acrylate, behenyl acrylate, or a mixture of any two or more thereof.

6 . The composition of claim 1 , wherein the aqueous emulsion is a nanoemulsion having an average particle size of from about 10 nm to about 500 nm.

7 . The composition of claim 1 , wherein the aqueous emulsion is a nanoemulsion having an average particle size of from about 50 nm to about 150 nm.

8 .- 10 . (canceled)

11 . The composition of claim 1 , wherein the support resin comprises support resin hydrophobic groups.

12 . The composition of claim 11 , wherein the support resin hydrophobic groups of the support resin are present from about 1 wt % to about 15 wt %.

13 . (canceled)

14 . The composition of claim 11 , wherein the hydrophobic groups are imparted by a hydrophobic monomer in the support resin, or wherein the support resin has been post-modified with a hydrophobic monomer.

15 . The composition of claim 11 , wherein the support resin comprises stearyl acrylate, lauryl acrylate, or behenyl acrylate.

16 . The composition of claim 11 , wherein the support resin is a post-modified with lauryl glycidyl ether, stearyl glycidyl ether, or a mixture thereof.

17 . A process comprising:
polymerizing in a reactor a hydrophobic monomer in aqueous media, in the presence of a support resin, without the presence of a surfactant, to form a nanoemulsion of a polymer of the hydrophobic monomer, wherein the support resin is a styrene-acrylic resin or acrylic resin having from about 5 wt % to about 40 wt % acid functional repeat units.

18 . The process of claim 17 , wherein the polymerizing further comprises dispersing the support resin in water in the reactor, adding to the reactor the hydrophobic monomer, and sequentially adding to the reactor a reducing agent and an oxidizing agent.

19 . The process of claim 18 , wherein the adding the hydrophobic monomer comprises melting the hydrophobic monomer prior to adding to the reactor.

20 . (canceled)

21 . The process of claim 17 , wherein the hydrophobic monomer comprises a C 8 -C 34 alkylacrylate, a C 8 -C 34 alkylmethacrylate, a C 8 -C 40 alkenylacrylate, or a C 8 -C 40 alkenylmethacrylate.

22 . The process of claim 17 , wherein the hydrophobic monomer comprises capryl acrylate, capryl acrylate, pelargonyl acrylate, undecyl acrylate, lauryl acrylate, tridecyl acrylate, myristyl acrylate, pentadecyl acrylate, cetyl acrylate, palmitoleyl acrylate, heptadecyl acrylate, stearyl acrylate, isostearyl acrylate, elaidyl acrylate, linoleyl acrylate, elaidolinolenyl acrylate, nondecyl acrylate, arachidyl acrylate, heneiscosyl acrylate, behenyl acrylate, erycyl acrylate, lignoceryl acrylate, ceryl acrylate, heptacosanyl acrylate, montanyl acrylate, nancosanyl acrylate, myricyl acrylate, dotriacontyl acrylate, geddyl acrylate, capryl methacrylate, capryl methacrylate, pelargonyl methacrylate, undecyl methacrylate, lauryl methacrylate, tridecyl methacrylate, myristyl methacrylate, pentadecyl methacrylate, cetyl methacrylate, palmitoleyl methacrylate, heptadecyl methacrylate, stearyl methacrylate, isostearyl methacrylate, elaidyl methacrylate, linoleyl methacrylate, elaidolinolenyl methacrylate, nondecyl methacrylate, arachidyl methacrylate, heneiscosyl methacrylate, behenyl methacrylate, erycyl methacrylate, lignoceryl methacrylate, ceryl methacrylate, heptacosanyl methacrylate, montanyl methacrylate, nancosanyl methacrylate, myricyl methacrylate, dotriacontyl methacrylate, geddyl methacrylate, or a mixture of any two or more thereof.

23 . The process of claim 17 , wherein the hydrophobic monomer comprises lauryl acrylate, stearyl acrylate, behenyl acrylate, or a mixture of any two or more thereof.

24 . The process of claim 17 , wherein the nanoemulsion has an average particle size of from about 10 nm to about 500 nm.

25 .- 28 . (canceled)

29 . The process of claim 17 , wherein the support resin comprises support resin hydrophobic groups.

30 . The process of claim 17 , wherein the hydrophobic groups are imparted by a support resin hydrophobic monomer in the support resin, or wherein the support resin has been post-modified with a support resin hydrophobic monomer.

31 .- 34 . (canceled)

Assignees

• Basf Se

Inventors

• Anderson Jeffrey L

Classifications

• C08L33/08

  Homopolymers or copolymers of acrylic acid esters · CPC title

• C09D133/08

  Homopolymers or copolymers of acrylic acid esters · CPC title

• C08J3/07 Primary

  from polymer solutions · CPC title

• C08F257/02 Primary

  on to polymers of styrene or alkyl-substituted styrenes · CPC title

• C09D125/14

  with unsaturated esters · CPC title