Platinum and cobalt/copper-based multilayer thin film having low saturation magnetization and fabrication method thereof

US2017133583A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017133583-A1
Application numberUS-201715410535-A
CountryUS
Kind codeA1
Filing dateJan 19, 2017
Priority dateMay 22, 2012
Publication dateMay 11, 2017
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A multilayer thin film for magnetic random access memory that includes thin platinum layers and thin cobalt-copper layers, and more particularly, to a multilayer thin film having magnetic layers including non-magnetic material copper that replaces a portion of the magnetic material cobalt.

First claim

Opening claim text (preview).

What is claimed is: 1 . A perpendicular magnetic anisotropy multilayer thin film for magnetic random access memory, comprising: a thin platinum layer and a thin cobalt-copper layer alternately deposited to form a multilayer thin film over a substrate, wherein the cobalt-copper layer is thicker than the thin platinum layer. 2 . The perpendicular magnetic anisotropy multilayer thin film of claim 1 , wherein a content ratio of cobalt:copper in the thin cobalt-copper layers is 50:50 to 90:10 (atomic ratio). 3 . The perpendicular magnetic anisotropy multilayer thin film of claim 1 , wherein the multilayer thin film including the thin platinum layer and the thin cobalt-copper layer is repeatedly stacked over the substrate 2-10 turns. 4 . The perpendicular magnetic anisotropy multilayer thin film of claim 1 , wherein the multilayer thin film has a total thickness of 0.3-12.5 nm. 5 . The perpendicular magnetic anisotropy multilayer thin film of claim 4 , wherein a thickness of the thin platinum layer in the multilayer thin film ranges from 0.15 nm to 0.25 nm. 6 . The perpendicular magnetic anisotropy multilayer thin film of claim 1 , wherein the thickness ratio of the thin cobalt-copper layer to the thin platinum layer is 1.1-4:1. 7 . The perpendicular magnetic anisotropy multilayer thin film of claim 1 , further comprising: a stack of a buffer layer and a seed layer, which are provided between the substrate and the multilayer thin film, and a protective layer deposited over the multilayer thin film. 8 . The perpendicular magnetic anisotropy multilayer thin film of claim 7 , wherein each of the buffer layer, the seed layer, and the protective layer independently includes gold (Au), palladium (Pd), copper (Cu), platinum (Pt), tantalum (Ta), ruthenium (Ru), or a combination thereof. 9 . The perpendicular magnetic anisotropy multilayer thin film of claim 1 , wherein the multilayer thin film has a perpendicular magnetic anisotropy (PMA) energy density of 0.23˜5.66×10 6 erg/cm 3 at 300˜500 Celsius degrees.

Assignees

Inventors

Classifications

  • Exchange coupled hard/soft multilayers, e.g. CoPt/Co or NiFe/CoSm (nanocomposite spring magnets H01F1/0579) · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

  • H01L43/10Primary

    Electricity · mapped topic

  • made of a noble metal, e.g.(Co/Pt) n multilayers having perpendicular anisotropy (H01F10/3286 takes precedence) · CPC title

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What does patent US2017133583A1 cover?
A multilayer thin film for magnetic random access memory that includes thin platinum layers and thin cobalt-copper layers, and more particularly, to a multilayer thin film having magnetic layers including non-magnetic material copper that replaces a portion of the magnetic material cobalt.
Who is the assignee on this patent?
Sk Hynix Inc
What technology area does this patent fall under?
Primary CPC classification H01L43/10. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu May 11 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).