Curable composition, functional polymer hardened product, stack or device comprising functional polymer membrane, amide compound, and manufacturing method thereof

US2017152331A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017152331-A1
Application numberUS-201715430941-A
CountryUS
Kind codeA1
Filing dateFeb 13, 2017
Priority dateAug 28, 2014
Publication dateJun 1, 2017
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided are a curable composition including an amide compound that is represented by Formula (1) below and of which a density of sulfonic acid is 3.9 milliequivalent/g or greater, a functional polymer hardened product, a stack or a device including a functional polymer membrane, an amide compound, and a manufacturing method thereof. m represents an integer of 1 or greater, n represents an integer of 2 or greater, L 1 represents a m+1-valent linking group, and L 2 represents an n-valent linking group. R 1 represents a hydrogen atom or an alkyl group, and R 2 represents —SO 3 − M + or —SO 3 R 3 (R 3 represents an alkyl group or an aryl group). Here, in a case where there are plural R 2 's, not all of the R 2 's are —SO 3 R 3 . M + represents a hydrogen ion, an inorganic ion, or an organic ion.

First claim

Opening claim text (preview).

What is claimed is: 1 . A curable composition comprising: an amide compound that is represented by Formula (1) below and of which a density of sulfonic acid is 3.9 milliequivalent/g or greater, in Formula (1), m represents an integer of 1 or greater; n represents an integer of 2 or greater; L 1 represents a m+1-valent linking group; L 2 represents an n-valent linking group; R 1 represents a hydrogen atom or an alkyl group; R 2 represents —SO 3 − 1\4 + or —SO 3 R 3 ; here, in a case where there are plural R 2 's, not all of the R 2 's are —SO 3 R 3 ; M + represents a hydrogen ion, an inorganic ion, or an organic ion; and R 3 represents an alkyl group or an aryl group. 2 . The curable composition according to claim 1 , that is used for forming a functional polymer membrane. 3 . The curable composition according to claim 1 , that is used for forming an ion-exchange membrane. 4 . The curable composition according to claim 1 , wherein the amide compound is an amide compound represented by Formula (2) below, in Formula (2), LL 1 represents an alkylene group; and n, R 1 , L 2 , and M + respectively have the same meanings as n, R 1 , L 2 , and M + in Formula (1). 5 . The curable composition according to claim 1 , wherein the amide compound is an amide compound represented by Formula (3) below, in Formula (3), m1 represents an integer of 1 to 5; and n, R 1 , R 2 , and L 2 respectively have the same meanings as n, R 1 , R 2 , and L 2 in Formula (1). 6 . The curable composition according to claim 1 , wherein a molecular weight of the amide compound is 900 or less. 7 . The curable composition according to claim 1 , further comprising: a polymerization initiator. 8 . The curable composition according to claim 1 , further comprising: a solvent. 9 . A functional polymer hardened product obtained by performing polymerization hardening reaction on the curable composition according to claim 1 . 10 . The functional polymer hardened product according to claim 9 , which is a functional polymer membrane. 11 . The functional polymer hardened product according to claim 10 , which is an ion-exchange membrane. 12 . A stack, comprising: the functional polymer hardened product according to claim 9 . 13 . A device, comprising: the functional polymer hardened product according to claim 9 . 14 . A manufacturing method of an amide compound, comprising: manufacturing a compound represented by Formula (2) below from a compound represented by Formula (4) below, in Formulae (2) and (4), n represents an integer of 2 or greater; LL 1 represents an alkylene group; L 2 represents an n-valent linking group; R 1 represents a hydrogen atom or an alkyl group; M + represents a hydrogen ion, an inorganic ion, or an organic ion; and R 3 represents an alkyl group or an aryl group. 15 . A manufacturing method of an amide compound, further comprising: manufacturing the compound represented by Formula (4) according to claim 14 from a compound represented by Formula (5) below, in Formula (5), n, R 3 , LL 1 , and L 2 respectively have the same meanings as n, R 3 , LL 1 , and L 2 in Formula (4). 16 . A compound represented by Formula (6) below, wherein a density of sulfonic acid is 3.9 milliequivalent/g or greater, in Formula (6), LL 1 represents an alkylene group; LL 2 represents an alkylene group; R 1 represents a hydrogen atom or an alkyl group; R 2a and R 2b each independently represent —SO 3 − M + or —SO 3 R 3 ; here, not both of R 2a and R 2b are —SO 3 R 3 ; M + represents a hydrogen ion, an inorganic ion, or an organic ion; and R 3 represents an alkyl group or an aryl group. 17 . A compound represented by Formula (7) below, in Formula (7), LL 1 represents an alkylene group; LL 2 represents an alkylene group; R 1 represents a hydrogen atom or an alkyl group; and R 3 represents an alkyl group or an aryl group.

Assignees

Inventors

Classifications

  • C07C309/15Primary

    the nitrogen atom of at least one of the amino groups being part of any of the groups [IMAGE cpc-sch-C07C-0975.gif], X being a hetero atom, Y being any atom · CPC title

  • Ion-exchange membranes · CPC title

  • Use of radiation · CPC title

  • characterised by the presence of specified groups, e.g. introduced by chemical after-treatment · CPC title

  • Polyamides, e.g. polyester-amides · CPC title

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What does patent US2017152331A1 cover?
Provided are a curable composition including an amide compound that is represented by Formula (1) below and of which a density of sulfonic acid is 3.9 milliequivalent/g or greater, a functional polymer hardened product, a stack or a device including a functional polymer membrane, an amide compound, and a manufacturing method thereof. …
Who is the assignee on this patent?
Fujifilm Corp
What technology area does this patent fall under?
Primary CPC classification C07C309/15. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jun 01 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).