Apparatus for electrochemical etching and apparatus for electroplating

Patent metadata

Field	Value
Publication number	US-2017121842-A1
Application number	US-201514977660-A
Country	US
Kind code	A1
Filing date	Dec 22, 2015
Priority date	Nov 3, 2015
Publication date	May 4, 2017
Grant date	—

Abstract

An apparatus for electrochemical etching and an apparatus for electroplating are provided, wherein the apparatus for electrochemical etching includes an etching solution spraying head, a support, and a first and a second electrode. The first electrode is disposed inside the etching solution spraying head, and current is provided to an etching solution inside the etching solution spraying head by the first electrode. The support is disposed opposite to the etching solution spraying head. The second electrode is disposed on the support. When a substrate is placed on the second electrode, a first surface of the substrate is in electrical contact with the second electrode, and the etching solution sprayed from the etching solution spraying head can naturally flow through a second surface of the substrate and then flow off from the edges of the support.

First claim

What is claimed is:

1 . An apparatus for electrochemical etching a substrate including a first surface and a second surface, the apparatus comprising:
an etching solution spraying head; a first electrode disposed inside the etching solution spraying head, wherein a current is provided to an etching solution inside the etching solution spraying head by the first electrode; a support disposed opposite to the etching solution spraying head; and a second electrode disposed on the support, wherein when the substrate is disposed on the second electrode, the first surface of the substrate is in electrical contact with the second electrode, and the etching solution sprayed from the etching solution spraying head naturally flows through the second surface of the substrate and then flows off from edges of the support.

2 . The apparatus of claim 1 , wherein an area of the substrate is greater than an area of the second electrode.

3 . The apparatus of claim 1 , wherein the first electrode is a negative electrode.

4 . The apparatus of claim 1 , wherein the first electrode is a platinum electrode or a silver electrode.

5 . The apparatus of claim 1 , wherein the etching solution is a mixed aqueous solution of hydrofluoric acid and alcohol.

6 . The apparatus of claim 1 , wherein a material of the etching solution spraying head and a material of the support independently comprise polytetrafluoroethylene (PTFE), polyvinyl difluoride (PVDF), a perfluoroalkoxy (PFA) resin, polyvinylchloride (PVC), polypropylene (PP), or high-density polyethylene (HDPE).

7 . The apparatus of claim 1 , wherein a spacing between the etching solution spraying head and the second electrode is controlled such that a liquid film formed by the etching solution on the second surface of the substrate is continuous.

8 . The apparatus of claim 1 , wherein the etching solution spraying head has a plurality of spray openings or a plurality of nozzles.

9 . The apparatus of claim 1 , wherein the support comprises at least one adsorption port for vacuum adsorbing the substrate by vacuum-pumping from the adsorption port.

10 . The apparatus of claim 9 , wherein the support further comprises at least one exhaust port disposed in a portion closer to the edges the support than a location of the adsorption port.

11 . The apparatus of claim 9 , further comprising an O-ring surrounding the second electrode and disposed between the substrate and the support to prevent the etching solution from being sucked by the adsorption port.

12 . The apparatus of claim 1 , further comprising a solution holding device for holding the etching solution flowing off from the edges of the support.

13 . The apparatus of claim 1 , further comprising a solution storage tank for storing the etching solution and transporting the etching solution from the solution storage tank to the etching solution spraying head via a pump pressure.

14 . The apparatus of claim 1 , wherein the substrate comprises a silicon wafer, a germanium wafer, a silicon germanium wafer, or a gallium arsenide wafer.

15 . An apparatus for electroplating a substrate including a first surface and a second surface, the apparatus comprising:
an electroplating solution spraying head; a first electrode disposed inside the electroplating solution spraying head, wherein a current is provided to an electroplating solution inside the electroplating solution spraying head by the first electrode; a support disposed opposite to the electroplating solution spraying head; and a second electrode disposed on the support, wherein when the substrate is disposed on the second electrode, the first surface of the substrate is in electrical contact with the second electrode, and the electroplating solution sprayed from the electroplating solution spraying head naturally flows through the second surface of the substrate and then flows off from edges of the support.

16 . The apparatus of claim 15 , wherein the electroplating solution spraying head has a plurality of spray openings or a plurality of nozzles.

17 . The apparatus of claim 15 , wherein an area of the substrate is greater than an area of the second electrode.

18 . The apparatus of claim 15 , wherein the first electrode is a positive electrode.

19 . The apparatus of claim 15 , wherein the support comprises at least one adsorption port for vacuum adsorbing the substrate by vacuum-pumping from the adsorption port.

20 . The apparatus of claim 19 , wherein the support further comprises at least one exhaust port disposed in a portion closer to the edges of the support than a location of the adsorption port.

21 . The apparatus of claim 19 , further comprising an O-ring surrounding the second electrode and disposed between the substrate and the support to prevent the electroplating solution from being sucked by the adsorption port.

22 . The apparatus of claim 15 , wherein a spacing between the electroplating solution spraying head and the second electrode is controlled such that a liquid film formed by the electroplating solution on the second surface of the substrate is continuous.

23 . The apparatus of claim 15 , wherein a material of the first electrode is a metal material to be plated on the second surface of the substrate.

24 . The apparatus of claim 15 , further comprising a solution holding device for holding the electroplating solution flowing off from the edges of the support.

25 . The apparatus of claim 15 , further comprising a solution storage tank for storing the electroplating solution and transporting the electroplating solution from the solution storage tank to the electroplating solution spraying head via a pump pressure.

Assignees

• Ind Tech Res Inst

Inventors

• Wang teng-yu

Classifications

• C25F7/00

  Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects (for both electrolytic coating and removal C25D); Servicing or operating · CPC title

• C25D17/001

  Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

• C25D5/026

  using locally applied jets of electrolyte · CPC title

• C25F3/12 Primary

  of semiconducting materials · CPC title

• C25D5/08

  Electroplating with moving electrolyte e.g. jet electroplating {(using locally applied jets of electrolyte C25D5/026)} · CPC title