Method of manufacturing mask assembly and method of manufacturing display apparatus using mask assembly

Patent metadata

Field	Value
Publication number	US-2017162833-A1
Application number	US-201615196055-A
Country	US
Kind code	A1
Filing date	Jun 29, 2016
Priority date	Dec 4, 2015
Publication date	Jun 8, 2017
Grant date	—

Abstract

A method of manufacturing a mask assembly includes forming, via an electroforming process, a base material including at least one opening on an electrode plate; and reprocessing the at least one opening using a laser to form at least one reprocessed opening.

First claim

What is claimed is:

1 . A method of manufacturing a mask assembly, the method comprising:
forming, via an electroforming process, a base material comprising at least one opening on an electrode plate; and reprocessing the at least one opening using a laser to form at least one reprocessed opening.

2 . The method of claim 1 , wherein edges of the at least one reprocessed opening are sloped with respect to a surface of the electrode plate.

3 . The method of claim 1 , wherein forming the base material on the electrode plate comprises:
forming, on the electrode plate, a photoresist pattern comprising the at least one opening; and forming, using the electroforming process, the base material on the electrode plate in the least one opening.

4 . The method of claim 3 , wherein the photoresist pattern is formed using a positive photoresist process.

5 . The method of claim 3 , wherein the photoresist pattern is formed using a negative photoresist process.

6 . The method of claim 3 , wherein the forming of the base material on the electrode plate further comprises removing the photoresist pattern.

7 . The method of claim 1 , wherein the base material comprises nanoscale particles.

8 . The method of claim 1 , further comprising:
separating the base material from the electrode plate; and supporting the base material across an opening in a mask frame.

9 . The method of claim 8 , wherein the base material is supported, under tension, across the opening in the mask frame.

10 . The method of claim 8 , wherein:
the mask frame comprises a support frame extending across the opening in the mask frame; and the base material is supported on the support frame.

11 . A method of manufacturing a display apparatus, the method comprising:
manufacturing a mask assembly; arranging a substrate of the display apparatus to face the mask assembly; and depositing, on the substrate, a deposition material according to at least one first opening in the mask assembly, wherein manufacturing the mask assembly comprises:
forming, via an electroforming process, a base material comprising at least one second opening on an electrode plate; and
reprocessing the at least one second opening using a laser to form the at least one first opening.

12 . The method of claim 11 , wherein edges of the at least one first opening are sloped with respect to a surface of the electrode plate.

13 . The method of claim 11 , wherein forming of the base material on the electrode plate comprises:
forming, on the electrode plate, a photoresist pattern comprising the at least one second opening; and forming, using the electroforming process, the base material on the electrode plate in the at least one second opening.

14 . The method of claim 13 , wherein the photoresist pattern is formed using a negative photoresist process.

15 . The method of claim 13 , wherein the photoresist pattern is formed using a positive photoresist process.

16 . The method of claim 13 , wherein forming the base material on the electrode plate further comprises removing the photoresist pattern.

17 . The method of claim 11 , wherein the base material comprises nanoscale particles.

18 . The method of claim 11 , wherein manufacturing the mask assembly further comprises:
separating the base material from the electrode plate; and supporting the base material across an opening in a mask frame.

19 . The method of claim 18 , wherein the base material is supported, under tension, across the opening in the mask frame.

20 . The method of claim 18 , wherein:
the mask frame comprises a support frame extending across the opening in the mask frame; and the base material is supported on the support frame.

Assignees

• Samsung Display Co Ltd

Inventors

• Moon Youngmin
• Im Sungsoon
• Hwang Kyuhwan
• Moon Minho

Classifications

• H10K71/00

  Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

• C25D1/08 Primary

  Perforated or foraminous objects, e.g. sieves (C25D1/10 takes precedence) · CPC title

• C25D1/10

  Moulds; Masks; Masterforms · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• H01L51/0011

  Electricity · mapped topic