Method of producing a separator and method of producing a microporous membrane

Patent metadata

Field	Value
Publication number	US-2017133649-A1
Application number	US-201715411242-A
Country	US
Kind code	A1
Filing date	Jan 20, 2017
Priority date	Nov 30, 2009
Publication date	May 11, 2017
Grant date	—

Abstract

A method of producing a separator is provided. The method includes providing a particle membrane including inorganic particles on at least one principal surface of a porous body by a vapor-phase process such that the particle membrane has a porosity that is non-uniform in a thickness direction thereof. A method of producing a microporous membrane is also provided.

First claim

The invention is claimed as follows:

1 . A method for producing a separator, the method comprising:
providing a particle membrane including inorganic particles on at least one principal surface of a porous body by a vapor-phase process such that the particle membrane has a porosity that is non-uniform in a thickness direction thereof.

2 . The method according to claim 1 , wherein the vapor-phase process is selected from the group consisting of a physical vapor deposition process and a chemical vapor deposition process.

3 . The method according to claim 2 , wherein the physical vapor deposition process is selected from the group consisting of vacuum deposition, sputtering, ion plating, molecular beam epitaxy, and laser ablation.

4 . The method according to claim 2 , wherein the chemical vapor deposition process is selected from the group consisting of metal organic chemical vapor deposition, radio-frequency plasma chemical vapor deposition, optical chemical vapor deposition, laser chemical vapor deposition, and liquid phase epitaxy.

5 . The method according to claim 1 , wherein a minimum value of the porosity is about 50% or less.

6 . The method according to claim 1 , wherein a minimum value of the porosity is about 40% or less.

7 . The method according to claim 1 , wherein the porosity, in the thickness direction of the particle membrane, is highest near an interface between the particle membrane and the porous body.

8 . The method according to claim 1 , wherein the porosity, in the thickness direction of the particle membrane, is lowest near an outer surface of the particle membrane.

9 . The method according to claim 1 , wherein the porosity, in the thickness direction of the particle membrane, decreases from an interface between the particle membrane and the porous body to an outer surface of the particle membrane.

10 . The method according to claim 1 , wherein a density of the inorganic particles, in the thickness direction of the particle membrane, decreases from an outer surface of the particle membrane to an interface between the particle membrane and the porous body.

11 . A method for producing a microporous membrane, the method comprising:
providing inorganic particles on at least one principal surface of a porous body by a vapor-phase process such that the microporous membrane has a porosity that is non-uniform in a thickness direction thereof.

12 . The method according to claim 11 , wherein the vapor-phase process is selected from the group consisting of a physical vapor deposition process and a chemical vapor deposition process.

13 . The method according to claim 12 , wherein the physical vapor deposition process is selected from the group consisting of vacuum deposition, sputtering, ion plating, molecular beam epitaxy, and laser ablation.

14 . The method according to claim 12 , wherein the chemical vapor deposition process is selected from the group consisting of metal organic chemical vapor deposition, radio-frequency plasma chemical vapor deposition, optical chemical vapor deposition, laser chemical vapor deposition, and liquid phase epitaxy.

15 . The method according to claim 11 , wherein a minimum value of the porosity is about 50% or less.

16 . The method according to claim 11 , wherein a minimum value of the porosity is about 40% or less.

17 . The method according to claim 11 , wherein the porosity, in the thickness direction of the microporous membrane, is highest near an interface between the inorganic particles and the porous body.

18 . The method according to claim 11 , wherein the porosity, in the thickness direction of the microporous membrane, is lowest near an outer surface of the microporous membrane.

19 . The method according to claim 11 , wherein the porosity, in the thickness direction of the microporous membrane, decreases from an interface between the inorganic particles and the porous body to an outer surface of the microporous membrane.

20 . The method according to claim 11 , wherein a density of the inorganic particles, in the thickness direction of the microporous membrane, decreases from an outer surface of the microporous membrane to an interface between the inorganic particles and the porous body.

Assignees

• Sony Corp

Inventors

• Sawaguchi Masahiro
• Meguro Masashi
• Hiratsuka Masaru
• Fuchigami Yoshiyuki

Classifications

• C23C14/083 Primary

  of refractory metals or yttrium · CPC title

• C23C16/448

  characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title

• C23C14/34

  Sputtering · CPC title

• C23C14/081

  of aluminium, magnesium or beryllium · CPC title

• C23C16/405

  of refractory metals or yttrium · CPC title