Method for producing chlorosilane gas using continuous tubular reactor

US2017113938A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017113938-A1
Application numberUS-201515310725-A
CountryUS
Kind codeA1
Filing dateMay 13, 2015
Priority dateMay 13, 2014
Publication dateApr 27, 2017
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to an apparatus for producing trichlorosilane from tetrachlorosilane in an efficient manner. The apparatus includes an inlet through which reaction raw materials including a metal silicon powder dispersed in liquid tetrachlorosilane enter, a hole through which a gaseous reaction raw material is fed, an outlet through which reaction products including trichlorosilane exit, a tubular reactor in which the reaction raw materials entering through the inlet react with each other during flow, and means for impeding the flow of the fluids to cause collision of the fluids during flow.

First claim

Opening claim text (preview).

1 . An apparatus for producing trichlorosilane, comprising an inlet through which reaction raw materials comprising a metal silicon powder dispersed in liquid tetrachlorosilane enter, a hole through which a gaseous reaction raw material is fed, an outlet through which reaction products comprising trichlorosilane exit, a tubular reactor in which the reaction raw materials entering through the inlet react with each other during flow, and means for impeding the flow of the fluids to cause collision of the fluids during flow. 2 . The apparatus according to claim 1 , wherein the fluid-flow impeding means are structures protruding from the inner wall of the tubular reactor to a reaction space. 3 . The apparatus according to claim 1 , wherein the fluid-flow impeding means are formed by bending a flow path of the tubular reactor. 4 . The apparatus according to claim 1 , wherein the gaseous reaction raw material is hydrogen chloride, hydrogen or a mixture thereof. 5 . The apparatus according to claim 1 , wherein the reaction is carried out in a liquid phase. 6 . The apparatus according to claim 1 , wherein the reaction is carried out at 300 to 1000° C. 7 . The apparatus according to claim 1 , wherein the metal silicon powder has an average particle diameter of 10 microns or less. 8 . The apparatus according to claim 1 , wherein the metal silicon and the tetrachlorosilane are in a weight ratio of 1:20-200. 9 . The apparatus according to claim 1 , wherein the tetrachlorosilane is a by-product in the deposition of polysilicon by the reaction of trichlorosilane with hydrogen. 10 . The apparatus according to claim 1 , wherein the metal silicon powder is used up in the reaction and does not remain after the reaction. 11 . A method for continuously producing trichlorosilane using the apparatus according to claim 1 .

Assignees

Inventors

Classifications

  • Halogenated silanes · CPC title

  • Details of the reactor or of the particulate material; Processes to increase or to retard the rate of reaction (B01J8/0285, B01J8/067, B01J8/087, B01J8/1836 take precedence) · CPC title

  • C01B33/08Primary

    Compounds containing halogen · CPC title

  • Microreactors, e.g. miniaturised or microfabricated reactors (laboratory containers with capillary fluid transport in microfabricated channels or chambers B01L3/5027) · CPC title

  • Heat exchange · CPC title

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What does patent US2017113938A1 cover?
The present invention relates to an apparatus for producing trichlorosilane from tetrachlorosilane in an efficient manner. The apparatus includes an inlet through which reaction raw materials including a metal silicon powder dispersed in liquid tetrachlorosilane enter, a hole through which a gaseous reaction raw material is fed, an outlet through which reaction products including trichlorosilan…
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C01B33/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Apr 27 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).