Bipolar plate with force concentrator pattern

US2017082097A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017082097-A1
Application numberUS-201615270277-A
CountryUS
Kind codeA1
Filing dateSep 20, 2016
Priority dateSep 21, 2015
Publication dateMar 23, 2017
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Embodiments of present disclosure are directed to a bipolar plate assembly. The bipolar plate assembly has a frame and a base. At least one of the frame and the base has a shape of a force concentrator pattern or has a first surface having a force concentrator pattern, the force concentrator pattern including a raised surface extending partially across the first surface. A surface area of the force concentrator pattern across the length of the frame or base is generally constant, thereby producing a uniform compressive pressure along the length of the frame or base when the bipolar plate assembly is under compression.

First claim

Opening claim text (preview).

What is claimed is: 1 . A bipolar plate assembly, comprising: a frame and a base, at least one of the frame and the base having a shape of a force concentrator pattern or having a first surface comprising a force concentrator pattern, the force concentrator pattern comprising a raised surface extending partially across the first surface; wherein a surface area of the force concentrator pattern across the length of the frame or the base is generally constant, thereby producing a uniform compressive pressure along the length of the frame and/or the base when the bipolar plate assembly is under compression. 2 . The bipolar plate assembly of claim 1 , wherein the surface area of the force concentrator pattern across the length of the frame or the base ranges from between about 2 cm 2 /cm to about 10 cm 2 /cm. 3 . The bipolar plate assembly of claim 1 , further comprising at least one seal assembly between the frame and the base. 4 . The bipolar plate assembly of claim 3 , wherein the seal assembly is an elastomer seal or a polymeric seal. 5 . The bipolar plate assembly of claim 3 , wherein the compressive pressure on the seal assembly is generally evenly distributed across the seal assembly when the bipolar plate assembly is under compression. 6 . The bipolar plate assembly of claim 1 , wherein the frame and the base are two pieces coupled together or are one integrated part. 7 . The bipolar plate assembly of claim 6 , wherein at least one of the frame and the base is laminated with a polymeric material or coated with a polymeric film on a top surface and/or a bottom surface. 8 . The bipolar plate assembly of claim 7 , wherein the compressive pressure on the polymeric material or the polymeric film is generally evenly distributed across the frame and/or the base when the bipolar plate assembly is under compression. 9 . The bipolar plate assembly of claim 2 , wherein the bipolar plate assembly is at least one of a plurality of bipolar plate assemblies forming an electrochemical stack. 10 . The bipolar plate assembly of claim 2 , wherein the compressive pressure ranges from 5,000 psig to 40,000 psig. 11 . The bipolar plate assembly of claim 2 , wherein the force concentrator pattern has a thickness ranging from 0.025 mm to a thickness of the frame and/or the base. 12 . The bipolar plate assembly of claim 2 , wherein at least one of the frame and the base has a second surface comprising the force concentrator pattern. 13 . A method of assembling a bipolar plate assembly, comprising: compressing a frame and a base of the bipolar plate assembly, at least one of the frame and the base having a shape of a force concentrator pattern or having a first surface comprising a force concentrator pattern, the force concentrator pattern comprising a raised surface extending partially across the first surface, wherein a surface area of the force concentrator pattern across the length of the frame or the base is generally constant, thereby producing a uniform compressive pressure along the length of the frame and/or the base when the bipolar plate assembly is under compression. 14 . The method of claim 13 , wherein the surface area of the force concentrator pattern across the length of the frame or the base ranges from between about 2 cm 2 /cm to about 10 cm 2 /cm. 15 . The method of claim 13 , wherein the bipolar plate assembly comprises at least one seal assembly between the frame and the base. 16 . The method of claim 15 , wherein the seal assembly is an elastomer seal or a polymeric seal. 17 . The method of claim 15 , wherein the compressive pressure on the seal assembly is generally evenly distributed across the seal assembly when the bipolar plate assembly is under compression. 18 . The method of claim 15 , wherein the compressive pressure on the seal assembly is greater than the yield strength of the material of the seal assembly. 19 . The method of claim 13 , wherein the frame and the base are two pieces coupled together or are one integrated part; wherein at least one of the frame and the base is laminated with a polymeric material or coated with a polymeric film on a top surface and/or a bottom surface; and wherein the compressive pressure on the polymeric material or the polymeric film is generally evenly distributed across the frame and/or the base when the bipolar plate assembly is under compression. 20 . An electrochemical cell comprising: a pair of bipolar plate assemblies and a membrane electrode assembly located between the pair of bipolar plate assemblies, wherein at least one of the bipolar plate assembly comprises: a frame and a base, at least one of the frame and the base having a shape of a force concentrator pattern or having a first surface comprising a force concentrator pattern, the force concentrator pattern comprising a raised surface extending partially across the first surface, wherein a surface area of the force concentrator pattern across the length of the frame or the base is generally constant, thereby producing a uniform compressive pressure along the length of the frame and/or base when the bipolar plate assembly is under compression.

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What does patent US2017082097A1 cover?
Embodiments of present disclosure are directed to a bipolar plate assembly. The bipolar plate assembly has a frame and a base. At least one of the frame and the base has a shape of a force concentrator pattern or has a first surface having a force concentrator pattern, the force concentrator pattern including a raised surface extending partially across the first surface. A surface area of the f…
Who is the assignee on this patent?
Nuvera Fuel Cells Llc
What technology area does this patent fall under?
Primary CPC classification F04B37/18. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Thu Mar 23 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).